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Patent Agency Ranking
公开(公告)号：DE2512745A1
公开(公告)日：1975-10-09
申请号：DE2512745
申请日：1975-03-22
Applicant: IBM
Inventor： CORTELLINO CHARLES ANTHONY , GIPSTEIN EDWARD , HEWETT WILLIAM AINSLIE , JOHNSON DUANE EDWARD , MOREAU WAYNE MARTIN
IPC: G03F7/039 , H01L21/027 , G03F7/10
Abstract: It has been discovered that the sensitivity of positive acting polymeric electron beam resists is increased by well over an order of magnitude by using polymers having a molecular weight of at least one million, thereby making it possible to reduce the required radiation to below 3 x 10 6 coulombs/cm2.
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公开(公告)号：DE3785826T2
公开(公告)日：1993-10-28
申请号：DE3785826
申请日：1987-05-05
Applicant: IBM
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公开(公告)号：DE3367483D1
公开(公告)日：1986-12-11
申请号：DE3367483
申请日：1983-01-14
Applicant: IBM
Inventor： CORTELLINO CHARLES ANTHONY , LEVINE JOSEPH ELI , SCHICK HENRY CARL
IPC: H01L21/30 , G03F7/30 , H01L21/027 , H01L21/68 , H01L21/312 , G03F7/26 , G03D3/00 , H05K3/14
Abstract: A developer apparatus comrises a developing tank (10) arranged with a centrally located rotatable and vertically translatable shaft (20) carrying a workpiece platform (12) at the upper end thereof. Initially, the platform is located above the tank for ease in loading a workpiece, for example an exposed photoresist coated semiconductor device component. The platform and workpiece are then lowered into developing solution in the tank where they are rotated and oscillated vertically for agitational action during a predetermined time period after which they are raised up out of the solution and delayed with continued rotation at a drying station for another predetermined time period. Thereafter, the platform and workpiece are returned to the initial position for workpiece unloading.
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公开(公告)号：DE3785826D1
公开(公告)日：1993-06-17
申请号：DE3785826
申请日：1987-05-05
Applicant: IBM
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