METHOD AND SYSTEM FOR DESIGNING MULTILEVEL HALFTONE SCREENS USING SPOT FUNCTIONS
    1.
    发明申请
    METHOD AND SYSTEM FOR DESIGNING MULTILEVEL HALFTONE SCREENS USING SPOT FUNCTIONS 审中-公开
    使用SPOT功能设计多层HALFTONE屏幕的方法和系统

    公开(公告)号:WO2006135810A2

    公开(公告)日:2006-12-21

    申请号:PCT/US2006022628

    申请日:2006-06-09

    CPC classification number: H04N1/4055 H04N1/40087

    Abstract: A method and system for generating halftone tables, using a spot function, subdivides the pixels within the halftone cell of a halftone matrix into a plurality of sub-pixels, determines the value of the spot function corresponding to the position of each of the sub-pixels within the halftone matrix, repeats the subdividing and determining for all of the sub-pixels in the halftone matrix, ranks the values for the entire halftone matrix, normalizes the ranked values, generates a cumulative histogram based upon the normalized values, and stores the cumulative histogram as a halftone table.

    Abstract translation: 使用点功能产生半色调表的方法和系统将半色调矩阵的半色调单元内的像素细分成多个子像素,确定与每个子像素的位置相对应的光点函数的值, 半色调矩阵内的像素重复细分和确定半色调矩阵中的所有子像素,对整个半色调矩阵的值进行排序,对排序的值进行归一化,基于归一化值生成累积直方图,并存储 累积直方图作为半色调表。

    METHODS AND APPARATUS FOR GENERATING DITHER MASK THROUGH INTERPOLATION BETWEEN PREFERRED PATTERNS
    2.
    发明申请
    METHODS AND APPARATUS FOR GENERATING DITHER MASK THROUGH INTERPOLATION BETWEEN PREFERRED PATTERNS 审中-公开
    用于通过优选图案之间的插入产生数字掩码的方法和装置

    公开(公告)号:WO2005120041A3

    公开(公告)日:2007-07-05

    申请号:PCT/US2005016184

    申请日:2005-05-10

    CPC classification number: H04N1/4051

    Abstract: Techniques for generating dither masks are provided. A dither mask is generated by selecting a sequence of at least three original patterns comprising pixels of at least one of a first color and a second color. At least two patterns are interpolated to generate interpolated patterns in the sequence between the at least three original patterns. If a pattern having at least one specified characteristic exists in the sequence, the steps of interpolating between at least two patterns, and determining if a pattern having at least one specified characteristic exists in the sequence, are repeated. The interpolation is between at least one pattern from each side of the pattern having at least one specified characteristic in the sequence.

    Abstract translation: 提供了产生抖动掩模的技术。 通过选择至少三个包括第一颜色和第二颜色中的至少一个的像素的原始图案的序列来生成抖动掩模。 内插至少两个图案以在至少三个原始图案之间的序列中生成插值图案。 如果序列中存在至少一个特定特征的图案,则重复在至少两个图案之间进行内插并确定序列中是否存在具有至少一个指定特征的图案的步骤。 该插值位于具有序列中至少一个特定特征的图案的每侧的至少一个图案之间。

    3.
    发明专利
    未知

    公开(公告)号:DE3482060D1

    公开(公告)日:1990-05-31

    申请号:DE3482060

    申请日:1984-01-02

    Applicant: IBM

    Abstract: The invention relates to a scanning system for use with solid-state laser chips (200) to counteract variations in wavelength produced by solid-state chips, to counteract astigmatism effects common to laser chips, to counteract variations in the distance between the plane of emission of the beam and the plane of a collimating lens, to counteract variations in beam size in perpendicular planes, to counteract variations in the divergence angle of emission common to laser chips, and to counteract tilt variations caused by imperfect reflecting surfaces. The system includes an apertured achromatic doublet lens (201, 202) for collimating the beam, a cylindrical lens (101), a rotating mirror (102), and a combination of toroidal (203) and spherical (204) lenses.

    METHODS AND APPARATUS FOR GENERATING DITHER MASK THROUGH INTERPOLATION BETWEEN PREFERRED PATTERNS

    公开(公告)号:CA2568500C

    公开(公告)日:2012-11-20

    申请号:CA2568500

    申请日:2005-05-10

    Applicant: IBM

    Abstract: Techniques for generating dither masks are provided. A dither mask is generated by selecting a sequence of at least three original patterns comprising pixels of at least one of a first color and a second color. At least two patterns are interpolated to generate interpolated patterns in the sequence between the at least three original patterns. If a pattern having at least one specified characteristic exists in the sequence, the steps of interpolating between at least two patterns, and determining if a pattern having at least one specified characteristic exists in the sequence, are repeated. The interpolation is between at least one pattern from each side of the pattern having at least one specified characteristic in the sequence.

    METHODS AND APPARATUS FOR GENERATING DITHER MASK THROUGH INTERPOLATION BETWEEN PREFERRED PATTERNS

    公开(公告)号:CA2568500A1

    公开(公告)日:2005-12-15

    申请号:CA2568500

    申请日:2005-05-10

    Applicant: IBM

    Abstract: Techniques for generating dither masks are provided. A dither mask is generated by selecting a sequence of at least three original patterns comprising pixels of at least one of a first color and a second color. At least two patterns are interpolated to generate interpolated patterns in the sequence between the at least three original patterns. If a pattern having at least one specified characteristic exists in the sequence, the steps of interpolating between at least two patterns, and determining if a pattern having at least one specified characteristic exists in the sequence, are repeated. The interpolation is between at least one pattern from each side of the pattern having at least one specified characteristic in the sequence.

    MULTIPLE LASER BEAM SCANNING OPTICS

    公开(公告)号:CA2018931C

    公开(公告)日:1995-09-26

    申请号:CA2018931

    申请日:1990-06-13

    Applicant: IBM

    Abstract: A multiple laser beam scanning optical system for correcting monochromatic and polychromatic aberrations comprising a doublet cylindrical lens for receiving the multiple beams and directing them to a rotating polygonal mirror. Scanning lens means are located to receive the beams from the mirror and direct them to the image plane. The scanning lens is comprised of at least one doublet wherein both elements have approximately the same index of refraction but different dispersion factors at a nominal wavelength.

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