公开(公告)号：JP2001092135A

公开(公告)日：2001-04-06

申请号：JP2000239755

申请日：2000-08-08

Applicant: IBM

Inventor： ANGELOPOULOS MARIE ,  EDWARD D BABICHI ,  INNA V BABICHI ,  CATHERINE E BABICHI ,  JAMES J BACHINAANO ,  PETRILLO KAREN E ,  STEPHEN A RISHUTON

IPC: G03F7/033 ,  C08F20/26 ,  G03F7/038 ,  G03F7/075 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a chemically unamplified new negative type gradiation photoresist having high resolution and high sensitivity and developable in water or in an aqueous solution. SOLUTION: Based on the rearrangement of a carbon-oxygen bond in pendant ester group of the polymer, the (photo)resist crosslinks polymer chains and does not require the addition of a supplemental photocatalyst, a photoinitiator or a crosslinking agent.