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公开(公告)号：US3700498A
公开(公告)日：1972-10-24
申请号：US3700498D
申请日：1970-12-10
Applicant: IBM
Inventor： KANAZAWA KAY KEIJI , SEKI HAJIME , STREET GEORGE BRYAN
CPC classification number: G03G5/082 , C23C14/0623
Abstract: ELECTROPHOTOGRAPHIC PLATES ARE FORMED BY DEPOSITING A LAYER OF BETA PHASE POLYCRYSTALLINE AS4S4 BY EVAPORATION UNDER VACUUM ONTO AN ELECTRICALLY CONDUCTIVE SUBSTRATE HELD AT A TEMPERATURE BETWEEN 100*C. AND 200*C.
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Patent Agency Ranking
公开(公告)号：US3915698A
公开(公告)日：1975-10-28
申请号：US49744274
申请日：1974-08-14
Applicant: IBM
Inventor： LEE KENNETH , STREET GEORGE BRYAN , SUITS JAMES CARR
Abstract: Manganese bismuth is stabilized in the high temperature (Beta) phase by the addition of small amounts of either rhodium or ruthenium.
Abstract translation: 锰铋通过添加少量的铑或钌在高温（β）相中稳定。
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公开(公告)号：US3666554A
公开(公告)日：1972-05-30
申请号：US3666554D
申请日：1970-12-10
Applicant: IBM
Inventor： KANAZAWA KAY KEIJI , STREET GEORGE BRYAN
CPC classification number: G03G5/08207
Abstract: A PROCESS FOR PREPARING AN ELECTROPHOTOGRAPHIC PLATE BY EVAPORATING UNDER VACUUM ONTO A CONDUCTIVE SUBSTRATE HELD AT A TEMPERATURE OF FROM 50*C. TO 80*C. A LAYER CONSISTING ESSENTIALLY OF EQUAL ATOMIC PROPORTIONS OF SELENIUM AND SULFUR.
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公开(公告)号：DE2532655A1
公开(公告)日：1976-03-04
申请号：DE2532655
申请日：1975-07-22
Applicant: IBM
Inventor： LEE KENNETH , STREET GEORGE BRYAN , SUITS JAMES CARR
Abstract: Manganese bismuth is stabilized in the high temperature (Beta) phase by the addition of small amounts of either rhodium or ruthenium.
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公开(公告)号：DE2407188A1
公开(公告)日：1974-10-24
申请号：DE2407188
申请日：1974-02-15
Applicant: IBM
Inventor： LEE KENNETH , STREET GEORGE BRYAN , SUITS JAMES CARR
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