公开(公告)号：DE1915084A1

公开(公告)日：1970-04-02

申请号：DE1915084

申请日：1969-03-25

Applicant: IBM

Inventor： HENRY COLLINS ROBERT ,  THOMAS DEVERSE FRANK

IPC: C08L7/00 ,  C08K5/04 ,  C08L21/00 ,  G03F7/008 ,  G03F7/038 ,  H01L21/027 ,  H01L23/29 ,  H01L19/00

Abstract: 1,256,756. Photographic materials. INTERNATIONAL BUSINESS MACHINES CORP. June 6, 1969 [June 17, 1968], No.28637/69. Heading G2C. [Also in Division B6] A photo-sensitive material comprises a synthetic or natural isoprene rubber containing photo-resist and a plasticizer which is an ester of molecular weight less than 500. Specified plasticizers are mono- or dialkyl or -alkyl phthalates, maleates or adipates. The specified sensitizer for the resist is an azide. The materials are used to produce semi-conductors using an oxide coated silica wafer as support or are used to produce printing plates.

公开(公告)号：DE1915085A1

公开(公告)日：1970-03-05

申请号：DE1915085

申请日：1969-03-25

Applicant: IBM

Inventor： HENRY COLLINS ROBERT ,  THOMAS DEVERSE FRANK

IPC: G03F7/075 ,  H01L21/312 ,  H01L29/00 ,  C09J3/00

Abstract: 1,262,513. Improvements in photo-resist adhesion. INTERNATIONAL BUSINESS MACHINES CORP. June 23, 1969 [July 2, 1968], No.31561/69. Heading G2C. A coating of photo-resist material is applied to an oxide surface with a hexa-alkyldisilazane containing adhesive. The surface may be a silicon oxide surface, and the hexa-alkyldisilazane may be hexamethyl- or hexaethyldisilazane. The photoresist material preferably contains polyvinyl annaniate, polyisoprene, natural rubber resin, formaldehyde novolak, cinnamylidene or polyacrylic ester, and may be a partially cyclized polymer of cis-1, 4-isoprene having an average molecular weight of 60 000 to 70 000 and an azide photoinitiator. The oxide surface may be precoated with the adhesive and the photo-resist material applied to the adhesive, or the adhesive may be admixed with the photo-resist material and the admixture applied to the oxide surface. The invention is described principally in terms of preparing semi-conductor devices, but has general applicability to any process which requires application of a photo-resist to an oxide surface. This invention prevents the tendency of the exposed and developed photo-resist coating to curl away from the substrate.