公开(公告)号：CA890379A

公开(公告)日：1972-01-11

申请号：CA890379D

Applicant: IBM

Inventor： GLANG REINHARD ,  HOLMWOOD RICHARD A ,  MAISSEL LEON I ,  VERGNOLLE JEAN

公开(公告)号：GB1186669A

公开(公告)日：1970-04-02

申请号：GB748469

申请日：1969-02-12

Applicant: IBM

Inventor： VERGNOLLE JEAN

IPC: C23C14/34 ,  C23C14/35 ,  H01J37/34

Abstract: 1,186,669. Sputtering apparatus. INTERNATIONAL BUSINESS MACHINES CORP. Feb.12, 1969 [Feb.21, 1968], No.7484/69. Heading C7F. A target electrode for sputtering, e.g. three different materials, comprises a mosaic of cells, each cell having members 7, 10, 12 made of or carrying the different materials and each electrically insulated from each other. All the heads of the same material may be connected to a supply of A.C. or D.C. voltage. The materials may be deposited simultaneously or successively, and may be Nb and Sn to form Nb 3 Sn.