公开(公告)号：DE2809359A1

公开(公告)日：1978-09-28

申请号：DE2809359

申请日：1978-03-04

Applicant: IBM

Inventor： VOGEL MARCEL JOSEPH ,  VOGEL SIEGFRIED FRIEDRICH

IPC: G11C11/14 ,  G01B3/02 ,  G01B11/30 ,  G01N27/04 ,  G01N27/20 ,  G03F7/20 ,  H01F10/00 ,  H01L23/544 ,  H01L21/66 ,  G11C19/08 ,  H01L29/76

Abstract: A wafer indexing and mapping system is useful for precisely locating artifacts, defects, and fabricated structural components on a wafer. A permanent micrometer grid pattern is applied to the backside of the wafer, for example, a transparent bubble wafer. The grid pattern forms an array of uniform size cells, for example, 40 unit cells wide by 40 unit cells long. Each unit cell is divided into smaller units on each side. Each cell contains a coding or indexing system to identify the row and column of the cell in the grid pattern. The grid pattern contains orientation bars which identify orientation with respect to particular wafer reference lines. The simultaneous viewing of the wafer and the grid pattern permits an accurate permanent mapping of the artifacts, defects, and fabricated structural components on the wafer, as well as on the individual small chips formed by dicing the wafer.

公开(公告)号：DE1174443B

公开(公告)日：1964-07-23

申请号：DEI0015285

申请日：1958-08-22

Applicant: IBM DEUTSCHLAND

Inventor： JOHNSON DONALD DEAN ,  FLORES RALPH ,  VOGEL MARCEL JOSEPH

IPC: C09D5/23 ,  C09D129/10 ,  C09D163/00 ,  G11B5/62 ,  G11B5/72

公开(公告)号：GB1013445A

公开(公告)日：1965-12-15

申请号：GB1583962

申请日：1962-04-25

Applicant: IBM

Inventor： JOHNSON DONALD DEAN ,  FLORES RALPH ,  VOGEL MARCEL JOSEPH

IPC: C09D5/23 ,  C09D163/02 ,  G11B5/702

Abstract: A coating composition comprises a solution of a diglycidyl poly-ether of a polyhydric phenol having an epoxide equivalent not less than 450, polyvinyl methyl ether and a methylol phenol ether with an unsaturated aliphatic ether group containing at least three carbon atoms and optionally one or more halogen atoms, e.g. the allyl ether of methylol phenol. The eposy resins used are of the Epon series of general formula in which n is not greater than 12, e.g. Epon 1004. The composition may include a curing catalyst, e.g. pyromellitic dianhydride, dodecenyl succinic anhydride, methyl Nadic anhydride, tetrahydrophthalic anhydride, dimethyl cocoa amines, or, preferably, hexahydrophthalic anhydride. Butyrolactone and a silicone resin, e.g. a methylphenylpolysiloxane, may also be included in the compositions. Suitable solvents are toluene, xylol, isopropyl alcohol, isophorone and amyl ethyl ketone. The compositions may also include pigments, especially magnetic particles, e.g. magnetic iron oxide to give magnetic coatings, which may be applied to an aluminium disc for storing information.

公开(公告)号：DE1142032B

公开(公告)日：1963-01-03

申请号：DEJ0020483

申请日：1961-09-01

Applicant: IBM

Inventor： VOGEL MARCEL JOSEPH

IPC: H05B33/14