公开(公告)号：JP2005018063A

公开(公告)日：2005-01-20

申请号：JP2004183531

申请日：2004-06-22

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： MEDEIROS DAVID R ,  HUANG WU-SONG ,  WALLRAFF GREGORY M ,  HINSBERG BILL ,  HOULE FRANCES

IPC: G03F7/039 ,  G03F7/00 ,  G03F7/20 ,  G03F7/26 ,  G03F7/38 ,  G03F7/40 ,  H01L21/027

CPC classification number: G03F7/265 ,  G03F7/38

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic imaging method for use in the manufacture of an integrated circuit composed of patterned structure or other similarly patterned structures of very high resolution, the patterned structure having especially a feature with a half pitch of about 50 nm or less.
SOLUTION: Lithographic imaging of a 50 nm (or less) half-pitch feature in a chemically amplified resist (usually used in the manufacture of an integrated circuit) is made possible by the use of reduced temperature post-exposure processing and a low activation energy chemically amplified resist. The post-exposure processing preferably involves ambient to moderately elevated temperature and the presence of a deprotection reaction-dependent co-reactant (e.g. water).
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供一种平版印刷成像方法，用于制造由图案化结构或其它具有非常高分辨率的类似图案化结构组成的集成电路，该图案化结构特别地具有半间距为约 50nm以下。 解决方案：化学放大型抗蚀剂（通常用于制造集成电路）中的50nm（或更少）半间距特征的平版印刷成像可以通过使用降低温度的曝光后处理和 低活化能化学放大抗蚀剂。 曝光后处理优选包括环境温度至适度升高的温度和脱保护反应依赖性共反应物（例如水）的存在。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004046098A

公开(公告)日：2004-02-12

申请号：JP2003128938

申请日：2003-05-07

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： ALLEN ROBERT DAVID ,  GREGORY BUREITA ,  BROCK PHILLIP ,  DIPIETRO RICHARD A ,  FENZEL-ALEXANDER DEBRA ,  LARSON CARL ,  MEDEIROS DAVID ,  PFEIFFER DIRK ,  SOORIYAKUMARAN RATNAM ,  TRUONG HOA D ,  WALLRAFF GREGORY M

IPC: C08F20/22 ,  C08F220/28 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

CPC classification number: C08F220/22 ,  C08F220/28 ,  G03F7/0046 ,  G03F7/0382 ,  Y10S430/108

Abstract: PROBLEM TO BE SOLVED: To provide a photoresist composition containing a polymer having at least one methacrylate monomer and to provide a method of pattering a substrate using the photoresist composition. SOLUTION: The photoresist composition contains a methacrylate monomer of formula 1 where R 1 represents hydrogen (H), a linear or branched 1-20C alkyl group or a semi- or perfluorinated linear or branched 1-20C alkyl group; where R 2 represents an unsubstituted aliphatic group or a substituted aliphatic group having zero or one trifluoromethyl (CF 3 ) group bonded to each carbon of the substituted aliphatic group or a substituted or unsubstituted aromatic group; and where R 3 represents hydrogen (H), methyl (CH 3 ), trifluoromethyl (CF 3 ), difluoromethyl (CHF 2 ) or fluoromethyl (CH 2 F). COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2004205505A

公开(公告)日：2004-07-22

申请号：JP2003417329

申请日：2003-12-15

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： BROCK PHILLIP J ,  DIPIETRO RICHARD A ,  FENDER NICOLETTE S ,  MILLER ROBERT D ,  SWANSON SALLY A ,  WALLRAFF GREGORY M

IPC: C12N15/09 ,  G01N33/543 ,  G01N33/547

CPC classification number: G01N33/54393 ,  G01N33/54353

Abstract: PROBLEM TO BE SOLVED: To provide a series of surface coupled linker molecules able to be brought into an optically active form used for preparing a bio-molecule microarray.
SOLUTION: A composition contains a solid substrate, an organic coupling group having one terminal part coupled to the solid substrate and having at least another terminal part containing an alcoholic or carbonyl functional group, and a protection group unstable against an acid selected from a group comprising an acetal or a ketal coupled to the alcoholic or carbonyl functional group. The present invention describes also a composition containing the solid substrate, the organic coupling group having the one terminal part coupled to the solid substrate, and having at least another terminal part containing an aldehyde. The present invention provides also a composition containing the solid substrate, and at least one photoacid generator or sensitizer coupled to the solid substrate.
COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2001290264A

公开(公告)日：2001-10-19

申请号：JP2001039108

申请日：2001-02-15

Applicant: IBM

Inventor： DONALD C HOFER ,  SCOTT A MCDONALD ,  ARUPAN P MAHARUWARA ,  MILLER ROBERT D ,  JOSEPH MITCHELL ,  WALLRAFF GREGORY M

IPC: C08K5/55 ,  C08L25/04 ,  C08L33/12 ,  C08L101/02 ,  G03F7/004 ,  G03F7/039 ,  G03F7/26 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a resist composition which is transparent in the wavelength range of UV to a shorter wave and can utilize oxygen reactive ion etching using an additive in place of phenols. SOLUTION: The photoresist composition contains a polymer having an acid labile group, hydroxycarborane and a photo-acid generating agent. When the composition is used as an upper layered resist for two-layer thin film imaging lithography, the resist has superior transmittance to an illuminant of a wavelength in the extreme-ultraviolet region and has superior workability in the production of a semiconductor device.