公开(公告)号：MY122873A

公开(公告)日：2006-05-31

申请号：MYPI20021340

申请日：2002-04-11

Applicant: IBM

Inventor： PUSHKARA RAO VARANASI ,  MARGARET C LAWSON ,  WENJI LI

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: ACID-CATALYZED POSITIVE RESIST COMPOSITIONS WHICH ARE IMAGEABLE WITH 193 NM RADIATION AND/OR POSSIBLY OTHER RADIATION AND ARE DEVELOPABLE TO FORM RESIST STRUCTURES OF IMPROVED DEVELOPMENT CHARACTERISTICS AND IMPROVED ETCH RESISTANCE ARE ENABLED BY THE USE OF RESIST COMPOSITIONS CONTAINING IMAGING POLYMER HAVING A MONOMER WITH A PENDANT GROUP CONTAINING PLURAL ACID LABILE MOIETIES. PREFERRED PENDANT GROUPS CONTAINING PLURAL ACID LABILE MOIETIES ARE CHARACTERIZED BY THE PRESENCE OF A BULKY END GROUP.