1.
    发明专利
    未知

    公开(公告)号:DE69333248T2

    公开(公告)日:2004-04-29

    申请号:DE69333248

    申请日:1993-04-08

    Abstract: The present invention is an apparatus for cleaning semi-conductor solid surfaces using a spray of frozen cryogen, such as argon, to impinge on the solid surface to remove contaminant particles. The apparatus includes an appropriate nozzle positioned in a housing designed for ultra clean conditions including sweep gas supply and evacuation conduits and a support table movably positioned within the housing to controllably convey the semi-conductor solid surface on a track under the spray of frozen cryogen emanating from the nozzle.

    5.
    发明专利
    未知

    公开(公告)号:ES2208635T3

    公开(公告)日:2004-06-16

    申请号:ES93105827

    申请日:1993-04-08

    Abstract: The present invention is an apparatus for cleaning semi-conductor solid surfaces using a spray of frozen cryogen, such as argon, to impinge on the solid surface to remove contaminant particles. The apparatus includes an appropriate nozzle positioned in a housing designed for ultra clean conditions including sweep gas supply and evacuation conduits and a support table movably positioned within the housing to controllably convey the semi-conductor solid surface on a track under the spray of frozen cryogen emanating from the nozzle.

    6.
    发明专利
    未知

    公开(公告)号:DE69333248D1

    公开(公告)日:2003-11-20

    申请号:DE69333248

    申请日:1993-04-08

    Abstract: The present invention is an apparatus for cleaning semi-conductor solid surfaces using a spray of frozen cryogen, such as argon, to impinge on the solid surface to remove contaminant particles. The apparatus includes an appropriate nozzle positioned in a housing designed for ultra clean conditions including sweep gas supply and evacuation conduits and a support table movably positioned within the housing to controllably convey the semi-conductor solid surface on a track under the spray of frozen cryogen emanating from the nozzle.

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