公开(公告)号：DE10060628A1

公开(公告)日：2002-01-31

申请号：DE10060628

申请日：2000-12-06

Applicant: INFINEON TECHNOLOGIES AG

Inventor： BERGER RUDOLF ,  ZAPF JUERGEN ,  EICHINGER ANDREAS

IPC: H01L21/00 ,  H01L21/324 ,  H01L21/302

Abstract: A rapid thermal process (RTP) reactor comprises a reactor block (2) for short-time temperature processes; a number of heat sources (6) arranged in the block; a chamber (5) for a substrate (8) between the heat sources; and an upper exchange plate (12) having diffusing optical properties for reducing contamination of the chamber by material vaporized from the substrate. An Independent claim is also included for a process for operating an RTP reactor. Preferred Features: The optical properties are achieved using a uniform dull surface on the exchanging plate. The chamber is made of quartz glass. Quartz lamps are used as the heat sources.