公开(公告)号：JP2003115467A

公开(公告)日：2003-04-18

申请号：JP2002211612

申请日：2002-07-19

Applicant: INFINEON TECHNOLOGIES AG

Inventor： GEYER STEFAN ,  FISCHER ANDREAS

IPC: B24B37/04 ,  B24B57/02 ,  H01L21/304 ,  B24B37/00

Abstract: PROBLEM TO BE SOLVED: To provide means for preventing such a phenomenon as particles aggregate in the opening region of the slurry output in a CMP system arrangement. SOLUTION: The valve means having a slurry outlet opening in a chemical mechanical polishing system, more specifically a chemical mechanical polishing system of a semiconductor wafer in the production of DRAM, characterizes a resilient barrier wall (2) covering the slurry outlet opening (1) and having at least one automatic closing opening (3) wherein the opening can be shifted to a position for passing slurry and when slurry does not flow, the opening is shifted automatically to a position for blocking slurry.

公开(公告)号：DE10137577C1

公开(公告)日：2003-03-06

申请号：DE10137577

申请日：2001-07-31

Applicant: INFINEON TECHNOLOGIES AG

Inventor： GEYER STEFAN ,  FISCHER ANDREAS

IPC: B24B37/04 ,  B24B57/02 ,  H01L21/304 ,  F16K7/12 ,  H01L21/306

Abstract: A valve for a slurry outlet opening in an installation for chemical mechanical polishing, in particular of semiconductor wafers in DRAM production, includes an elastic diaphragm, which covers the slurry outlet opening and has at least one self-closing opening. It is possible for the opening to be moved into a feedthrough position for the slurry by flowing slurry and to be automatically moved into a blocking position for the slurry when the slurry is not flowing. A CMP installation having such a valve is also provided. This creates a simple way of preventing particle agglomerations in the region of the fluid outlet opening of a CMP installation.

公开(公告)号：DE10020133B4

公开(公告)日：2004-03-18

申请号：DE10020133

申请日：2000-04-14

Applicant: INFINEON TECHNOLOGIES AG

Inventor： FISCHER ANDREAS ,  GEYER STEFAN

IPC: G01N30/00 ,  B01D43/00

公开(公告)号：DE10020133A1

公开(公告)日：2001-10-25

申请号：DE10020133

申请日：2000-04-14

Applicant: INFINEON TECHNOLOGIES AG

Inventor： FISCHER ANDREAS ,  GEYER STEFAN

IPC: G01N30/00 ,  B01D43/00

Abstract: An apparatus for fractionating particles in a liquid comprises a separating channel (30) through which a liquid stream containing particles flows. The surfaces (47) of the channel facing the liquid stream are covered with a hydrophobic layer (15). Preferred Features: The hydrophobic layer has a thickness of approximately 50 microns m. The separating channel is limited by two metal blocks (5) spaced using a foil (20). The metal blocks are made from copper.