Abstract:
PROBLEM TO BE SOLVED: To provide a high-density integrated circuit device by which a floating body effect of a transistor can be avoided. SOLUTION: A vertical MOS transistor includes a series of layers SF, SF* arranged on a first conductive type substrate 1. The series of layers comprise a lower layer U for a first source/drain region, an intermediate layer M doped with a first conductive type to act as a channel region, and an upper layer O for a second source/drain region. A connection structure V doped with the first conductive type is arranged on a first surface of the series of layers SF, SF* to electrically connect the channel region to the substrate 1. A gate electrode of the transistor is arranged on a second surface of the series of layers SF, SF*. The connection structure V can be arranged between the series of layers SF, SF* and the same or another series of layers SF, SF*. The dimension of the connection structure V or the like can be a lithography dimension or less. The manufactured circuit is suitable for a storage cell arrangement. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
The sensor for detecting macromolecular biomolecules comprises a radiation detector and a radiolucent adhesive layer, which is arranged above the radiosensitive side of the radiation detector and which is provided as to enable scavenger molecules to bind to the adhesive layer. The existence of macromolecular biomolecules, which are complementary or specific to the structure of the scavenger molecules, in the solution to be examined can be concluded based on the evaluation of radiation detector output signals.
Abstract:
The invention relates to a method of detecting macromolecular biopolymers by means of an electrode arrangement that comprises a first and a second electrode. The inventive method is characterized by carrying out a first electrical measurement on the electrodes. In a further step, a solution to be examined, which may contain the macromolecular biopolymers to be detected, is contacted with the electrode arrangement. In another step, the macromolecular biopolymers to be detected that are contained it the solution to be examined are bound to the scavenger molecules on the first and on the second electrode and the electrode arrangement is contacted with a reagent to increase conductivity of the macromolecular biopolymers, said reagent binding to the macromolecular biopolymers and bestowing them with electroconductivity. A second electrical measurement is carried out on the electrodes and the macromolecular biopolymers are detected on the basis of the comparison of the results of the two electrical measurements on the electrodes.
Abstract:
According to the inventive method, at least one unit is provided for immobilizing macromolecular biopolymers, said unit being incorporated in a substrate or applied to said substrate. The at least one immobilizing unit is provided with scavenger molecules. A sample which can contain the macromolecular biopolymers to be detected is then brought into contact with the at least one immobilizing unit. Macromolecular biopolymers contained in the sample are bound to the scavenger molecules. The production of a chemiluminescence signal is induced by means of a marking and the chemiluminescence signal is detected by a detection unit embodied in the substrate in the form of an integrated circuit, whereby the macromolecular biopolymers are detected.
Abstract:
The invention relates to a substrate (600) which is provided with a support layer (501). An insulator layer (502) is applied to the support layer (501), comprising at least two areas having respectively different thicknesses. A semi-conductor layer (303) having an FD-area (304) and a PD-area (305) is applied to the surface of the insulating layer (502), comprising a planar surface. The planar surface is the surface which is opposite the insulating layer (502).
Abstract:
The invention relates to NROM memory cells that are disposed in trenches that are etched into the semiconductor material. The memory layer composed of a nitride layer (3) that is interposed between two oxide layers (2, 4) is applied to the trench walls before the dopants for source and drain (7) are implanted. The implantation regions of source and drain are thus prevented from being damaged by the high temperature loads of the component during production of the memory layer as the respective dopant is introduced only later on. Polysilicon gate electrodes (5) are connected to word lines (11).
Abstract:
The biochip comprises a substrate, at least one sensor, arranged on or in the substrate and an electrically conducting permeation layer, arranged at a given, non-zero separation from the surface of the substrate, to which an electrical voltage may be applied. The biochip arrangement may be used, for example, as a DNA sensor, whereby a receptor molecule, immobilised on the sensor electrode, hybridises a DNA molecule and thus an electrical sensor signal which may be drawn from between sensor electrodes, is influenced in a characteristic manner.
Abstract:
The invention relates to a transistor-arrangement (200) with a substrate (201) and a vertical transistor, comprising a first electrode area (204), a second electrode area (205) arranged essentially thereabove, a channel area (203) arranged therebetween, in addition to a gate-area (207) and a channel area (203) and an electrically insulating sequence of layers (206) arranged therebetween, whereby two spatially separate sections (208, 209) of the electrically insulating sequence of layers (206) act as charge carriers for storage purposes.
Abstract:
The invention relates to a transistor that is provided with a first source/drain area (S/D1), a channel area (KA) adjacent thereto, a second source/drain area (S/D 2) adjacent thereto, a gate dielectric and a gate electrode. A first capacitor electrode (SP) of the capacitor is connected to the first source/drain area (S/D1). An insulating structure entirely surrounds an insulating area of the circuit arrangement. At least the first capacitor electrode (SP) and the first source/drain area (S/D1) are arranged in the insulating area. The second source/drain area (S/D2) and the second capacitor electrode of the capacitor are arranged outside the insulating area. The insulating structure prevents the first capacitor electrode (SP) from loosing charge through leaking currents between charging and discharging of the capacitor. A tunnel barrier (T) which is arranged in the channel area (KA) is part of the insulating structure. A capacitor dielectric (KD) that separates the first capacitor electrode (SP) from the second capacitor electrode is part of the insulating structure.
Abstract:
The invention relates to a memory cell, memory cell arrangement, structuring arrangement and method for production of a memory cell. The memory cell has a vertical gate transistor and a memory capacitor, whereby the vertical gate transistor comprises a semiconducting nanostructure, grown on at least part of the memory capacitor.