公开(公告)号：DE59813748D1

公开(公告)日：2006-11-16

申请号：DE59813748

申请日：1998-02-20

Applicant: INFINEON TECHNOLOGIES AG

Inventor： KERSCH ALFRED DR ,  SCHAFBAUER THOMAS

IPC: G01K7/02 ,  H01L21/00 ,  G01K7/04 ,  H01L21/205 ,  H01L21/26 ,  H01L21/324

Abstract: An apparatus for processing a substrate wafer wherein the apparatus includes a reaction chamber, a wafer holder intended to hold the substrate wafer, and a susceptor. A temperature sensor, preferably a thermocouple with two junctions, is provided for measuring the difference between the temperatures at the site of the susceptor and at a site between the susceptor and the substrate wafer.