Patent search ap:("INFINEON TECHNOLOGIES AG") AND inv:"LIEBE ROMAN" Page 1

1.

发明专利
未知

公开(公告)号：DE10100820B4

公开(公告)日：2005-09-22

申请号：DE10100820

申请日：2001-01-10

Applicant: INFINEON TECHNOLOGIES AG

Inventor： KECK MARTIN , ZIEGLER WOLFRAM , LIEBE ROMAN

IPC: G03F1/00

2.

发明专利
Testing exposure mask involves transferring layout pattern to mask if structure density below threshold, checking mask for fault-free transfer, checking limited area if threshold exceeded 未知

公开(公告)号：DE10100820A1

公开(公告)日：2002-08-01

申请号：DE10100820

申请日：2001-01-10

Applicant: INFINEON TECHNOLOGIES AG

Inventor： KECK MARTIN , ZIEGLER WOLFRAM , LIEBE ROMAN

IPC: G03F1/00

Abstract: The method involves producing a layout pattern from a circuit design, determining the structural density in the pattern and, if it does not exceed a threshold value, transferring the pattern to the mask and checking for fault-free transfer of the pattern. If the threshold is exceeded in at least one area the area is indicated, the pattern is transferred after user release and the mask checked for faultless transfer up the indicated area(s).

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