公开(公告)号：DE102005062917A1

公开(公告)日：2007-07-12

申请号：DE102005062917

申请日：2005-12-29

Applicant: INFINEON TECHNOLOGIES AG

Inventor： ERBEN ELKE ,  JAKSCHIK STEFAN ,  KERSCH ALFRED ,  LINK ANGELA ,  SUNDQVIST JONAS

IPC: H01L21/314 ,  C23C16/455 ,  H01L21/205 ,  H01L21/3205

公开(公告)号：DE102006023046A1

公开(公告)日：2007-11-22

申请号：DE102006023046

申请日：2006-05-17

Applicant: INFINEON TECHNOLOGIES AG

Inventor： KERSCH ALFRED ,  LINK ANGELA ,  SUNDQVIST JONAS ,  ERBEN ELKE

IPC: C23C16/448 ,  C23C16/455

Abstract: A method and apparatus for providing a gaseous precursor for a coating process. A starting material having a pulverulent precursor material is heated in order to cause a vaporization of the pulverulent precursor material, whereby a gaseous precursor is produced. A carrier gas is flowed past the starting material at a distance minimizing or preventing a convective gas flow, while transporting the gaseous precursor to a processing region containing a wafer to be coated.