2.
    发明专利
    未知

    公开(公告)号:DE10253919B4

    公开(公告)日:2004-09-23

    申请号:DE10253919

    申请日:2002-11-19

    Abstract: The unevennesses of a chuck are measured at various positions and are stored, as discrepancies from an idealized plane, in a databank. The measured discrepancies are used to calculate corrections for the predetermined settings for the focus distance and/or the tilt of the chuck. These corrections are in each case used differently for adjusting the respective exposure of the exposure areas.

    4.
    发明专利
    未知

    公开(公告)号:DE10253919A1

    公开(公告)日:2004-07-08

    申请号:DE10253919

    申请日:2002-11-19

    Abstract: The unevennesses of a chuck are measured at various positions and are stored, as discrepancies from an idealized plane, in a databank. The measured discrepancies are used to calculate corrections for the predetermined settings for the focus distance and/or the tilt of the chuck. These corrections are in each case used differently for adjusting the respective exposure of the exposure areas.

Patent Agency Ranking