Patent search ap:("INFINEON TECHNOLOGIES AG") AND inv:"SCHILZ CHRISTOF" Page 1

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发明专利
Half tone phase mask, used in the production of integrated circuits comprises, a half tone region having a strongly reduced transmission and a phase-rotating property based on a neighboring second region which is transparent to light 未知

公开(公告)号：DE10208756A1

公开(公告)日：2003-10-02

申请号：DE10208756

申请日：2002-02-28

Applicant: INFINEON TECHNOLOGIES AG

Inventor： NOELSCHER CHRISTOPH , SCHILZ CHRISTOF , THIELE JOERG

IPC: G03F1/00 , G03F7/20 , G03F1/14

Abstract: Half tone phase mask comprises a half tone region (A) having a strongly reduced transmission and a phase-rotating property based on a neighboring second region (B) which is transparent to light. A phase rotation occurs in the transparent region through a corresponding path when light passes through the path of the absorber thickness in the first region. Independent claims are also included for the following: (1) process for the production of a half tone phase mask; and (2) process for the production of an alternating phase mask.

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