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公开(公告)号：DE10232179A1
公开(公告)日：2004-02-05
申请号：DE10232179
申请日：2002-07-16
Applicant: INFINEON TECHNOLOGIES AG
Inventor： SABISCH WINFRIED , KERSCH ALFRED , SCHULZE-ICKING GEORG , WITKE THOMAS , ZEDLITZ RALF
Abstract: A PVD method and a PVD apparatus use a rotating magnetic field in order to increase the yield. The magnetic field is provided such that it essentially vanishes, at least in a time average, outside a rotation axis of the magnetic field in sectors of the target region of the PVD apparatus. In this manner the PVD method and the PVD apparatus achieve a uniform coating.
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