公开(公告)号：JP2000310845A

公开(公告)日：2000-11-07

申请号：JP2000092102

申请日：2000-03-29

Applicant: INFINEON TECHNOLOGIES CORP

Inventor： CARPI ENIO LUIZ ,  BESENBOCK WOLFGANG

IPC: G03F1/00 ,  G03F1/78 ,  G03F7/20 ,  H01L21/027 ,  G03F1/08

Abstract: PROBLEM TO BE SOLVED: To reduce corner rounding in a reticle production method and to lessen the need for an add-on structure in a reticule production process by using an elliptical cross-sectional surface-shaped edge of an energy beam for forming the corner of a pattern. SOLUTION: A mask 102 is mounted at a stage or positioner 106 or an equivalent positioning device. The stage 106 is capable of exactly positioning the mask 102 including its rotation. A lens system 104 is disposed in order to focus a laser/electron spot 112 formed by an energy source 110. The lens system 104 controls the size and shape of the spot used for forming the pattern on the mask 102. The laser/electron spot 112 formed to the elliptic shape is formed by using the lens system 104. The ellipticity of the beam is formed and controlled by the astigmatism of the lens system 104, by which its dimensions are changed.