公开(公告)号：US12288807B2

公开(公告)日：2025-04-29

申请号：US18367843

申请日：2023-09-13

Applicant: Intel Corporation

Inventor： Aaron Lilak ,  Rishabh Mehandru ,  Willy Rachmady ,  Harold Kennel ,  Tahir Ghani

IPC: H01L29/08 ,  H01L21/02 ,  H01L21/8238

Abstract: A device is disclosed. The device includes a channel, a first source-drain region adjacent a first portion of the channel, the first source-drain region including a first crystalline portion that includes a first region of metastable dopants, a second source-drain region adjacent a second portion of the channel, the second source-drain region including a second crystalline portion that includes a second region of metastable dopants. A gate conductor is on the channel.

公开(公告)号：US12100705B2

公开(公告)日：2024-09-24

申请号：US17825664

申请日：2022-05-26

Applicant: Intel Corporation

Inventor： Yih Wang ,  Rishabh Mehandru ,  Mauro J. Kobrinsky ,  Tahir Ghani ,  Mark Bohr ,  Marni Nabors

IPC: H01L27/06 ,  H01L21/768 ,  H01L21/8234 ,  H01L23/522 ,  H01L27/088 ,  H01L29/66 ,  H01L29/78

CPC classification number: H01L27/0688 ,  H01L21/76877 ,  H01L21/823431 ,  H01L23/5226 ,  H01L27/0886 ,  H01L29/66545 ,  H01L29/66795 ,  H01L29/785

Abstract: Described herein are apparatuses, methods, and systems associated with a deep trench via in a three-dimensional (3D) integrated circuit (IC). The 3D IC may include a logic layer having an array of logic transistors. The 3D IC may further include one or more front-side interconnects on a front side of the 3D IC and one or more back-side interconnects on a back side of the 3D IC. The deep trench may be in the logic layer to conductively couple a front-side interconnect to a back-side interconnect. The deep trench via may be formed in a diffusion region or gate region of a dummy transistor in the logic layer. Other embodiments may be described and claimed.

公开(公告)号：US11901457B2

公开(公告)日：2024-02-13

申请号：US16700431

申请日：2019-12-02

Applicant: Intel Corporation

Inventor： Szuya S. Liao ,  Rahul Pandey ,  Rishabh Mehandru ,  Anupama Bowonder ,  Pratik Patel

IPC: H01L29/78 ,  H01L29/08 ,  H01L27/088 ,  H01L29/66

CPC classification number: H01L29/7853 ,  H01L27/0886 ,  H01L29/0847 ,  H01L29/66795

Abstract: Fin shaping, and integrated circuit structures resulting therefrom, are described. For example, an integrated circuit structure includes a semiconductor fin having a protruding fin portion above an isolation structure above a substrate. The protruding fin portion has substantially vertical upper sidewalls and outwardly tapered lower sidewalls. A gate stack is over and conformal with the protruding fin portion of the semiconductor fin. A first source or drain region is at a first side of the gate stack, and a second source or drain region is at a second side of the gate stack opposite the first side of the gate stack.

公开(公告)号：US11869890B2

公开(公告)日：2024-01-09

申请号：US16651233

申请日：2017-12-26

Applicant: Intel Corporation

Inventor： Ravi Pillarisetty ,  Willy Rachmady ,  Gilbert Dewey ,  Rishabh Mehandru ,  Jack T. Kavalieros

IPC: H01L27/092 ,  H01L21/768 ,  H01L21/822 ,  H01L23/485 ,  H01L27/06 ,  H01L21/8234 ,  H01L27/088 ,  H01L21/8238

CPC classification number: H01L27/092 ,  H01L21/76898 ,  H01L21/8221 ,  H01L21/823871 ,  H01L23/485 ,  H01L27/0688

Abstract: An apparatus is provided which comprises: a first transistor comprising a source region and a drain region with a channel region therebetween, a first dielectric layer over the first transistor, a second transistor comprising a source region and a drain region with a channel region therebetween, wherein the second transistor is over the first dielectric layer, a second dielectric layer over the second transistor, and a contact coupled to the source region or the drain region of the first transistor, wherein the contact comprises a metal having a straight sidewall that extends from through both the first and second dielectric layers. Other embodiments are also disclosed and claimed.

公开(公告)号：US11854894B2

公开(公告)日：2023-12-26

申请号：US17112697

申请日：2020-12-04

Applicant: Intel Corporation

Inventor： Valluri R. Rao ,  Patrick Morrow ,  Rishabh Mehandru ,  Doug Ingerly ,  Kimin Jun ,  Kevin O'Brien ,  Paul Fischer ,  Szuya S. Liao ,  Bruce Block

IPC: H01L21/822 ,  H01L21/306 ,  H01L21/683 ,  H01L21/8238 ,  H01L21/66 ,  H01L23/528 ,  H01L23/532 ,  H01L23/00 ,  H01L27/092 ,  H01L27/12 ,  H01L29/04 ,  H01L29/06 ,  H01L29/08 ,  H01L29/16 ,  H01L29/20 ,  H01L29/66 ,  G01R1/073 ,  H01L25/065

CPC classification number: H01L21/8221 ,  H01L21/30625 ,  H01L21/6835 ,  H01L21/823807 ,  H01L21/823814 ,  H01L21/823821 ,  H01L21/823871 ,  H01L21/823878 ,  H01L22/14 ,  H01L23/528 ,  H01L23/53233 ,  H01L24/03 ,  H01L24/05 ,  H01L27/0924 ,  H01L27/1207 ,  H01L29/04 ,  H01L29/0696 ,  H01L29/0847 ,  H01L29/16 ,  H01L29/20 ,  G01R1/07307 ,  H01L24/08 ,  H01L25/0657 ,  H01L27/1214 ,  H01L27/1222 ,  H01L29/66545 ,  H01L2221/68345 ,  H01L2221/68363 ,  H01L2221/68381 ,  H01L2224/08147 ,  H01L2225/06565

Abstract: Integrated circuit cell architectures including both front-side and back-side structures. One or more of back-side implant, semiconductor deposition, dielectric deposition, metallization, film patterning, and wafer-level layer transfer is integrated with front-side processing. Such double-side processing may entail revealing a back side of structures fabricated from the front-side of a substrate. Host-donor substrate assemblies may be built-up to support and protect front-side structures during back-side processing. Front-side devices, such as FETs, may be modified and/or interconnected during back-side processing. Electrical test may be performed from front and back sides of a workpiece. Back-side devices, such as FETs, may be integrated with front-side devices to expand device functionality, improve performance, or increase device density.

公开(公告)号：US11824097B2

公开(公告)日：2023-11-21

申请号：US17667493

申请日：2022-02-08

Applicant: Intel Corporation

Inventor： Rishabh Mehandru ,  Pratik A. Patel ,  Ralph T. Troeger ,  Szuya S. Liao

IPC: H01L29/417 ,  H01L21/02 ,  H01L21/265 ,  H01L21/306 ,  H01L21/321 ,  H01L29/08 ,  H01L29/40 ,  H01L29/45 ,  H01L29/49 ,  H01L29/66

CPC classification number: H01L29/4175 ,  H01L21/0262 ,  H01L21/02576 ,  H01L21/02579 ,  H01L21/26513 ,  H01L21/30604 ,  H01L21/32115 ,  H01L29/0847 ,  H01L29/401 ,  H01L29/45 ,  H01L29/4991 ,  H01L29/665 ,  H01L29/6656

Abstract: Solid assemblies having a composite dielectric spacer and processes for fabricating the solid assemblies are provided. The composite dielectric spacer can include, in some embodiments, a first dielectric layer and a second dielectric layer having a mutual interface. The composite dielectric spacer can separate a contact member from a conductive interconnect member, thus reducing the capacitance between such members with respect to solid assemblies that include one of first dielectric layer or the second dielectric layer. The composite dielectric spacer can permit maintaining the real estate of an interface between the conductive interconnect and a trench contact member that has an interface with a carrier-doped epitaxial layer embodying or constituting a source contact region or a drain contact region of a field effect transistor. The trench contact member can form another interface with the conductive interconnect member, providing a satisfactory contact resistance therebetween.

公开(公告)号：US11640961B2

公开(公告)日：2023-05-02

申请号：US16954126

申请日：2018-03-28

Applicant: Intel Corporation

Inventor： Gilbert Dewey ,  Ravi Pillarisetty ,  Jack T. Kavalieros ,  Aaron D. Lilak ,  Willy Rachmady ,  Rishabh Mehandru ,  Kimin Jun ,  Anh Phan ,  Hui Jae Yoo ,  Patrick Morrow ,  Cheng-Ying Huang ,  Matthew V. Metz

IPC: H01L27/092 ,  H01L21/822 ,  H01L21/8238 ,  H01L29/78 ,  H01L27/06 ,  H01L29/06 ,  H01L29/08 ,  H01L29/66

Abstract: An integrated circuit structure comprises a lower device layer that includes a first structure comprising a plurality of PMOS transistors. An upper device layer is formed on the lower device layer, wherein the upper device layer includes a second structure comprising a plurality of NMOS transistors having a group III-V material source/drain region.

公开(公告)号：US11616015B2

公开(公告)日：2023-03-28

申请号：US17127863

申请日：2020-12-18

Applicant: Intel Corporation

Inventor： Patrick Morrow ,  Mauro J. Kobrinsky ,  Mark T. Bohr ,  Tahir Ghani ,  Rishabh Mehandru

IPC: H01L23/528 ,  H01L29/66 ,  H01L29/78 ,  H01L21/306 ,  H01L21/8234 ,  H01L27/02 ,  H01L27/088 ,  H01L29/08 ,  H01L29/10 ,  H01L29/40 ,  H01L21/768 ,  H01L29/417 ,  H01L29/772 ,  H01L23/522 ,  G06F30/392 ,  G06F30/394

Abstract: Transistor cell architectures including both front-side and back-side structures. A transistor may include one or more semiconductor fins with a gate stack disposed along a sidewall of a channel portion of the fin. One or more source/drain regions of the fin are etched to form recesses with a depth below the channel region. The recesses may extend through the entire fin height. Source/drain semiconductor is then deposited within the recess, coupling the channel region to a deep source/drain. A back-side of the transistor is processed to reveal the deep source/drain semiconductor material. One or more back-side interconnect metallization levels may couple to the deep source/drain of the transistor.

公开(公告)号：US11600696B2

公开(公告)日：2023-03-07

申请号：US16457347

申请日：2019-06-28

Applicant: Intel Corporation

Inventor： Rishabh Mehandru ,  Stephen Cea ,  Anupama Bowonder ,  Juhyung Nam ,  Willy Rachmady

IPC: H01L29/06 ,  H01L29/78 ,  H01L29/423 ,  H01L29/66

Abstract: Embodiments disclosed herein include transistor devices and methods of forming such transistor devices. In an embodiment a transistor comprises a substrate, and a fin that extends up from the substrate. In an embodiment, the fin comprises a source region, a drain region, and a channel region between the source region and the drain region. In an embodiment, the transistor further comprises and a cavity in the fin, where the cavity is below the channel region. In an embodiment, the transistor further comprises a gate stack over the fin.

公开(公告)号：US11522072B2

公开(公告)日：2022-12-06

申请号：US17080458

申请日：2020-10-26

Applicant: Intel Corporation

Inventor： Rishabh Mehandru ,  Patrick Morrow ,  Ranjith Kumar ,  Cory E. Weber ,  Seiyon Kim ,  Stephen M. Cea ,  Tahir Ghani

IPC: H01L29/45 ,  H01L29/16 ,  H01L29/66 ,  H01L29/78 ,  H01L21/822 ,  H01L21/8238 ,  H01L27/06 ,  H01L27/11 ,  H01L21/8234 ,  H01L21/84 ,  H01L27/108 ,  H01L27/12 ,  H01L29/778

Abstract: Vertical integration schemes and circuit elements architectures for area scaling of semiconductor devices are described. In an example, an inverter structure includes a semiconductor fin separated vertically into an upper region and a lower region. A first plurality of gate structures is included for controlling the upper region of the semiconductor fin. A second plurality of gate structures is included for controlling the lower region of the semiconductor fin. The second plurality of gate structures has a conductivity type opposite the conductivity type of the first plurality of gate structures.