METHOD AND STRUCTURE FOR CARRIER-LESS THIN WAFER HANDLING
    7.
    发明申请
    METHOD AND STRUCTURE FOR CARRIER-LESS THIN WAFER HANDLING 审中-公开
    无载体薄晶片处理的方法和结构

    公开(公告)号:WO2014100186A2

    公开(公告)日:2014-06-26

    申请号:PCT/US2013/076137

    申请日:2013-12-18

    Abstract: Methods of forming a microelectronic assembly and the resulting structures and devices are disclosed herein. In one embodiment, a method of forming a microelectronic assembly includes removing material exposed at portions of a surface of a substrate to form a processed substrate having a plurality of thinned portions separated by integral supporting portions of the processed substrate having a thickness greater than a thickness of the thinned portions, at least some of the thinned portions including a plurality of electrically conductive interconnects extending in a direction of the thicknesses of the thinned portions and exposed at the surface; and removing the supporting portions of the substrate to sever the substrate into a plurality of individual thinned portions, at least some individual thinned portions including the interconnects.

    Abstract translation: 本文公开了形成微电子组件以及所得到的结构和器件的方法。 在一个实施例中,一种形成微电子组件的方法包括:去除在衬底的表面的一部分处暴露的材料,以形成经处理的衬底,该衬底具有由经处理的衬底的整体支撑部分分隔的多个减薄部分,该整体支撑部分的厚度大于厚度 所述变薄部分中的至少一些包括多个导电互连,所述导电互连在所述变薄部分的厚度的方向上延伸并且在所述表面处暴露; 以及移除衬底的支撑部分以将衬底切割成多个单独的薄化部分,至少一些单独的薄化部分包括互连。

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