Abstract:
Structures and methods of forming the same are disclosed herein. In one embodiment, a structure can comprise a region having first and second oppositely facing surfaces. A barrier region can overlie the region. An alloy region can overlie the barrier region. The alloy region can include a first metal and one or more elements selected from the group consisting of silicon (Si), germanium (Ge), indium (Id), boron (B), arsenic (As), antimony (Sb), tellurium (Te), or cadmium (Cd).
Abstract:
A component 10 can include a substrate 20 and a conductive via 40 extending within an opening 30. The substrate 20 can have first and second opposing surfaces 21, 22. A dielectric material 60 can be exposed at an inner wall 32 of the opening 30. The conductive via 40 can define a relief channel 55 within the opening 30 adjacent the first surface 21. The relief channel 55 can have an edge 56 within a first distance D1 from the inner wall 32 in a direction D2 of a plane P parallel to and within five microns below the first surface 21, the first distance being the lesser of one micron and five percent of a maximum width of the opening 30 in the plane. The edge 56 can extend along the inner wall 32 to span at least five percent of a circumference of the inner wall.
Abstract:
Microelectronic assemblies and methods for making the same are disclosed herein. In one embodiment, a method of forming a microelectronic assembly comprises: assembling first and second components (102, 128) to have first major surfaces (104, 130) of the first and second components (102, 128) facing one another and spaced apart from one another by a predetermined spacing, the first component (102) having first and second oppositely-facing major surfaces (104, 106), a first thickness extending in a first direction between the first and second major surfaces (104, 106), and a plurality of first metal connection elements (112) at the first major surface (104), the second component (128) having a plurality of second metal connection elements (132) at the first major surface (130) of the second component (128); and then plating (electroplating or electroless plating) a plurality of metal connector regions (146) each connecting and extending continuously between a respective first connection element (112) and a corresponding second connection element (132) opposite the respective first connection element (112) in the first direction. The first and second metal connection elements (112, 132) may comprise metal vias (116, 134) in the components (102, 128) or metal pads (118) at the surface of the components (102, 128), the metal vias (116, 134) or the metal pads (118) being covered by plated metal regions (114). A first seed layer (126) may be formed overlying the major surface of the first component (102) before the plating process, wherein uncovered portions of the first seed layer (126) are removed after plating the metal connector regions (146). Similarly, a second seed layer (144) may be formed overlying the major surface of the second component (128). A plurality of barrier regions (152) may overlie the sidewalls of at least one of the metal connector regions (146), the first plated metal regions (114) or the second plated metal regions. At least some corresponding first and second metal connection elements (112, 132) may optionally not share a common axis. At least some first and second surfaces (113, 131) of the first metal connection elements (112) and the respective second metal connection elements (132) connected thereto may optionally not be parallel to a common plane.
Abstract:
A microelectronic assembly including a dielectric region, a plurality of electrically conductive elements, an encapsulant, and a microelectronic element are provided. The encapsulant may have a coefficient of thermal expansion (CTE) no greater than twice a CTE associated with at least one of the dielectric region or the microelectronic element.
Abstract:
A structure (10) may include bond elements (24) having bases joined to conductive elements (18) at a first portion of a first surface and end surfaces remote from the substrate (12). A dielectric encapsulation element (40) may overlie and extend from the first portion and fill spaces between the bond elements (24) to separate the bond elements (24) from one another. The encapsulation element (40) has a third surface facing away from the first surface. Unencapsulated portions of the bond elements (24) are defined by at least portions of the end surfaces uncovered by the encapsulation element at the third surface. The encapsulation element (40) at least partially defines a second portion (210) of the first surface that is other than the first portion and has an area sized to accommodate an entire area of a microelectronic element (602). Some conductive elements (18) are at the second portion and configured for connection with such microelectronic element (602).
Abstract:
Methods of forming a microelectronic assembly and the resulting structures and devices are disclosed herein. In one embodiment, a method of forming a microelectronic assembly includes removing material exposed at portions of a surface of a substrate to form a processed substrate having a plurality of thinned portions separated by integral supporting portions of the processed substrate having a thickness greater than a thickness of the thinned portions, at least some of the thinned portions including a plurality of electrically conductive interconnects extending in a direction of the thicknesses of the thinned portions and exposed at the surface; and removing the supporting portions of the substrate to sever the substrate into a plurality of individual thinned portions, at least some individual thinned portions including the interconnects.
Abstract:
A microelectronic package (10) may include a first microelectronic unit (12) including a semiconductor chip (16A) having first chip contacts (28), an encapsulant (30) contacting an edge of the semiconductor chip, and first unit contacts (42) exposed at a surface of the encapsulant (30) and electrically connected with the first chip contacts (28). The package (10) may include a second microelectronic unit (14) including a semiconductor chip (16C) having second chip contacts (28C) at a surface thereof, and an encapsulant (54) contacting an edge of the chip of the second unit (14) and having a surface extending away from the edge. The surfaces of the chip (16C) and the encapsulant (54) of the second unit (14) define a face of the second unit. Package terminals (76) at the face may be electrically connected with the first unit contacts (42) through bond wires (100) electrically connected with the first unit contacts (42), and the second chip contacts (28C) through metallized vias (72) and traces (74) formed in contact with the second chip contacts (28C).
Abstract:
A component can include a substrate and a conductive via extending within an opening in the substrate. The substrate can have first and second opposing surfaces. The opening can extend from the first surface towards the second surface and can have an inner wall extending away from the first surface. A dielectric material can be exposed at the inner wall. The conductive via can define a relief channel within the opening adjacent the first surface. The relief channel can have an edge within a first distance from the inner wall in a direction of a plane parallel to and within five microns below the first surface, the first distance being the lesser of one micron and five percent of a maximum width of the opening in the plane. The edge can extend along the inner wall to span at least five percent of a circumference of the inner wall.
Abstract:
A method for making an interposer includes forming a plurality of wire bonds bonded to one or more first surfaces of a first element. A dielectric encapsulation is formed contacting an edge surface of the wire bonds which separates adjacent wire bonds from one another. Further processing comprises removing at least portions of the first element, wherein the interposer has first and second opposite sides separated from one another by at least the encapsulation, and the interposer having first contacts and second contacts at the first and second opposite sides, respectively, for electrical connection with first and second components, respectively, the first contacts being electrically connected with the second contacts through the wire bonds.