公开(公告)号：US12197601B2

公开(公告)日：2025-01-14

申请号：US17560193

申请日：2021-12-22

Applicant: Intel Corporation

Inventor： Ren Wang ,  Sameh Gobriel ,  Somnath Paul ,  Yipeng Wang ,  Priya Autee ,  Abhirupa Layek ,  Shaman Narayana ,  Edwin Verplanke ,  Mrittika Ganguli ,  Jr-Shian Tsai ,  Anton Sorokin ,  Suvadeep Banerjee ,  Abhijit Davare ,  Desmond Kirkpatrick ,  Rajesh M. Sankaran ,  Jaykant B. Timbadiya ,  Sriram Kabisthalam Muthukumar ,  Narayan Ranganathan ,  Nalini Murari ,  Brinda Ganesh ,  Nilesh Jain

IPC: G06F15/78 ,  G06F9/50 ,  G06F21/62 ,  G06F21/72

Abstract: Examples described herein relate to offload circuitry comprising one or more compute engines that are configurable to perform a workload offloaded from a process executed by a processor based on a descriptor particular to the workload. In some examples, the offload circuitry is configurable to perform the workload, among multiple different workloads. In some examples, the multiple different workloads include one or more of: data transformation (DT) for data format conversion, Locality Sensitive Hashing (LSH) for neural network (NN), similarity search, sparse general matrix-matrix multiplication (SpGEMM) acceleration of hash based sparse matrix multiplication, data encode, data decode, or embedding lookup.

公开(公告)号：US11526648B2

公开(公告)日：2022-12-13

申请号：US16361848

申请日：2019-03-22

Applicant: INTEL CORPORATION

Inventor： Suriyaprakash Natarajan ,  Abhijit M. Sathaye ,  Suvadeep Banerjee

IPC: G06F30/398 ,  G06F30/20

Abstract: Techniques are described for systematically and efficiently converting or otherwise accelerating latent defects in semiconductor devices into gross defects by applying appropriate defect acceleration stimulus to the semiconductor devices. Techniques are also described for evaluating test patterns to determine their effectiveness in accelerating the transition of latent defects to gross defects. This evaluation effectively allows various stress patterns to be graded or ranked, so that an optimal or high-confidence one can be selected. Such grading of possible stress patterns increases the probability that a given latent defect will escalate or otherwise manifest.