公开(公告)号：US20140102888A1

公开(公告)日：2014-04-17

申请号：US14046720

申请日：2013-10-04

Applicant: Intevac, Inc.

Inventor： Samuel D. Harkness, IV ,  Terry Bluck ,  Michael A. Russak ,  Quang N. Tran ,  David Ward Brown

IPC: C23C14/35

CPC classification number: C23C14/35 ,  C23C14/352 ,  H01J37/3405 ,  H01J37/3417 ,  H01J37/345

Abstract: A deposition system is provided, where conductive targets of similar composition are situated opposing each other. The system is aligned parallel with a substrate, which is located outside the resulting plasma that is largely confined between the two cathodes. A “plasma cage” is formed wherein the carbon atoms collide with accelerating electrons and get highly ionized. The electrons are trapped inside the plasma cage, while the ionized carbon atoms are deposited on the surface of the substrate. Since the electrons are confined to the plasma cage, no substrate damage or heating occurs. Additionally, argon atoms, which are used to ignite and sustain the plasma and to sputter carbon atoms from the target, do not reach the substrate, so as to avoid damaging the substrate.

Abstract translation: 提供了一种沉积系统，其中具有相似组成的导电靶位于彼此相对的位置。 该系统与衬底平行排列，衬底位于所得到的等离子体的外部，其主要被限制在两个阴极之间。 形成“等离子体笼”，其中碳原子与加速电子碰撞并被高度电离。 电子被捕获在等离子体笼内，而电离的碳原子沉积在衬底的表面上。 由于电子被限制在等离子体笼中，所以不会发生衬底损坏或加热。 另外，用于点燃和维持等离子体并从靶溅射碳原子的氩原子不会到达衬底，以避免损坏衬底。