公开(公告)号：DE69638171D1

公开(公告)日：2010-06-10

申请号：DE69638171

申请日：1996-03-12

Applicant: J A WOOLLAM CO INC

Inventor： GREEN STEVEN E ,  WOOLLAM JOHN A ,  HERZINGER CRAIG M ,  DUCHARME STEPHEN P ,  JOHS BLAINE D

IPC: G01N21/21 ,  G01J3/447

公开(公告)号：AT466272T

公开(公告)日：2010-05-15

申请号：AT96301670

申请日：1996-03-12

Applicant: J A WOOLLAM CO INC

Inventor： GREEN STEVEN E ,  WOOLLAM JOHN A ,  HERZINGER CRAIG M ,  DUCHARME STEPHEN P ,  JOHS BLAINE D

IPC: G01N21/21 ,  G01J3/447

公开(公告)号：EP2446235A4

公开(公告)日：2014-11-12

申请号：EP10792439

申请日：2010-06-18

Applicant: J A WOOLLAM CO INC ,  UNIV NEBRASKA

Inventor： HERZINGER CRAIG M ,  SCHUBERT MATHIAS M ,  HOFMANN TINO ,  LIPHARDT MARTIN M ,  WOOLLAM JOHN A

IPC: G01N21/21 ,  G01N21/35

CPC classification number: G01N21/3581 ,  G01N21/211 ,  G01N2021/213

公开(公告)号：EP0814505A1

公开(公告)日：1997-12-29

申请号：EP96304556

申请日：1996-06-19

Applicant: J A WOOLLAM CO INC

Inventor： WOOLLAM JOHN A ,  JOHS BLAINE D ,  CHOW PETER P

IPC: C30B23/02 ,  H01L21/20 ,  H01L21/66

CPC classification number: B24B37/013 ,  C30B23/002 ,  H01L22/26

Abstract: A method of, and system for, applying light beam producing systems (7) such as ellipsometers, polarimeters, polarized light reflectance and functionally similar systems, such that a beam of light produced thereby is caused to be incident upon a process element (4) at an angle in excess of an associated Brewster angle while enabling the production of a signal sufficiently sensitive to changes in process element parameters, for use in "real-time" process element process monitoring and control, is disclosed. In addition a process element processing system (1) and electron beam producing system and light beam producing system combination system is taught, wherein the electron beam producing (2) and light beam producing (7) systems are mounted to the process element processing system (1), (typically a (MBE) system), by input and output interface systems (9I) (9O) present at a location appropriate for conventional Reflection High Energy Electron Diffraction (RHEED) systems.

Abstract translation: 一种用于应用诸如椭偏仪，偏振计，偏振光反射率和功能相似系统的光束产生系统（7）的方法和系统，使得由此产生的光束被入射到处理元件（4）上， 公开了在“实时”过程元件过程监视和控制中使用的超过相关布鲁斯特角度的角度，同时能够产生对过程元件参数的变化足够敏感的信号。 此外，教导了处理元件处理系统（1）和电子束产生系统和光束产生系统组合系统，其中将电子束产生（2）和光束产生（7）系统安装到处理元件处理系统 1），（通常为（MBE）系统），通过输入和输出接口系统（9I）（90）存在于适合于常规反射高能电子衍射（RHEED）系统的位置。