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    COMPOUND AND POLYMER COMPOUND CONTAINING THE COMPOUND
    3.
    发明申请
    COMPOUND AND POLYMER COMPOUND CONTAINING THE COMPOUND 有权

    公开(公告)号：US20230125359A1

    公开(公告)日：2023-04-27

    申请号：US18063331

    申请日：2022-12-08

    Applicant: JAPAN SCIENCE AND TECHNOLOGY AGENCY

    Inventor： Shohei SAITO ,  Hiroshi YABU ,  Hiroya ABE

    IPC: C07D487/04 ,  C07D471/06 ,  C07D313/14

    Abstract: Provided is a compound having higher fluorescence quantum yield and higher optical stability than a conventional FLAP and a polymer compound containing the compound. A: seven or eight-membered ring structure, Y1, Y2, Y3: halogen atom or the like, al: number of Y1, a2: number of Y2, B: number of Y3, 0≤m and n≤3: when 1≤m≤3, Y1 may be substituted with a structure portion defined by m, when 1≤n≤3, Y2 may be substituted with a structure portion defined by n, and B1, B2: Formulas (2-1) to (2-3): C1, C2, C3: structure containing a cyclic hydrocarbon compound, D1, D2, D3: substructure that inhibits aggregation, E1, E2, E3: polymerizable substructure, Z1: hydrogen atom or the like, c: number of substituent groups Z1, Z2, Z3: hydrogen atom or the like, and may form a ring with C2.

    BLOCK COPOLYMER, MULTILAYER STRUCTURE, SOLID POLYMER FILM, FUEL CELL, PRODUCTION METHOD FOR MULTILAYER STRUCTURE, AND PRODUCTION METHOD FOR MULTILAYER STRUCTURE CONTAINING INORGANIC NANOPARTICLES
    4.
    发明申请
    BLOCK COPOLYMER, MULTILAYER STRUCTURE, SOLID POLYMER FILM, FUEL CELL, PRODUCTION METHOD FOR MULTILAYER STRUCTURE, AND PRODUCTION METHOD FOR MULTILAYER STRUCTURE CONTAINING INORGANIC NANOPARTICLES 审中-公开

    公开(公告)号：US20190169420A1

    公开(公告)日：2019-06-06

    申请号：US16321083

    申请日：2017-08-01

    Applicant: JAPAN SCIENCE AND TECHNOLOGY AGENCY

    Inventor： Hiroshi YABU

    IPC: C08L53/00 ,  C08J7/06 ,  H01M8/0228 ,  H01M8/1004

    Abstract: The problem addressed by the present invention is to provide a block copolymer that can be used in a neutral solvent atmosphere and can produce a solid polymer membrane including nanoparticles.The problem is solved by a block copolymer represented by formula (1) below. wherein in the formula, R1 represents a C1-20 linear, branched, or cyclic alkyl group, C6-20 aryl group, or C7-20 aralkyl group; R2 represents a group having a functional group having an acid dissociation constant pKa of from 0.5 to 7; R3, R4, and R5 each show H or a C1-20 linear, branched, or cyclic alkyl group; R6, R7, and R8 each represent a hydrogen, hydroxyl group, nitro group, carboxy group, or carbonyl group; X represents an amide or ester, but may not be included; Y represents an amide or ester, but may not be included; p represents an integer of 1-10, but may not be included; n represents an integer of 3-1000; m represents an integer of 3-1000; and t represents an integer of 3-1000, but n may not be included; the arrangement of n, m, and t is arbitrary, but n and m are adjacent when n is included.

    RESIN FOR NANOIMPRINTING, LAMINATE CONTAINING RESIN FOR NANOIMPRINTING, PRINTED BOARD CONTAINING RESIN FOR NANOIMPRINTING, AND METHOD FOR PRODUCING NANOIMPRINT SUBSTRATE
    7.
    发明申请
    RESIN FOR NANOIMPRINTING, LAMINATE CONTAINING RESIN FOR NANOIMPRINTING, PRINTED BOARD CONTAINING RESIN FOR NANOIMPRINTING, AND METHOD FOR PRODUCING NANOIMPRINT SUBSTRATE 审中-公开
    用于纳米压印的树脂，用于纳米压印的包含树脂的层压板，用于纳米压印的印刷板，以及用于生产纳米印刷基板的方法

    公开(公告)号：US20150298387A1

    公开(公告)日：2015-10-22

    申请号：US14649735

    申请日：2013-11-13

    Applicant: JAPAN SCIENCE AND TECHNOLOGY AGENCY

    Inventor： Hiroshi YABU ,  Yuta SAITO

    IPC: B29C59/00 ,  B29C59/02 ,  C08F220/70

    CPC classification number: B29C59/005 ,  B29C59/022 ,  B29C2059/023 ,  B29K2033/00 ,  B29K2105/0005 ,  B29K2105/24 ,  B32B27/00 ,  C08F220/54 ,  C08F220/70 ,  C09D133/24 ,  G03F7/0002 ,  C08F220/58

    Abstract: Provided is a resin for nanoimprinting, which is capable of preventing removal of a transfer-receiving resin from a substrate when a mold is separated during nanoimprinting, and which is also capable of transferring a pattern on a mold to a transfer-receiving resin with high accuracy during thermal nanoimprinting, while improving the throughput. A resin for nanoimprinting, which is represented by formula (1). (In the formula, each of R1-R5 independently represents —H or —OH, and at least one of the R1-R5 moieties represents —OH; R6 represents a linear, branched or cyclic alkyl group having 1-20 carbon atoms, an aryl group having 6-20 carbon atoms or an aralkyl group having 7-20 carbon atoms; X represents an amide or an ester; Y may be absent, or represents an amide or an ester; P represents an integer of 1-10; and each of m and n represents an integer of 1 or more.)

    Abstract translation: 本发明提供一种纳米压印用树脂，其能够在纳米压印时将模具分离时从基板上除去转印接收树脂，并且还能够将模具上的图案转印到高转印接收树脂上 在热纳米压印过程中的精度，同时提高了生产量。 用于纳米压印的树脂，其由式（1）表示。 （式中，R 1 -R 5各自独立地表示-H或-OH，R 1〜R 5部分中的至少一个表示-OH; R 6表示具有1-20个碳原子的直链，支链或环状烷基， 具有6-20个碳原子的芳基或具有7-20个碳原子的芳烷基; X表示酰胺或酯; Y可以不存在，或表示酰胺或酯; P表示1-10的整数;以及 m和n各自表示1以上的整数。）

    COMPOUND AND POLYMER COMPOUND CONTAINING THE COMPOUND
    8.
    发明公开
    COMPOUND AND POLYMER COMPOUND CONTAINING THE COMPOUND 审中-公开

    公开(公告)号：US20240217976A2

    公开(公告)日：2024-07-04

    申请号：US18063331

    申请日：2022-12-08

    Applicant: JAPAN SCIENCE AND TECHNOLOGY AGENCY

    Inventor： Shohei SAITO ,  Hiroshi YABU ,  Hiroya ABE

    IPC: C07D487/04 ,  C07D313/14 ,  C07D471/06

    CPC classification number: C07D487/04 ,  C07D313/14 ,  C07D471/06

    Abstract: Provided is a compound having higher fluorescence quantum yield and higher optical stability than a conventional FLAP and a polymer compound containing the compound.






    A: seven or eight-membered ring structure,
    Y1, Y2, Y3: halogen atom or the like,
    a1: number of Y1, a2: number of Y2,
    B: number of Y3,
    0≤m and n≤3: when 1≤m≤3, Y1 may be substituted with a structure portion defined by m, when 1≤n≤3, Y2 may be substituted with a structure portion defined by n, and
    B1, B2: Formulas (2-1) to (2-3):










    C1, C2, C3: structure containing a cyclic hydrocarbon compound,
    D1, D2, D3: substructure that inhibits aggregation,
    E1, E2, E3: polymerizable substructure,
    Z1: hydrogen atom or the like,

    c: number of substituent groups Z1,


    Z2, Z3: hydrogen atom or the like, and may form a ring with C2.

    COMPOUND AND POLYMER COMPOUND CONTAINING THE COMPOUND
    10.
    发明申请
    COMPOUND AND POLYMER COMPOUND CONTAINING THE COMPOUND 有权

    公开(公告)号：US20210002284A1

    公开(公告)日：2021-01-07

    申请号：US16977128

    申请日：2019-03-04

    Applicant: JAPAN SCIENCE AND TECHNOLOGY AGENCY

    Inventor： Shohei SAITO ,  Hiroshi YABU ,  Hiroya ABE

    IPC: C07D487/04 ,  C07D471/06 ,  C07D313/14

    Abstract: Provided is a compound having higher fluorescence quantum yield and higher optical stability than a conventional FLAP and a polymer compound containing the compound. A: seven or eight-membered ring structure, Y1,Y2,Y3: halogen atom or the like, a1: number of Y1, a2: number of Y2, B: number of Y3, 0≤m and n≤3: when 1≤m≤3, Y1 may be substituted with a structure portion defined by m, when 1≤n≤3, Y2 may be substituted with a structure portion defined by n, and B1, B2: Formulas (2-1) to (2-3). C1, C2, C3: structure containing a cyclic hydrocarbon compound, D1, D2, D3: substructure that inhibits aggregation, E1, E2, E3: polymerizable substructure, Z1: hydrogen atom or the like, c: number of substituent groups Z1, Z2, Z3: hydrogen atom or the like, and may form a ring with C2.

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