公开(公告)号：DE602006005786D1

公开(公告)日：2009-04-30

申请号：DE602006005786

申请日：2006-03-28

Applicant: JSR CORP

Inventor： TSUJI TAKAYUKI ,  NAGAI TOMOKI ,  HARADA KENTAROU ,  SHIMIZU DAISUKE

IPC: G03F7/004 ,  G03F7/039

公开(公告)号：AT426189T

公开(公告)日：2009-04-15

申请号：AT06111812

申请日：2006-03-28

Applicant: JSR CORP

Inventor： TSUJI TAKAYUKI ,  NAGAI TOMOKI ,  HARADA KENTAROU ,  SHIMIZU DAISUKE

IPC: G03F7/004 ,  G03F7/039

公开(公告)号：EP2003148A4

公开(公告)日：2011-06-22

申请号：EP07739535

申请日：2007-03-23

Applicant: JSR CORP

Inventor： NAKAGAWA HIROKI ,  NAKASHIMA HIROMITSU ,  WAKAMATSU GOUJI ,  HARADA KENTAROU ,  NISHIMURA YUKIO ,  SHIOYA TAKEO

IPC: C08F20/22 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0046 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

Abstract translation: 本发明的目的是提供一种含氟聚合物，其含有含氟聚合物的液浸光刻用的辐射敏感性树脂组合物，其导致具有优异形状和优异的焦深的图案，其中 在液浸光刻中曝光期间与抗蚀剂接触的液体浸渍光刻液体中的洗脱组分的量很少，并且在抗蚀剂膜和用于液浸的液体之间提供更大的后退接触角 光刻法如水，以及纯化含氟聚合物的方法。 本发明的树脂组合物包含含有由通式（1）和（2）表示的重复单元并且具有1,000-50,000的Mw的新的含氟聚合物（A），具有酸不稳定基团的树脂（B）， 辐射敏感酸产生剂（C），含氮化合物（D）和溶剂（E）。