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    2.
    发明专利
    未知

    公开(公告)号：AT540336T

    公开(公告)日：2012-01-15

    申请号：AT07829596

    申请日：2007-10-11

    Applicant: JSR CORP

    Inventor： NISHIMURA YUKIO ,  SUGIE NORIHIKO ,  NAKASHIMA HIROMITSU ,  NATSUME NORIHIRO ,  KOUNO DAITA

    IPC: G03F7/11 ,  H01L21/027

    Abstract: A composition for formation of upper layer film, which is used for forming an upper layer film on the surface of a photoresist film and which comprises a resin (A) having a repeating unit represented by the following general formula (1-1) and not having a repeating unit represented by the following general formula (1-2), and a resin (B) having a repeating unit represented by the following general formula (1-2) and not having a repeating unit represented by the following general formula (1-1). [In the general formulas (1-1) and (1-2), R 1 is hydrogen or the like; R 2 is single bonds or the like; and R 3 is a fluorine-substituted, linear or branched alkyl group having 1 to 12 carbon atoms, or the like.] The composition can form an upper layer film giving a sufficiently high receded contact angle.

    FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION
    3.
    发明公开
    FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION 有权
    氟化物聚合物，稀土元素混合物HARZZUSAMMENSETZUNG

    公开(公告)号：EP2003148A4

    公开(公告)日：2011-06-22

    申请号：EP07739535

    申请日：2007-03-23

    Applicant: JSR CORP

    Inventor： NAKAGAWA HIROKI ,  NAKASHIMA HIROMITSU ,  WAKAMATSU GOUJI ,  HARADA KENTAROU ,  NISHIMURA YUKIO ,  SHIOYA TAKEO

    IPC: C08F20/22 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

    CPC classification number: G03F7/0046 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

    Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

    Abstract translation: 本发明的目的是提供一种含氟聚合物，其含有含氟聚合物的液浸光刻用的辐射敏感性树脂组合物，其导致具有优异形状和优异的焦深的图案，其中 在液浸光刻中曝光期间与抗蚀剂接触的液体浸渍光刻液体中的洗脱组分的量很少，并且在抗蚀剂膜和用于液浸的液体之间提供更大的后退接触角 光刻法如水，以及纯化含氟聚合物的方法。 本发明的树脂组合物包含含有由通式（1）和（2）表示的重复单元并且具有1,000-50,000的Mw的新的含氟聚合物（A），具有酸不稳定基团的树脂（B）， 辐射敏感酸产生剂（C），含氮化合物（D）和溶剂（E）。

    RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND
    4.
    发明公开
    RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND 审中-公开
    辐射敏感树脂组合物中，形成方法抗蚀剂结构，高分子聚合相关

    公开(公告)号：EP2479614A4

    公开(公告)日：2013-07-03

    申请号：EP10817289

    申请日：2010-09-17

    Applicant: JSR CORP

    Inventor： ASANO YUUSUKE ,  SATOU MITSUO ,  NAKASHIMA HIROMITSU ,  KASAHARA KAZUKI ,  OIZUMI YOSHIFUMI ,  HORI MASAFUMI ,  KAWAKAMI TAKANORI ,  MATSUDA YASUHIKO ,  NAKAHARA KAZUO

    IPC: G03F7/039 ,  C08F20/26 ,  G03F7/004 ,  G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/0392 ,  C08F20/22 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0388 ,  G03F7/039 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/32

    Abstract: A radiation-sensitive resin composition includes (A) a polymer that includes an acid-labile group, (B) an acid generator that generates an acid upon exposure to radiation, and (C) a polymer that includes a fluorine atom and a functional group shown by the following general formula (x), the polymer (C) having a fluorine atom content higher than that of the polymer (A). €ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ-A-R 1 €ƒ€ƒ€ƒ€ƒ€ƒ(x) wherein R 1 represents an alkali-labile group, and A represents an oxygen atom (excluding an oxygen atom that is bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group), an imino group, -CO-O-*, or -SO 2 -O-* (wherein "*" indicates a bonding hand bonded to R 1 ).

    Abstract translation: 一种辐射敏感树脂组合物包括（A）的聚合物没包括在基酸不稳定，（B）以酸产生剂在暴露生成酸在辐射中，以及（C）的聚合物确实包括氟原子和官能团 通过具有氟原子的含量比聚合物（A）的较高的下述通式（X）中，聚合物（C）中所示。 €ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ-AR 1€ƒ€ƒ€ƒ€ƒ€ƒ（x）的worin，R 1碱不稳定的基团的darstellt，和氧原子的darstellt（不含 到处于芳环，羰基，或亚砜一组）直接键合到氧原子，以亚氨基，-CO-O- *， - O-或-SO 2 *（worin“*”表示结合手 结合到R 1）。

    RADIATION-SENSITIVE RESIN COMPOSITION
    7.
    发明公开
    RADIATION-SENSITIVE RESIN COMPOSITION 有权
    辐射敏感性树脂组合物

    公开(公告)号：EP2325695A4

    公开(公告)日：2012-04-04

    申请号：EP09813111

    申请日：2009-09-10

    Applicant: JSR CORP

    Inventor： EBATA TAKUMA ,  NAKAGAWA HIROKI ,  MATSUDA YASUHIKO ,  KASAHARA KAZUKI ,  HOSHIKO KENJI ,  NAKASHIMA HIROMITSU ,  IKEDA NORIHIKO ,  SAKAI KAORI ,  HARADA SAKI

    IPC: G03F7/039 ,  C08F20/26 ,  C08F20/28 ,  G03F7/004

    CPC classification number: C08F20/28 ,  C08F220/18 ,  C08F220/28 ,  G03F7/0397 ,  G03F7/2041

    Abstract: A radiation-sensitive resin composition includes (A) a polymer, (B) a photoacid generator, (C) an acid diffusion controller, and (D) a solvent, the polymer (A) including a repeating unit (a-1) shown by the following general formula (a-1), and the acid diffusion controller (C) including at least one base selected from (C-1) a base shown by the following general formula (C-1) and (C-2) a photodegradable base. wherein R 1 individually represent a hydrogen atom or the like, R represents a monovalent group shown by the above general formula (a'), R 19 represents a chain-like hydrocarbon group having 1 to 5 carbon atoms or the like, A represents a divalent chain-like hydrocarbon group having 1 to 30 carbon atoms or the like, m and n are integers from 0 to 3 (m+n=1 to 3), and R 2 and R 3 individually represent a monovalent chain-like hydrocarbon group having 1 to 20 carbon atoms or the like, provided that the two R 2 may bond to form a ring structure.

    LACTONE COPOLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION
    9.
    发明公开
    LACTONE COPOLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION 审中-公开
    LACTONCOPOLYMER和辐射敏感性树脂组合物

    公开(公告)号：EP1757628A4

    公开(公告)日：2008-04-30

    申请号：EP05737180

    申请日：2005-05-02

    Applicant: JSR CORP

    Inventor： NAKASHIMA HIROMITSU ,  UTAKA TOMOHIRO ,  CHIBA TAKASHI ,  YONEDA EIJI ,  NAKAMURA ATSUSHI

    IPC: C08F220/28 ,  G03F7/004 ,  G03F7/033 ,  G03F7/039 ,  H01L21/027

    CPC classification number: C08F220/28 ,  C08F220/18 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

    Abstract: A radiation-sensitive resin composition that not only excels in fundamental properties as resist, such as sensitivity and resolution, but also with respect to both of line-and-space pattern and isolated space pattern, realizes extensive depth of focus (DOF) and is less in the line width change attributed to alteration of baking temperature, the limit line width free from any phenomenon of line pattern collapse of the radiation-sensitive resin composition being small. Further, there is provided a lactone copolymer being useful as a resin component of the radiation-sensitive resin composition. This lactone copolymer is represented by a copolymer of compound of the following formula (1-1), compound of the following formula (2-1) and compound of the following formula (3-1). This radiation-sensitive resin composition comprises the lactone copolymer (a) and radiation-sensitive acid generating agent (b).

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