公开(公告)号：AU2003292605A1

公开(公告)日：2004-07-29

申请号：AU2003292605

申请日：2003-12-22

Applicant: JSR CORP

Inventor： MATSUI HISASHI ,  MATSUDA NOBUHIRO ,  HIGUCHI ATSUSHI ,  ISHIKAWA OSAMU ,  ZAMA YOSHIAKI ,  ITO KAZUAKI

IPC: C08F236/04 ,  D21H19/36 ,  D21H19/40 ,  D21H19/58 ,  D21H21/52 ,  D21H23/48 ,  D21H23/50 ,  D21H19/20 ,  C09D147/00

Abstract: The copolymer latex for non-contact coating of the present invention is obtained by emulsion polymerization of a monomer containing from 23 to 58% by mass of an aliphatic conjugated diene monomer, from 0.1 to 7% by mass of an ethylenic unsaturated carboxylic acid monomer, from 5 to 40% by mass of a vinyl cyanide compound, and from 0 to 71.9% by mass of other monomer capable of being copolymerized with the other monomers (provided that the total amount of the monomers is 100% by mass), and polymer particles contained in the latex have an average particle diameter of from 50 to 150 nm. A coating composition for paper containing the latex, a pigment and the like is suitable for a non-contact coating method, such as a curtain coater and a spray, to obtain coated paper excellent in surface strength, printing gloss and the like with good runnability.

公开(公告)号：EP1577438A4

公开(公告)日：2006-09-27

申请号：EP03782871

申请日：2003-12-22

Applicant: JSR CORP

Inventor： ZAMA YOSHIAKI ,  ITO KAZUAKI ,  MATSUI HISASHI ,  MATSUDA NOBUHIRO ,  HIGUCHI ATSUSHI ,  ISHIKAWA OSAMU

IPC: C08F236/04 ,  D21H19/36 ,  D21H19/40 ,  D21H19/58 ,  D21H21/52 ,  D21H23/48 ,  D21H23/50 ,  D21H19/20 ,  C09D147/00

CPC classification number: D21H19/36 ,  C08F236/04 ,  D21H19/40 ,  D21H19/58 ,  D21H21/52 ,  D21H23/48 ,  D21H23/50 ,  C08F2/24

Abstract: A copolymer latex for noncontact coating which is produced by the emulsion polymerization of a monomer composition comprising 23 to 58 mass % of an aliphatic conjugated diene monomer, 0.1 to 7 mass % of an ethylenically unsaturated carboxylic acid, 5 to 40 mass % of a vinyl cyanide compound and 0 to 71.9 mass % of another monomer capable of copolymerizing with above monomers (provided that the total amount of monomers is 100 mass %), and contains polymer particles having an average particle diameter of 50 nm to 150 nm; and a composition for paper coating comprising the latex, a pigment and the like. The composition is suitable for use in noncontact coating such as curtain flow coating and spraying, and can be used for producing a coated paper being excellent in surface strength, printing gloss and the like with good operating characteristics.

公开(公告)号：EP1295682A4

公开(公告)日：2005-02-02

申请号：EP01934382

申请日：2001-05-29

Applicant: JSR CORP

Inventor： HASEGAWA KOU ,  SATOU HOZUMI ,  ISHIKAWA OSAMU ,  HOSAKA YUKIO

IPC: B24B37/24 ,  B24D3/28 ,  B24D11/00 ,  B24D18/00 ,  C09K3/14 ,  B24D3/20 ,  B24B7/22 ,  B24B37/04 ,  B24D3/00

CPC classification number: B24B37/245 ,  B24B37/24 ,  B24D3/28 ,  B24D11/001 ,  B24D18/0009 ,  C09K3/1454

Abstract: An abrasive material which is especially excellent in the dispersion of abrasive grains even when the grains are contained in a large amount, and which has stable polishing properties and is effective in diminishing scratches. The abrasive material comprises a polishing part which can be obtained by introducing given amounts of butadiene, styrene, methyl methacrylate, itaconic acid, acrylic acid, α-methylstyrene dimer, and t-dodecyl mercaptan into an autoclave, reacting them at 75°C for 16 hours to obtain an emulsion of a copolymer, adjusting the pH of this emulsion to 8.5, adding thereto a cerium oxide powder having an average primary-particle diameter of 0.3 νm, stirring the resultant mixture to obtain an aqueous dispersion, thinly spreading this aqueous dispersion on a film, drying it, and then pressing the resultant dry mixture with a mold press. The polishing part may have a crosslinked structure. The abrasive material is suitable for use as, e.g., a polishing pad for polishing the surface of, e.g., a semiconductor wafer.

公开(公告)号：AU2011235783A1

公开(公告)日：2012-10-25

申请号：AU2011235783

申请日：2011-03-29

Applicant: JSR CORP

Inventor： KOBAYASHI KUNIHIKO ,  SAKATA KATSUHIKO ,  IWAMOTO TSUKASA ,  MATSUDA NOBUHIRO ,  ISHIKAWA OSAMU

IPC: C08F236/04 ,  C08F212/04 ,  C08F220/04 ,  C08F220/42 ,  D21H19/58

Abstract: Provided is a copolymer latex having a small particle diameter. When used as a binder in a filler-containing composition, the copolymer latex can attain sufficient bond strength. Further, the copolymer latex has a low viscosity and exhibits excellent handleability. Also provided are: a composition for paper coating, which is prepared using the copolymer latex; and a coated paper that has a coating layer formed from the composition. The copolymer latex is a latex which contains a copolymer that comprises 20 to 80% by mass of structural units (A) derived from an aliphatic conjugated diene monomer, 4 to 15% by mass of structural units (B) derived from an unsaturated carboxylic acid monomer, and 5 to 76% by mass of structural units (C) derived from one or more other copolymerizable monomers (with the proviso that the sum total of the components (A), (B) and (C) is 100% by mass) and which has a number-mean particle diameter of 30 to 80nm as determined with a transmission electron microscope and exhibits a viscosity of 50 to 400mPa·s at a solid content of 48% by mass.

公开(公告)号：DE60131080T2

公开(公告)日：2008-07-31

申请号：DE60131080

申请日：2001-05-29

Applicant: JSR CORP

Inventor： HASEGAWA KOU ,  SATOU HOZUMI ,  ISHIKAWA OSAMU ,  HOSAKA YUKIO

IPC: B24D3/20 ,  B24B7/22 ,  B24B37/24 ,  B24D3/00 ,  B24D3/28 ,  B24D11/00 ,  B24D18/00 ,  C09K3/14

Abstract: An object of the present invention is to provide a polishing body, wherein the abrasive in the polishing body are extremely dispersed well, which provides stable polishing performance in the polishing process, and which can effectively reduce the occurrence of scratches even in a case a large quantity of the abrasive are contained. A polishing part constituting the polishing body in the invention is produced obtained by loading predetermined amounts of butadiene, styrene, methyl methacrylate, itaconic acid, acrylic acid, alpha -methylstyrenedimer, and t-dodecylmercaptan in an autoclave, making the mixture react for 16 hours at 75 DEG C to obtain an emulsion wherein a copolymer is dispersed, adjusting this emulsion to pH8.5, incorporating cerium oxide powder with an average primary particle diameter of 0.3 mu m and stirring to obtain an aqueous dispersion, drying this aqueous dispersion by spreading it thinly across a film, and mold pressing the dried product obtained. The above-mentioned polishing part may have a crosslinked structure. The polishing body in the invention can be used favorably in a polishing pad and the like, for polishing the surface of a semiconductor wafer or the like.

公开(公告)号：AU2011235783B2

公开(公告)日：2014-05-08

申请号：AU2011235783

申请日：2011-03-29

Applicant: JSR CORP

Inventor： KOBAYASHI KUNIHIKO ,  SAKATA KATSUHIKO ,  IWAMOTO TSUKASA ,  MATSUDA NOBUHIRO ,  ISHIKAWA OSAMU

IPC: C08F236/04 ,  C08F212/04 ,  C08F220/04 ,  C08F220/42 ,  D21H19/58

Abstract: Provided is a copolymer latex having a small particle diameter. When used as a binder in a filler-containing composition, the copolymer latex can attain sufficient bond strength. Further, the copolymer latex has a low viscosity and exhibits excellent handleability. Also provided are: a composition for paper coating, which is prepared using the copolymer latex; and a coated paper that has a coating layer formed from the composition. The copolymer latex is a latex which contains a copolymer that comprises 20 to 80% by mass of structural units (A) derived from an aliphatic conjugated diene monomer, 4 to 15% by mass of structural units (B) derived from an unsaturated carboxylic acid monomer, and 5 to 76% by mass of structural units (C) derived from one or more other copolymerizable monomers (with the proviso that the sum total of the components (A), (B) and (C) is 100% by mass) and which has a number-mean particle diameter of 30 to 80nm as determined with a transmission electron microscope and exhibits a viscosity of 50 to 400mPa·s at a solid content of 48% by mass.

公开(公告)号：DE60139848D1

公开(公告)日：2009-10-22

申请号：DE60139848

申请日：2001-11-12

Applicant: JSR CORP

Inventor： SAKATA KATSUHIKO ,  ISHIKAWA OSAMU

IPC: C08F220/44 ,  C08J3/20 ,  C08F220/42 ,  C08F236/04 ,  C08F236/12 ,  C08F265/08 ,  C08F279/04 ,  C08F293/00 ,  C08K3/00 ,  C08L9/02 ,  C08L33/18 ,  C08L33/20 ,  C08L51/04 ,  C08L55/02

公开(公告)号：DE60131080D1

公开(公告)日：2007-12-06

申请号：DE60131080

申请日：2001-05-29

Applicant: JSR CORP

Inventor： HASEGAWA KOU ,  SATOU HOZUMI ,  ISHIKAWA OSAMU ,  HOSAKA YUKIO

IPC: B24D3/20 ,  B24B7/22 ,  B24B37/24 ,  B24D3/00 ,  B24D3/28 ,  B24D11/00 ,  B24D18/00 ,  C09K3/14

Abstract: An object of the present invention is to provide a polishing body, wherein the abrasive in the polishing body are extremely dispersed well, which provides stable polishing performance in the polishing process, and which can effectively reduce the occurrence of scratches even in a case a large quantity of the abrasive are contained. A polishing part constituting the polishing body in the invention is produced obtained by loading predetermined amounts of butadiene, styrene, methyl methacrylate, itaconic acid, acrylic acid, alpha -methylstyrenedimer, and t-dodecylmercaptan in an autoclave, making the mixture react for 16 hours at 75 DEG C to obtain an emulsion wherein a copolymer is dispersed, adjusting this emulsion to pH8.5, incorporating cerium oxide powder with an average primary particle diameter of 0.3 mu m and stirring to obtain an aqueous dispersion, drying this aqueous dispersion by spreading it thinly across a film, and mold pressing the dried product obtained. The above-mentioned polishing part may have a crosslinked structure. The polishing body in the invention can be used favorably in a polishing pad and the like, for polishing the surface of a semiconductor wafer or the like.

公开(公告)号：CA2361897A1

公开(公告)日：2002-05-13

申请号：CA2361897

申请日：2001-11-13

Applicant: JSR CORP

Inventor： ISHIKAWA OSAMU ,  SAKATA KATSUHIKO

IPC: C08J3/20 ,  C08F220/42 ,  C08F220/44 ,  C08F236/12 ,  C08F265/08 ,  C08F279/04 ,  C08K3/00 ,  C08L9/02 ,  C08L33/18 ,  C08L51/04 ,  C08L55/02 ,  C08L25/12 ,  C08L9/06

Abstract: An objective of the present invention is to provide an unsaturated nitrile-conjugated diene-typed rubber capable of giving a vulcanized rubber which exhibits is well-balanced in terms of the mechanical strength, the oil resistance and the like, as well as a process for the production of the same, and a rubber composition which is containing such rubber and exhibits an excellent processability as well as a process for the production of the same. The unsaturated nitrile-conjugated diene-typed rubber in the invention is produced by polymerizing using certain amounts of an olefinically unsaturated nitrile monomer such as acrylonitrile and a conjugated diene monomer such as butadiene at first, and continuing by supplying a remainder of the monomers at a certain ratio continuously or stepwise to proceed the polymerization. The unsaturated nitrile- conjugated diene-typed rubber is constituted 55 to 80wt% of an olefinically unsaturated nitrile monomer unit as a repeating unit and 20 to 45wt% of a conjugated diene monomer unit as a repeating unit based on 100wt% of total of the monomer units. Glass transition temperature is -15 to 30.degree.C and the extrapolated temperature of the termination of the glass transition is preferably 70.degree.C or less.

公开(公告)号：CA2361897C

公开(公告)日：2008-01-29

申请号：CA2361897

申请日：2001-11-13

Applicant: JSR CORP

Inventor： SAKATA KATSUHIKO ,  ISHIKAWA OSAMU

IPC: C08F220/42 ,  C08J3/20 ,  C08F220/44 ,  C08F236/12 ,  C08F265/08 ,  C08F279/04 ,  C08K3/00 ,  C08K3/04 ,  C08K3/22 ,  C08K3/36 ,  C08L9/02 ,  C08L33/18 ,  C08L51/04 ,  C08L55/02

Abstract: An objective of the present invention is to provide an unsaturated nitrile-conjugated diene-typed rubber capable of giving a vulcanized rubber which exhibits is well-balanced in terms of the mechanical strength, the oil resistance and the like, as well as a process for the production of the same, and a rubber composition which is containing such rubber and exhibits an excellent processability as well as a process for the production of the same. The unsaturated nitrile-conjugated diene-typed rubber in the invention is produced by polymerizing using certain amounts of an olefinically unsaturated nitrile monomer such as acrylonitrile and a conjugated diene monomer such as butadiene at first, and continuing by supplying a remainder of the monomers at a certain ratio continuously or stepwise to proceed the polymerization. The unsaturated nitrile--conjugated diene-typed rubber is constituted 55 to 80wt% of an olefinically unsaturated nitrile monomer unit as a repeating unit and 20 to 45wt% of a conjugated diene monomer unit as a repeating unit based on 100wt% of total of the monomer units. Glass transition temperature is -15 to 30.degree.C and the extrapolated temperature of the termination of the glass transition is preferably 70.degree.C or less.