公开(公告)号：JP2011231074A

公开(公告)日：2011-11-17

申请号：JP2010104557

申请日：2010-04-28

Applicant: Jsr Corp ,  Jsr株式会社 ,  Kanagawa Univ ,  学校法人神奈川大学

Inventor： NISHIKUBO TATATOMI ,  KUDO HIROTO

IPC: C07C43/21 ,  C07B61/00 ,  C07C41/14

Abstract: PROBLEM TO BE SOLVED: To provide a calixarene-based compound useful as a raw material of a substrate component contained in a radiation-sensitive composition which can form a chemistry amplification type positive resist film which can form a stabilized and highly precise fine pattern.SOLUTION: The calixarene-based compound is shown by General formula (A1) or General formula (A2). In General formulas (A1) and (A2), each R denotes a hydrogen atom or a group shown by General formula (R), and each X denotes an alkylene group. Moreover, in the General formula (R), Rdenotes a 1-20C hydrocarbon group, and * denotes a bonding position of the group shown by the General formula (R).

Abstract translation: 要解决的问题：提供一种可用作辐射敏感组合物中所含的底物成分的原料的杯芳烃类化合物，其可以形成化学扩增型正性抗蚀剂膜，其可以形成稳定和高精度的细 模式。 溶液：通式（A1）或通式（A2）表示杯芳烃类化合物。 通式（A1）和（A2）中，R表示氢原子或通式（R）表示的基团，X表示亚烷基。 此外，在通式（R）中，R 1表示1-20C的烃基，*表示通式（R）所示的基团的键合位置。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2009191124A

公开(公告)日：2009-08-27

申请号：JP2008031541

申请日：2008-02-13

Applicant: Jsr Corp ,  Jsr株式会社 ,  Univ Kanagawa ,  学校法人神奈川大学

Inventor： NISHIKUBO TATATOMI ,  KUDO HIROTO

IPC: C08G8/20 ,  C07C37/20 ,  C07C39/17

Abstract: PROBLEM TO BE SOLVED: To provide a phenolic compound useful as a starting material of a base component contained in a radiation-sensitive composition forming a chemically amplified positive resist film which is effectively sensitive to EB (electron beam) or the like. SOLUTION: The phenolic compound is obtained by bringing a compound represented by formula (1) and a compound represented by general formula (2) into a condensation reaction. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种酚类化合物，其可用作形成对EB（电子束）等有效敏感的化学放大正性抗蚀剂膜的辐射敏感性组合物中的基础成分的起始材料。 解决方案：通过将由式（1）表示的化合物和由通式（2）表示的化合物引入缩合反应中来获得酚类化合物。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008274239A

公开(公告)日：2008-11-13

申请号：JP2008079641

申请日：2008-03-26

Applicant: Jsr Corp ,  Jsr株式会社 ,  Univ Kanagawa ,  学校法人神奈川大学

Inventor： NISHIKUBO TATATOMI ,  KUDO HIROTO

IPC: C08G64/04 ,  C08G64/22

Abstract: PROBLEM TO BE SOLVED: To provide a hyper branched polycarbonate having a novel molecular structure and provide its manufacturing method. SOLUTION: The hyper branched polycarbonate is composed of a repeating unit represented by general formula (1). Its manufacturing method consists of obtaining the hyper branched polycarbonate via the process of reacting bisphenol A bischloroformate and 1,1,1-tris(4-hydroxyphenyl)ethane in the presence of a base and tetrahydrofuran. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供具有新分子结构的超支化聚碳酸酯并提供其制造方法。 解决方案：超支化聚碳酸酯由通式（1）表示的重复单元组成。 其制造方法包括通过双酚A双氯甲酸酯和1,1,1-三（4-羟基苯基）乙烷在碱和四氢呋喃的存在下反应的方法获得超支化聚碳酸酯。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007008875A

公开(公告)日：2007-01-18

申请号：JP2005192502

申请日：2005-06-30

Applicant: Jsr Corp ,  Jsr株式会社 ,  Univ Kanagawa ,  学校法人神奈川大学

Inventor： NISHIKUBO TATATOMI ,  KUDO HIROTO

IPC: C07C69/712 ,  C07C69/96 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To provide a calixarene-based derivative of new structure usable as a photoresist compatible with next generation photolithography, and to provide a composition containing the same. SOLUTION: The calixarene-based derivative having a substituent of formula(2) ( wherein, A is a 1-11C substituted or nonsubstituted bivalent hydrocarbon group; B is a monovalent acid-dissociable group; and n is 0 or 1 ) is provided. The composition containing the same is also provided. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供可用作与下一代光刻相容的光致抗蚀剂的新结构的基于杯芳烃的衍生物，并提供含有该组合物的组合物。 解决方案：具有式（2）取代基的杯芳烃衍生物（其中A为1-11C取代或未取代的二价烃基; B为单价酸解离基; n为0或1） 被提供。 还提供含有该组合物的组合物。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006257322A

公开(公告)日：2006-09-28

申请号：JP2005078593

申请日：2005-03-18

Applicant: Jsr Corp ,  Jsr株式会社 ,  Univ Kanagawa ,  学校法人神奈川大学

Inventor： NISHIKUBO TATATOMI ,  KUDO HIROTO

IPC: C08F8/14

Abstract: PROBLEM TO BE SOLVED: To provide a new styrenic polymer with a group derived from anthracene in the side chain, and its manufacturing method and to provide a refractive index converting material comprised of the polymer and a light-heat energy converting-accumulating material made of the polymer.
SOLUTION: The styrenic polymer is composed of a repeated unit represented by formula (1) [in the formula R
1 shows a group represented by any one of formulae (a) to (d) and n is a repeating number].
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种新的苯乙烯类聚合物与侧链中的蒽衍生物及其制造方法，并提供由聚合物组成的折射率转换材料和光热转换累积 由聚合物制成的材料。 苯乙烯类聚合物由式（1）表示的重复单元组成[式中，R 1表示由式（a）〜（d）中任一个表示的基团和 n是重复数字]。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006233040A

公开(公告)日：2006-09-07

申请号：JP2005050291

申请日：2005-02-25

Applicant: Jsr Corp ,  Jsr株式会社 ,  Univ Kanagawa ,  学校法人神奈川大学

Inventor： NISHIKUBO TATATOMI ,  KUDO HIROTO

IPC: C08G75/08

Abstract: PROBLEM TO BE SOLVED: To provide a new sulfur atom-containing cyclic compound containing sulfur atoms at a high density and resultantly useful as an optical material and to provide a method for producing the compound.
SOLUTION: The sulfur atom-containing cyclic compound is characterized in that the compound is represented by general formula (1) [wherein, R
1 is a group represented by a -CH
2 -O-R
2 (wherein, R
2 represents a 1-6C alkyl group or a substituted or an unsubstituted phenyl group); m is an integer of ≥1; and n is an integer of ≥2]. The method for producing the sulfur atom-containing cyclic compound represented by general formula (1) is characterized as reacting a sulfur-containing cyclic compound with a thiirane compound and thereby obtaining the sulfur atom-containing cyclic compound.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 待解决的问题：提供一种高密度含硫原子的新的含硫原子的环状化合物，最终可用作光学材料，并提供一种制备该化合物的方法。 解决方案：含硫原子的环状化合物的特征在于该化合物由通式（1）表示[其中，R SP 1是由-CH 2 S 2表示的基团 （其中，R SP2表示1-6C烷基或取代或未取代的苯基）。 m为≥1的整数; n为≥2的整数]。 由通式（1）表示的含硫原子的环状化合物的制造方法的特征在于使含硫环状化合物与硫杂环丁烷化合物反应，从而得到含硫原子的环状化合物。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005306917A

公开(公告)日：2005-11-04

申请号：JP2004122246

申请日：2004-04-16

Applicant: Jsr Corp ,  Jsr株式会社 ,  Univ Kanagawa ,  学校法人神奈川大学

Inventor： NISHIKUBO TATATOMI ,  KUDO HIROTO ,  NISHIMURA ISAO ,  SHIMOKAWA TSUTOMU ,  SUGIE NORIHIKO

IPC: G03F7/039 ,  C08B37/16 ,  C08L5/16 ,  C08L101/00 ,  H01L21/027

CPC classification number: C08G83/007

Abstract: PROBLEM TO BE SOLVED: To obtain a new substance which can be used as an acid-dissociating group-containing polymer having high transparency for radiations such as F2 excimer laser and satisfying basic performances required for resists, and to obtain a radiation-sensitive resin composition using the same.
SOLUTION: The subject polyrotaxane comprises a fluorine-containing cyclodextrin represented by formula (1) and a linear polymer which passes through the cavity of this cyclic compound. The radiation-sensitive resin composition comprises the fluorine-containing cyclodextrin or the polyrotaxane as the acid-dissociating group-containing polymer, and a radiation-sensitive acid-producing agent.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：为了获得可用作用于诸如F2准分子激光器的辐射具有高透明度的酸解离基团的聚合物并满足抗蚀剂所需的基本性能的新物质，并且获得辐射 - 敏感树脂组合物。 解决方案：本发明聚轮烷包含通式（1）表示的含氟环糊精和通过该环状化合物的空腔的线性聚合物。 辐射敏感性树脂组合物包含作为含酸解离基团的聚合物的含氟环糊精或聚轮烷，以及辐射敏感性的酸产生剂。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2004323767A

公开(公告)日：2004-11-18

申请号：JP2003123380

申请日：2003-04-28

Applicant: Jsr Corp ,  Jsr株式会社 ,  Univ Kanagawa ,  学校法人神奈川大学

Inventor： NISHIKUBO TATATOMI ,  KUDO HIROTO

IPC: G03F7/039 ,  C08G61/12 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an acid-dissociable group-containing polymer that has high transparency to a radiation and fulfills the basic performance required of a resist and to provide a radiation-sensitive resin composition.
SOLUTION: The acid-dissociable group-containing polymer has a repeating unit represented by formula (1) wherein R is at least one kind of divalent organic group of formula selected from the group consisting of formula (1-1), formula (1-2), formula (1-3), formula (1-4) and formula (1-5). The radiation-sensitive resin composition comprises the polymer and a radiation-sensitive acid generator.
COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2002080596A

公开(公告)日：2002-03-19

申请号：JP2000267157

申请日：2000-09-04

Applicant: UNIV KANAGAWA ,  JSR CORP

Inventor： NISHIKUBO TATATOMI ,  KAMEYAMA ATSUSHI ,  NISHIMURA ISAO ,  YASUDA YOSHITOMO

IPC: C08G73/10

Abstract: PROBLEM TO BE SOLVED: To obtain a new polyimide containing an epoxy group, and further to provide a method for producing the polyimide, and to obtain a curable resin composition. SOLUTION: The polyimide has a repeating unit represented by formula 1 (wherein, X is a single bond or a divalent group; R1 and R2 are each a group having a glycidyl structure; and Y is a tetravalent organic group). The method for producing the polyimide comprises reacting a diamine compound represented by formula 2 (wherein, X is a single bond or a divalent group) with a tetracarboxylic dianhydride in the presence of a basic compound, imidating the resultant reaction product to provide a carboxy group-containing polyimide, and reacting the carboxy group-containing polyimide with a glycidyl compound. The curable resin composition contains this polyimide.

公开(公告)号：JPH11255895A

公开(公告)日：1999-09-21

申请号：JP8256398

申请日：1998-03-13

Applicant: JSR CORP

Inventor： NISHIKUBO TATATOMI ,  KAMEYAMA ATSUSHI ,  GOTO KOHEI

IPC: C08G73/10

Abstract: PROBLEM TO BE SOLVED: To obtain a novel polyimide and a preparation process thereof. SOLUTION: A polyimide comprises a repeating structural unit of the formula [wherein X is a group of -(CYY')p- (wherein Y and Y' are identical to or different from each other and are each a hydrogen atom, an aryl group, an alkyl group or a halogenated alkyl group) or a fluorenylene group; R is a tetravalent organic group; and p is 0 or 1] and has a number average molecular weight calculated as polystyrene, measured by gel permeation chromatography method, of from 5,000 to 100,000. This polyimide contains many carboxyl groups in the side chain and is converted into various photosensitive polyimides by chemically modifying the carboxyl groups.