公开(公告)号：JP2002080596A

公开(公告)日：2002-03-19

申请号：JP2000267157

申请日：2000-09-04

Applicant: UNIV KANAGAWA ,  JSR CORP

Inventor： NISHIKUBO TATATOMI ,  KAMEYAMA ATSUSHI ,  NISHIMURA ISAO ,  YASUDA YOSHITOMO

IPC: C08G73/10

Abstract: PROBLEM TO BE SOLVED: To obtain a new polyimide containing an epoxy group, and further to provide a method for producing the polyimide, and to obtain a curable resin composition. SOLUTION: The polyimide has a repeating unit represented by formula 1 (wherein, X is a single bond or a divalent group; R1 and R2 are each a group having a glycidyl structure; and Y is a tetravalent organic group). The method for producing the polyimide comprises reacting a diamine compound represented by formula 2 (wherein, X is a single bond or a divalent group) with a tetracarboxylic dianhydride in the presence of a basic compound, imidating the resultant reaction product to provide a carboxy group-containing polyimide, and reacting the carboxy group-containing polyimide with a glycidyl compound. The curable resin composition contains this polyimide.

公开(公告)号：JPH11255895A

公开(公告)日：1999-09-21

申请号：JP8256398

申请日：1998-03-13

Applicant: JSR CORP

Inventor： NISHIKUBO TATATOMI ,  KAMEYAMA ATSUSHI ,  GOTO KOHEI

IPC: C08G73/10

Abstract: PROBLEM TO BE SOLVED: To obtain a novel polyimide and a preparation process thereof. SOLUTION: A polyimide comprises a repeating structural unit of the formula [wherein X is a group of -(CYY')p- (wherein Y and Y' are identical to or different from each other and are each a hydrogen atom, an aryl group, an alkyl group or a halogenated alkyl group) or a fluorenylene group; R is a tetravalent organic group; and p is 0 or 1] and has a number average molecular weight calculated as polystyrene, measured by gel permeation chromatography method, of from 5,000 to 100,000. This polyimide contains many carboxyl groups in the side chain and is converted into various photosensitive polyimides by chemically modifying the carboxyl groups.

公开(公告)号：JPH11255832A

公开(公告)日：1999-09-21

申请号：JP6254498

申请日：1998-03-13

Applicant: JSR CORP

Inventor： NISHIKUBO TATATOMI ,  KAMEYAMA ATSUSHI ,  SHIMOKAWA TSUTOMU

IPC: C07F9/40 ,  C08F2/50 ,  C08F30/02 ,  C08F299/04 ,  C08G63/692 ,  C08G79/04 ,  C09D4/00

Abstract: PROBLEM TO BE SOLVED: To provide phosphorus atom-containing polymerizable compounds, a method for preparing the same and photocurable compositions. SOLUTION: Desired phosphorus atom-containing polymerizable compounds are represented by the formula (wherein R is phenyl, phenoxy or propyl; R is 1-4C alkyl; and X is Cl, chlorophenoxy or nitrophenoxy). These compounds can be prepared by the addition reaction of a 1-alkenyl glycidyl ether to an phosphonic acid ester. Polycondensation reaction products of these phosphorus atom-containing polymerizable compounds with dicarboxylic acids or (meth) acrylic acid are included in these phosphorus atom-containing polymerizable compounds. Photocurable compositions comprise said phosphorus atom-containing polymerizable compounds and a photo-acid generator which generates an acid with light.

公开(公告)号：JPH10306122A

公开(公告)日：1998-11-17

申请号：JP13299897

申请日：1997-05-08

Applicant: JSR CORP

Inventor： NISHIKUBO TATATOMI ,  KAMEYAMA ATSUSHI ,  SUGIURA MAKOTO ,  HIRAHARU AKIO

IPC: G03F7/004 ,  C08F8/14 ,  C08F18/00 ,  G03F7/027

Abstract: PROBLEM TO BE SOLVED: To obtain a material excellent in crosslinkability and shelf stability and in solvent and heat resistances after crosslinking by using a mixture of a compound having vinyloxyalkyl ester groups in the molecule and a compound having phenacyl ester groups in the molecule, or a compound having the above- mentioned two types of ester groups in the same molecule. SOLUTION: This material comprises a mixture (A) of a compound having at least two vinyloxyalkyl ester groups represented by formula I (wherein R , R and R are each H or a 1-5C alkyl; and a is 1 to 10) in the molecule and a compound having at least two phenacyl ester groups represented by formula II (wherein R is H, a 1-5C alkyl, or phenyl; R is H, a 1-5C alkyl, a 1-5C alkoxy, phenyl, or a dialkylamino of which the number of carbon atoms of each alkyl is 1 to 5; and b and c are each 0 to 5) in the molecule, or a compound (B) having at least two functional groups respectively represented by formula I and formula II.

公开(公告)号：JP2003327686A

公开(公告)日：2003-11-19

申请号：JP2002133995

申请日：2002-05-09

Applicant: Jsr Corp ,  Jsr株式会社 ,  Univ Kanagawa ,  学校法人神奈川大学

Inventor： NISHIKUBO TATATOMI ,  KAMEYAMA ATSUSHI ,  KUDO HIROTO

IPC: G03F7/033 ,  C07C43/225 ,  C08G65/00 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To obtain a monomer for forming a resist highly transparent to radiation and satisfying a fundamental capacity required in the resist, and an acid dissociable resin used in a chemical amplification type resist. SOLUTION: The acid dissociable resin insoluble or hardly soluble in alkali and becoming easily soluble in alkali by the action of an acid mainly contains a repeating unit represented by formula (5) (wherein R 1 is a hydrocarbon, an alicyclic hydrocarbon or a divalent organic group containing a fluorine atom and R 2 is a divalent organic group containing a fluorine atom). COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：获得形成对辐射高度透明并且满足抗蚀剂所需的基本能力的抗蚀剂的单体和用于化学放大型抗蚀剂中的酸解离树脂。 解决方案：通过酸的作用，不溶或几乎不溶于碱并易溶于碱的酸解离树脂主要含有式（5）表示的重复单元（其中R 1 为 烃，脂环烃或含有氟原子的二价有机基团，R 2是含有氟原子的二价有机基团。 版权所有（C）2004，JPO

公开(公告)号：JPH11322742A

公开(公告)日：1999-11-24

申请号：JP12632798

申请日：1998-05-08

Applicant: JSR CORP

Inventor： NISHIKUBO TATATOMI ,  KAMEYAMA ATSUSHI ,  SHIMOKAWA TSUTOMU

IPC: G02B1/04 ,  C07D341/00 ,  C08G75/08 ,  C08G75/26 ,  C09K3/00

Abstract: PROBLEM TO BE SOLVED: To obtain a new cyclic compound having a high molecular weight, a relatively high refractive index by making the compound include sulfur, useful as a material for an optical member. SOLUTION: This compound is a cyclic thioaryl ester of formula I. The cyclic compound is obtained by reacting 4,4'-thiobisbenzenethiol with a phenylenedicarboxylic acid halide. The cyclic compound of formula I is reacted with a sulfide compound of formula II [X is a CH2 -O-R (R is a 1-6C alkyl or phenyl); Y is H or is bonded to X to form a 2-6C alkylene] to give a sulfur atom-containing cyclic compound of formula III of macrocyclic structure. A sulfur atom-containing cyclic compound of macrocyclic structure can be obtained by carrying out the reaction in the more excessive ratio of the sulfide compound of formula II based on the cyclic compound of formula I.

公开(公告)号：JP2002327049A

公开(公告)日：2002-11-15

申请号：JP2001133516

申请日：2001-04-27

Applicant: JSR CORP ,  UNIV KANAGAWA

Inventor： NISHIKUBO TATATOMI ,  KAMEYAMA ATSUSHI ,  NISHIKAWA AKIRA

IPC: G02B6/12 ,  C08G63/42 ,  C08G63/87 ,  G02B1/04 ,  G02B6/00

Abstract: PROBLEM TO BE SOLVED: To provide a fluorine-containing copolymer having such suitable properties for a clad material of a light-transmitting fiber and the like having an excellent adhesion to a base material and resin transparency and, further, low refractive index, its production method and an optical resin. SOLUTION: In providing each of the fluorine-containing copolymer, its production method and the optical resin, the fluorine-containing copolymer contains a structural units derived from a bisphenol AF diglycidyl ether and that derived from a bisester compound such as diphenyl terephthalate or the like.

公开(公告)号：JP2001261834A

公开(公告)日：2001-09-26

申请号：JP2000070553

申请日：2000-03-14

Applicant: UNIV KANAGAWA ,  JSR CORP

Inventor： NISHIKUBO TATATOMI ,  KAMEYAMA ATSUSHI ,  NISHIMURA ISAO ,  SHIMOKAWA TSUTOMU

IPC: C08G75/26

Abstract: PROBLEM TO BE SOLVED: To provide a sulfur atom-containing polymer which contains sulfur atoms in a high density and is composed of repeating units having many aromatic rings, and to provide a method for producing the same. SOLUTION: This polymer is composed of repeating units represented by formula (1) and is obtained by the thermal polymerization of a cyclic thioaryl ester represented by formula (2). A compound selected from among quaternary onium salts and crown ether compounds is used as a polymerization catalyst.

公开(公告)号：JP2000239377A

公开(公告)日：2000-09-05

申请号：JP4701399

申请日：1999-02-24

Applicant: UNIV KANAGAWA ,  JSR CORP

Inventor： NISHIKUBO TATATOMI ,  KAMEYAMA ATSUSHI ,  GOTO KOHEI

IPC: C08G73/10

Abstract: PROBLEM TO BE SOLVED: To obtain a photosensitive polyimide consisting of a specific repeating structural unit, having a specific polystyrene-converted number average molecular weight, excellent in heat resistance and strength and useful for electronics fields. SOLUTION: A polyimide constituted of repeating structural units expressed by formula I X is a group, etc., expressed by (CYY')p [Y and Y' are each H, an aryl or the like; (p) is 0 or 1]; R1 and R2 are each a group having oxetane structure; Z is a tetravalent organic group} and preferably formula II and having 5,000-100,000 polystyrene-converted number average molecular weight measured by gel permeation chromatography is obtained. The polyimide is preferably obtained by reacting a compound expressed by formula III, in the presence of a basic compound, with a tetracarboxylic acid dianhydride, subjecting the reaction product to imidation, then reacting the imidation product with a compound having an oxetane structure. The weight average molecular weight (Mw)/ the number average molecular weight (Mn) of the polyimide is 1.2-2.0.

公开(公告)号：JP2000131846A

公开(公告)日：2000-05-12

申请号：JP30404398

申请日：1998-10-26

Applicant: JSR CORP

Inventor： NISHIKUBO TATATOMI ,  KAMEYAMA ATSUSHI ,  BESSHO NOBUO ,  SHIMOKAWA TSUTOMU ,  NISHIMURA ISAO

IPC: G03F7/039 ,  C08F8/14 ,  C08F212/14 ,  C08F220/28 ,  C08F220/30 ,  G02B5/20 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive material superior in sensitivity, developability, etching endurance, heat resistance, and adhesion to a substrate and developable with an aqueous alkaline developing solution and usable for a positive resist for manufacturing the semiconductor integrated circuit and the like by using a copolymer composed essentially of repeating units derived from specified monomers. SOLUTION: The radiation sensitive material is composed essentially of repeating units derived from the monomers each represented by formulae I and II in which each of (a) and (b) is an integer of 0-10; each of (b) and (c) is an integer of 1-10; (d) is an integer 0-10; (e) is an integer of 0-5; R1 is an H atom or a 1-5C alkyl or phenyl group; R2 is a halogen atom or a 1-5C alkyl or such alkoxy or phenyl or 2-10 dialkylamino group, and when R2 exists by >=2, each of them may be same or different.