公开(公告)号：JP2004102309A

公开(公告)日：2004-04-02

申请号：JP2003386917

申请日：2003-11-17

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： IKEZAKI HIROTSUGU ,  YAMACHIKA MIKIO ,  OTA TOSHIYUKI ,  TSUJI AKIRA

IPC: G03F7/038 ,  C08F12/14 ,  C08F220/12 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a negative radiation-sensitive resin composition which can form a rectangular pattern with high resolution and has superior sensitivity, developing property, size faithfulness, etc.
SOLUTION: This negative radiation-sensitive resin composition contains (1) an alkali-soluble resin consisting of a resin (A) or (B), (2) a radiation-sensitive acid producing agent, (3) a bridging agent selected between an alkoxy methylated glycol uryl compound and an alkoxy methylated melamine compound, and (4) a basic compound. Here, the resin (A) is of 100 to 50 mol % in content of hydroxy styrene units, 5,000 to 100, 000 in polystyrene-converted weight mean molecular weight, and ≤1.3 in dispersion degree. Further, the resin (B) has hydroxy styrene units and (met)acrylate ester units.
COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2004310121A

公开(公告)日：2004-11-04

申请号：JP2004145260

申请日：2004-05-14

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YAMACHIKA MIKIO ,  NICHIMA YUKITOMO ,  KOBAYASHI YASUTAKA ,  TSUJI AKIRA

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a positive or negative chemically amplified radiation-sensitive resin composition for exposure by a KrF excimer laser or an ArF excimer laser, the composition which can accurately reproduce a fine resist pattern even on a substrate having a high reflectance such as an aluminum substrate and which has excellent storage stability.
SOLUTION: The positive chemically amplified radiation-sensitive resin composition contains (1) (a) a resin containing an acid dissociating group and (b) a radiation-sensitive acid generating agent, or (2) (a) an alkali-soluble resin, (b) a radiation-sensitive acid generating agent and (c) a solubility controlling agent. The negative chemically amplified radiation-sensitive resin composition contains (3) (a) an alkali-soluble resin, (b) a radiation-sensitive acid generating agent and (c) a crosslinking agent. Each resin composition further contains an anthracene derivative represented by anthracene-9-methanol.
COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2002072477A

公开(公告)日：2002-03-12

申请号：JP2000177487

申请日：2000-06-13

Applicant: JSR CORP

Inventor： KOBAYASHI HIDEKAZU ,  NUMATA ATSUSHI ,  YAMACHIKA MIKIO ,  YAMAMOTO MASASHI

IPC: G03F7/039 ,  C08K5/00 ,  C08K5/17 ,  C08L101/10 ,  G03F7/004 ,  G03F7/075 ,  G03F7/26 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive composition being effectively responsive to various types of radiations, having excellent sensitivity and resolution, and also having excellent long-term shelf stability and useful as a positive type chemical amplification type multilayer resist. SOLUTION: The positive type radiation sensitive resin composition for the upper layer resist of a multilayer resist contains (A) a low molecular compound obtained by preparing a compound having at least one amino group with one or two hydrogen atoms combining with a nitrogen atom and substituting a t-butoxycarbonyl group for one or more of the hydrogen atoms of the amino group, (B) a radiation sensitive acid generating agent and (C) an alkali- insoluble or slightly alkali-soluble silicon-containing resin protected with an acid dissociable group and convertible to an alkali-soluble resin when the acid dissociable group is dissociated.