公开(公告)号：US12265331B2

公开(公告)日：2025-04-01

申请号：US17854012

申请日：2022-06-30

Applicant: JSR CORPORATION

Inventor： Ryuichi Nemoto ,  Kota Furuichi ,  Hajime Inami

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/11 ,  G03F7/20 ,  G03F7/30

Abstract: A radiation-sensitive resin composition includes: a resin including a structural unit (A) represented by formula (1) and a structural unit (B) having an acid-dissociable group; a radiation-sensitive acid generator; and a solvent. R1 is a halogen atom-substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms; X is —O— or —S—; La1 is a halogen atom-substituted or unsubstituted divalent hydrocarbon group having 1 to 10 carbon atoms, and RP is a monovalent organic group having at least one structure selected from the group consisting of a lactone structure, a cyclic carbonate structure, and a sultone structure.

公开(公告)号：US11340528B2

公开(公告)日：2022-05-24

申请号：US16710277

申请日：2019-12-11

Applicant: JSR CORPORATION

Inventor： Sosuke Osawa ,  Kosuke Terayama ,  Hajime Inami ,  Kanako Ueda ,  Atsuto Nishii

IPC: G03F7/004 ,  G03F7/11 ,  G03F7/028 ,  G03F7/032 ,  C08F220/18 ,  G03F7/20 ,  G03F7/16 ,  G03F7/039

Abstract: Disclosed herein is a method for producing a composition for resist top coat layer, the method including: polymerizing a monomer solution containing a fluorine-containing monomer in a presence of a polymerization initiator that cleaves to generate an active species having 7 or more carbon atoms in total to obtain a fluorine-containing resin A; and mixing the fluorine-containing resin A and a solvent.