公开(公告)号：JP2009229993A

公开(公告)日：2009-10-08

申请号：JP2008077593

申请日：2008-03-25

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HAYASHI AKIHIRO ,  ISHIKAWA MASAYOSHI ,  IIDA MASAFUMI ,  TSUYUKI RYOTA ,  UEDA JIRO

IPC: G03F7/033 ,  C08F20/10 ,  G02B3/00 ,  G02F1/1335 ,  G03F7/004 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive dry film having excellent storage stability after a dry film is formed, from which a microlens satisfying various characteristics even at a low heating temperature is formed. SOLUTION: The radiation-sensitive dry film includes: a base film; a radiation-sensitive resin composition layer layered on the base film and containing (A) an alkali-soluble polymer, (B) a polymerizable unsaturated compound, (C) a photo-polymerization initiator and (D) a compound having an oxiranyl group, an episulfide group or an oxetanyl group; and a cover film layered on the radiation-sensitive resin composition layer. The film contains, as the (A) alkali-soluble polymer, a copolymer of (a1) a polymerizable unsaturated compound having an acidic functional group and (a2) a polymerizable unsaturated compound comprising a specified compound represented by S-(tetrahydropyran-2-yl) thiomethacrylate. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供在形成干膜之后具有优异的储存稳定性的辐射敏感性干膜，即使在低温下也形成了满足各种特性的微透镜。 解决方案：辐射敏感性干膜包括：基膜; （A）碱溶性聚合物，（B）可聚合不饱和化合物，（C）光聚合引发剂和（D）具有环氧乙烷基的化合物的辐射敏感性树脂组合物层， 环硫基或氧杂环丁烷基; 以及层叠在放射线敏感性树脂组合物层上的覆盖膜。 作为（A）碱溶性聚合物，含有（a1）具有酸性官能团的聚合性不饱和化合物和（a2）含有S-（四氢吡喃-2-基） 基）硫代甲基丙烯酸酯。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009003366A

公开(公告)日：2009-01-08

申请号：JP2007166537

申请日：2007-06-25

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ISHIKAWA MASAYOSHI ,  HAYASHI AKIHIRO ,  YOSHIDA SHIN ,  IIDA MASAFUMI

IPC: G03F7/033 ,  G02B1/04 ,  G02F1/1335 ,  G03F7/004 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition with excellent storage stability, with which a microlens can be formed which is excellent in film thickness, resolution, pattern configuration, thermostability, transparency, heat discoloration resistance, resistance to solvents or the like, even when lower temperature firing is adopted. SOLUTION: The radiation-sensitive resin composition comprises: an alkali-soluble copolymer (A); a polymerizable unsaturated compound (B); a photoradical generator (C); a compound (D) that has two or more oxetanyl groups in a molecule, except the alkali-soluble copolymer that has the oxetanyl group; and an acid generator (E), wherein the alkali-soluble copolymer (A) contains a copolymer (A1) containing: a polymerizable unsaturated compound (a1) that has an acidic functional group; an N-substituted maleimide (a2); and other polymerizable unsaturated compounds (a3) different from the (a1) and (a2). COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供具有优异的储存稳定性的辐射敏感性树脂组合物，通过该树脂组合物可以形成薄膜厚度，分辨率，图案构造，热稳定性，透明性，耐热变色性，耐 溶剂等，即使采用较低温度的烧成。 解决方案：辐射敏感性树脂组合物包含：碱溶性共聚物（A）; 可聚合不饱和化合物（B）; 光电发生器（C）; 除了具有氧杂环丁烷基的碱可溶性共聚物之外，在分子中具有两个以上氧杂环丁烷基的化合物（D） 和酸发生剂（E），其中所述碱溶性共聚物（A）含有含有具有酸性官能团的聚合性不饱和化合物（a1）的共聚物（A1） N-取代马来酰亚胺（a2）; 和不同于（a1）和（a2）的其它可聚合不饱和化合物（a3）。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008176278A

公开(公告)日：2008-07-31

申请号：JP2007237582

申请日：2007-09-13

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YOSHIDA SHIN ,  ISHIKAWA MASAYOSHI ,  HAYASHI AKIHIRO ,  IIDA MASAFUMI

IPC: G02B3/00 ,  G02B5/02 ,  G02F1/1335 ,  G03F7/004 ,  G03F7/033 ,  G03F7/09

Abstract: PROBLEM TO BE SOLVED: To provide a dry film which is useful for pattern formation of a radiation-sensitive resin composition layer, which requires high-accuracy fine working, and which gives a radiation-sensitive resin composition layer excellent in surface smoothness and resolution. SOLUTION: The dry film 1 includes a base film 2 of 10-50 μm thickness with a surface having a three-dimensional ten-point average roughness SRz of ≤2.2 μm and a three-dimensional maximum height SRmax of 4.0 μm, a radiation-sensitive resin composition layer 3 of 2-200 μm thickness stacked on the surface of the base film 2, and a cover film 4 to cover the radiation-sensitive resin composition layer 3. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供可用于需要高精度精加工的辐射敏感性树脂组合物层的图案形成的干膜，并且其赋予表面平滑性优异的辐射敏感性树脂组合物层 和决议。 解决方案：干膜1包括10-50μm厚的基膜2，其表面具有≤2.2μm的三维十点平均粗糙度SRz和4.0μm的三维最大高度SRmax， 堆叠在基膜2的表面上的2〜200μm厚度的辐射敏感性树脂组合物层3和覆盖该辐射敏感性树脂组合物层3的覆盖膜4.（C）2008， JPO＆INPIT

公开(公告)号：JP2008176276A

公开(公告)日：2008-07-31

申请号：JP2007197343

申请日：2007-07-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HAYASHI AKIHIRO ,  ISHIKAWA MASAYOSHI ,  YOSHIDA SHIN ,  IIDA MASAFUMI

IPC: G03F7/004 ,  B29D11/00 ,  B32B27/08 ,  B32B27/30 ,  G02B3/00 ,  G03F7/11

Abstract: PROBLEM TO BE SOLVED: To provide a dry film resist in which even if a radiation-sensitive resin composition has inferior tackiness after drying, adhesion between the radiation-sensitive resin composition and a cover film is good because of the adhesive power of the cover film, and the cover film can easily be peeled. SOLUTION: The dry film is obtained by stacking a laminated film having a radiation-sensitive resin composition layer of 2-200 μm thickness on a base film and a cover film having a self-adhesive resin layer on a film in such a way that the radiation-sensitive resin composition layer and the self-adhesive resin layer come in direct contact with each other. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了提供一种干膜抗蚀剂，其中即使辐射敏感性树脂组合物在干燥后具有差的粘合性，因为辐射敏感性树脂组合物和覆盖膜之间的粘合力是良好的，因为粘合力 覆盖膜和覆盖膜可以容易地剥离。 解决方案：通过将具有2-200μm厚的辐射敏感性树脂组合物层的层压膜在基膜上和在膜上具有自粘树脂层的覆盖膜层叠在这样的膜上 使得辐射敏感性树脂组合物层和自粘性树脂层彼此直接接触的方式。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2012118354A

公开(公告)日：2012-06-21

申请号：JP2010268847

申请日：2010-12-01

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： IIDA MASAFUMI ,  DOIMOTO MITSUNOBU ,  ARAI MASAFUMI

IPC: G03F7/075 ,  G03F7/023

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having excellent sensitivity and developing solution resistance, from which an interlayer insulating film excellent in solvent resistance, heat resistance and transparency can be formed, and to provide an interlayer insulating film formed of the radiation-sensitive resin composition and a method for forming the interlayer insulating film.SOLUTION: The radiation-sensitive resin composition contains: [A] an alkali-soluble resin having a carboxyl group; [B] a quinone diazide compound; and [C] a copolymer prepared by copolymerizing an epoxy group-containing unsaturated compound with at least one kind of unsaturated compound selected from the group consisting of an alkyl ester of (meth)acrylic acid, a fluorinated alkyl ester of (meth)acrylic acid and a (meth)acrylic acid ester having a siloxane structure.

Abstract translation: 要解决的问题：为了提供具有优异的灵敏度和显影溶液电阻的辐射敏感性树脂组合物，可以形成耐溶剂性，耐热性和透明性优异的层间绝缘膜，并提供层间绝缘膜 由辐射敏感性树脂组合物形成，以及形成层间绝缘膜的方法。 解决方案：辐射敏感性树脂组合物含有：[A]具有羧基的碱溶性树脂; [B]醌二叠氮化合物; 和[C]共聚物，其通过使含环氧基的不饱和化合物与选自（甲基）丙烯酸的烷基酯，（甲基）丙烯酸的氟化烷基酯， 和具有硅氧烷结构的（甲基）丙烯酸酯。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011169976A

公开(公告)日：2011-09-01

申请号：JP2010031492

申请日：2010-02-16

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  MARUYAMA TAKUYUKI ,  NISHI NOBUHIRO ,  IIDA MASAFUMI ,  HAMADA KENICHI

IPC: G03F7/004 ,  C08K5/28 ,  C08K5/3445 ,  C08K5/37 ,  C08L33/00 ,  G03F7/023 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which has high radiation sensitivity and can be baked by heating at a low temperature in a short period of time so that it is suitably used in the formation of an interlayer insulating film of a flexible display.
SOLUTION: The radiation-sensitive resin composition for forming an interlayer insulating film contains [A] an alkali-soluble resin of a copolymer formed by copolymerizing a monomer containing (a1) unsaturated carboxylic acid and/or unsaturated carboxylic anhydride, and (a2) an epoxy group-containing unsaturated compound, [B] a 1,2-quinonediazide compound, and [C] a compound including two or more mercapto groups in one molecule. The compound including two or more mercapto groups in one molecule as the component [C] is preferably a compound represented by formula (1), wherein R
1 is methylene, 2-10C alkylene or alkylmethylene; Y is a single bond, -CO- or -O-CO-* (provided that a bond to which "*" is attached bonds to R
1 ); n is an integer of 2-10; and X is a 2-70C n-valent hydrocarbon group which may have one or more ether bonds, or in the case of n=3, X is a group represented by formula (2), wherein three symbols R
2 are each independently methylene or 2-6C alkylene; and three marks "*" are each a bond.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种辐射敏感性高的辐射敏感性树脂组合物，并且可以在短时间内在低温下加热而烘烤，从而适合用于形成层间绝缘 电影的灵活显示。 解决方案：用于形成层间绝缘膜的辐射敏感性树脂组合物含有[A]通过共聚含有（a1）不饱和羧酸和/或不饱和羧酸酐的单体和（ a2）含环氧基的不饱和化合物，[B] 1,2-醌二叠氮化合物，[C]一分子中含有2个以上巯基的化合物。 作为成分[C]的1分子中含有2个以上的巯基的化合物优选为式（1）表示的化合物，其中R 1为亚甲基，2-10C亚烷基或烷基亚甲基; Y是单键，-CO-或-O-CO- *（条件是连接有“*”的键与R 1键合）; n为2-10的整数; X是可以具有一个或多个醚键的2-70C n价烃基，或者在n = 3的情况下，X是由式（2）表示的基团，其中三个符号R / SP>各自独立地为亚甲基或2-6C亚烷基; 和三个标记“*”各自是一个债券。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2009047789A

公开(公告)日：2009-03-05

申请号：JP2007212084

申请日：2007-08-16

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： IIDA MASAFUMI ,  HAYASHI AKIHIRO ,  ISHIKAWA MASAYOSHI ,  TSUYUKI RYOTA

IPC: G03F7/004 ,  G02B3/00 ,  G02F1/1335 ,  G03F7/033 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive dry film having controlled melt flow properties.
SOLUTION: The dry film comprises a base film, a radiation-sensitive resin composition layer of 2-200 μm thickness stacked on the base film, and a cover film stacked on the radiation-sensitive resin composition layer, wherein the radiation-sensitive resin composition layer contains (A) an alkali-soluble copolymer, (B) a polymerizable unsaturated compound, (C) a photopolymerization initiator, and (D) a chain transfer agent.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供具有受控的熔体流动性能的辐射敏感性干膜。 解决方案：干膜包括基膜，叠层在基膜上的2-200μm厚的辐射敏感树脂组合物层和层叠在辐射敏感树脂组合物层上的覆盖膜，其中， 敏感性树脂组合物层含有（A）碱溶性共聚物，（B）聚合性不饱和化合物，（C）光聚合引发剂，（D）链转移剂。 版权所有（C）2009，JPO＆INPIT