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公开(公告)号：JP2017092433A
公开(公告)日：2017-05-25
申请号：JP2015239121
申请日：2015-12-08
Inventor： ISHIKAWA MASAYOSHI
IPC: H01L21/308 , G03F7/11 , G03F7/40 , G03F7/42 , H01L21/027 , H01L21/3065
Abstract: 【課題】ケイ素含有膜に接触するガスの種類に関わらず、塩基性液を用いてウェット剥離を行う際のケイ素含有膜除去性が良好な、新規なケイ素含有膜除去方法を提供すること。【解決手段】基板上にケイ素含有膜を形成し、還元性成分含有するガスを上記ケイ素含有膜に接触させた後に、酸化性の気体又は液体を上記ケイ素含有膜に接触させ、塩基性液を用いて上記ケイ素含有膜を除去するケイ素含有膜除去方法を提供する。【選択図】なし
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公开(公告)号：JP2009003366A
公开(公告)日：2009-01-08
申请号：JP2007166537
申请日：2007-06-25
Inventor： ISHIKAWA MASAYOSHI , HAYASHI AKIHIRO , YOSHIDA SHIN , IIDA MASAFUMI
IPC: G03F7/033 , G02B1/04 , G02F1/1335 , G03F7/004 , G03F7/40
Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition with excellent storage stability, with which a microlens can be formed which is excellent in film thickness, resolution, pattern configuration, thermostability, transparency, heat discoloration resistance, resistance to solvents or the like, even when lower temperature firing is adopted. SOLUTION: The radiation-sensitive resin composition comprises: an alkali-soluble copolymer (A); a polymerizable unsaturated compound (B); a photoradical generator (C); a compound (D) that has two or more oxetanyl groups in a molecule, except the alkali-soluble copolymer that has the oxetanyl group; and an acid generator (E), wherein the alkali-soluble copolymer (A) contains a copolymer (A1) containing: a polymerizable unsaturated compound (a1) that has an acidic functional group; an N-substituted maleimide (a2); and other polymerizable unsaturated compounds (a3) different from the (a1) and (a2). COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：提供具有优异的储存稳定性的辐射敏感性树脂组合物，通过该树脂组合物可以形成薄膜厚度，分辨率，图案构造，热稳定性，透明性，耐热变色性，耐 溶剂等，即使采用较低温度的烧成。 解决方案：辐射敏感性树脂组合物包含：碱溶性共聚物（A）; 可聚合不饱和化合物（B）; 光电发生器（C）; 除了具有氧杂环丁烷基的碱可溶性共聚物之外，在分子中具有两个以上氧杂环丁烷基的化合物（D） 和酸发生剂（E），其中所述碱溶性共聚物（A）含有含有具有酸性官能团的聚合性不饱和化合物（a1）的共聚物（A1） N-取代马来酰亚胺（a2）; 和不同于（a1）和（a2）的其它可聚合不饱和化合物（a3）。 版权所有（C）2009，JPO＆INPIT
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3.发明专利Radiation-sensitive dry film, lens for display element formed from same, and method of forming lens 审中-公开辐射敏感干膜，从其形成的显示元件的镜片和形成镜片的方法
公开(公告)号：JP2008020662A
公开(公告)日：2008-01-31
申请号：JP2006192300
申请日：2006-07-13
Inventor： SHIRAKI SHINJI , ISHIKAWA MASAYOSHI , YONEZAWA FUMIKO
Abstract: PROBLEM TO BE SOLVED: To provide as a radiation-sensitive dry film, a radiation-sensitive resin composition which enables a lens to be formed, the lens being excellent in thickness, resolution, pattern form, heat resistance, transparency, heat discoloration resistance and solvent resistance even when heat treatment is carried out at a lower temperature and which has good storage stability. SOLUTION: The radiation-sensitive dry film is obtained by stacking on a base film a radiation-sensitive layer comprising the radiation-sensitive resin composition mainly made up of (A) an alkali-soluble copolymer obtained by polymerizing (a) 10-50 wt.% of a polymerizable unsaturated compound having an acidic functional group, (b) 20-60 wt.% of a polymerizable unsaturated compound having an alicyclic hydrocarbon group and no acidic functional group and (c) 5-40 wt.% of another polymerizable unsaturated compound (wherein (a)+(b)+(c)=100 wt.%), (B) a polymerizable unsaturated compound, (C) a photopolymerization initiator and (D) a silane coupling agent. A lens formed from the film is also provided. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：为了提供能够形成透镜的辐射敏感性树脂组合物作为辐射敏感性干膜，透镜具有优异的厚度，分辨率，图案形式，耐热性，透明性，热性 即使在较低温度下进行热处理也具有良好的储存稳定性，耐变色性和耐溶剂性。 解决方案：辐射敏感性干膜通过在基膜上堆叠包含辐射敏感性树脂组合物的辐射敏感层而获得，所述辐射敏感层主要由（A）通过聚合（a）10 -50重量％的具有酸性官能团的可聚合不饱和化合物，（b）20-60重量％的具有脂环族烃基且不具有酸性官能团的可聚合不饱和化合物和（c）5-40重量％ 的另一种可聚合不饱和化合物（其中（a）+（b）+（c）= 100重量％），（B）可聚合不饱和化合物，（C）光聚合引发剂和（D）硅烷偶联剂。 还提供了由薄膜形成的透镜。 版权所有（C）2008，JPO＆INPIT
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4.发明专利Refractive index variable composition, method for forming refractive index pattern, refractive index pattern, and optical material 审中-公开折射指数可变组合物，形成折射率指数图，折射率指数图案和光学材料的方法
公开(公告)号：JP2009179648A
公开(公告)日：2009-08-13
申请号：JP2008017317
申请日：2008-01-29
Applicant: Jsr Corp , Jsr株式会社 , Univ Kanagawa , 学校法人神奈川大学
Inventor： NISHIKUBO TATATOMI , KUDO HIROTO , SOGA TETSUNORI , ISHIKAWA MASAYOSHI , KAJITA TORU
Abstract: PROBLEM TO BE SOLVED: To provide a refractive index variable composition in which the refractive index of the material is varied by an easy method and a refractive index difference can be varied in a desired positive or negative direction, and to provide a method for forming a refractive index pattern from the composition. SOLUTION: The refractive index variable composition contains (A) a polymer having a bicyclo ortho-ester structure. The method for forming a refractive index pattern comprises irradiating a part of a molded product of the refractive index variable composition with radiation, or irradiating a part of a molded product of the refractive index variable composition with radiation and then heating the product. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：为了提供折射率可变组合物，其中材料的折射率通过简单的方法改变，并且折射率差可以在期望的正或负方向上变化，并且提供一种方法 用于从组合物形成折射率图案。 折射率可变组合物含有（A）具有双环原位酯结构的聚合物。 形成折射率图案的方法包括用辐射照射折射率可变组合物的成型产品的一部分，或者用辐射照射折射率可变组合物的模制产品的一部分，然后加热产品。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2009047789A
公开(公告)日：2009-03-05
申请号：JP2007212084
申请日：2007-08-16
Inventor： IIDA MASAFUMI , HAYASHI AKIHIRO , ISHIKAWA MASAYOSHI , TSUYUKI RYOTA
IPC: G03F7/004 , G02B3/00 , G02F1/1335 , G03F7/033 , G03F7/40
Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive dry film having controlled melt flow properties.
SOLUTION: The dry film comprises a base film, a radiation-sensitive resin composition layer of 2-200 μm thickness stacked on the base film, and a cover film stacked on the radiation-sensitive resin composition layer, wherein the radiation-sensitive resin composition layer contains (A) an alkali-soluble copolymer, (B) a polymerizable unsaturated compound, (C) a photopolymerization initiator, and (D) a chain transfer agent.
COPYRIGHT: (C)2009,JPO&INPITAbstract translation: 要解决的问题：提供具有受控的熔体流动性能的辐射敏感性干膜。 解决方案：干膜包括基膜，叠层在基膜上的2-200μm厚的辐射敏感树脂组合物层和层叠在辐射敏感树脂组合物层上的覆盖膜，其中， 敏感性树脂组合物层含有（A）碱溶性共聚物，（B）聚合性不饱和化合物，（C）光聚合引发剂，（D）链转移剂。 版权所有（C）2009，JPO＆INPIT
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Patent Agency Ranking6.发明专利Radiation-sensitive composition, dry film resist, microlens, method for manufacturing those and liquid crystal display element 审中-公开辐射敏感组合物，干胶片，微胶囊，制造这些和液晶显示元件的方法
公开(公告)号：JP2008216563A
公开(公告)日：2008-09-18
申请号：JP2007052859
申请日：2007-03-02
Inventor： YOSHIDA SHIN , ISHIKAWA MASAYOSHI , HAYASHI AKIHIRO
IPC: G03F7/032 , C08K5/00 , C08L33/04 , G02B3/00 , G02F1/1335 , G03F7/004 , G03F7/031 , G03F7/40 , H01L21/027
Abstract: PROBLEM TO BE SOLVED: To provide a dry film resist having a radiation-sensitive resin layer which achieves good hardness in lens formation when microlenses required to have high hardness are formed. SOLUTION: A radiation-sensitive dry film is provided comprising a base film, a layer of a radiation-sensitive resin composition stacked on the base film, and a cover film stacked on the layer stack, wherein the radiation-sensitive resin composition contains (A1) an oxetane group-containing alkali-soluble copolymer. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：提供具有辐射敏感性树脂层的干膜抗蚀剂，当形成具有高硬度的微透镜时，其能够在透镜形成中获得良好的硬度。 解决方案：提供一种辐射敏感性干膜，其包括基膜，层叠在基膜上的辐射敏感树脂组合物层和层叠在层叠上的覆盖膜，其中所述辐射敏感性树脂组合物 含有（A1）含氧杂环丁烷基的碱溶性共聚物。 版权所有（C）2008，JPO＆INPIT
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公开(公告)号：JP2008176278A
公开(公告)日：2008-07-31
申请号：JP2007237582
申请日：2007-09-13
Inventor： YOSHIDA SHIN , ISHIKAWA MASAYOSHI , HAYASHI AKIHIRO , IIDA MASAFUMI
Abstract: PROBLEM TO BE SOLVED: To provide a dry film which is useful for pattern formation of a radiation-sensitive resin composition layer, which requires high-accuracy fine working, and which gives a radiation-sensitive resin composition layer excellent in surface smoothness and resolution. SOLUTION: The dry film 1 includes a base film 2 of 10-50 μm thickness with a surface having a three-dimensional ten-point average roughness SRz of ≤2.2 μm and a three-dimensional maximum height SRmax of 4.0 μm, a radiation-sensitive resin composition layer 3 of 2-200 μm thickness stacked on the surface of the base film 2, and a cover film 4 to cover the radiation-sensitive resin composition layer 3. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：提供可用于需要高精度精加工的辐射敏感性树脂组合物层的图案形成的干膜，并且其赋予表面平滑性优异的辐射敏感性树脂组合物层 和决议。 解决方案：干膜1包括10-50μm厚的基膜2，其表面具有≤2.2μm的三维十点平均粗糙度SRz和4.0μm的三维最大高度SRmax， 堆叠在基膜2的表面上的2〜200μm厚度的辐射敏感性树脂组合物层3和覆盖该辐射敏感性树脂组合物层3的覆盖膜4.（C）2008， JPO＆INPIT
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公开(公告)号：JP2008176276A
公开(公告)日：2008-07-31
申请号：JP2007197343
申请日：2007-07-30
Inventor： HAYASHI AKIHIRO , ISHIKAWA MASAYOSHI , YOSHIDA SHIN , IIDA MASAFUMI
Abstract: PROBLEM TO BE SOLVED: To provide a dry film resist in which even if a radiation-sensitive resin composition has inferior tackiness after drying, adhesion between the radiation-sensitive resin composition and a cover film is good because of the adhesive power of the cover film, and the cover film can easily be peeled. SOLUTION: The dry film is obtained by stacking a laminated film having a radiation-sensitive resin composition layer of 2-200 μm thickness on a base film and a cover film having a self-adhesive resin layer on a film in such a way that the radiation-sensitive resin composition layer and the self-adhesive resin layer come in direct contact with each other. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：为了提供一种干膜抗蚀剂，其中即使辐射敏感性树脂组合物在干燥后具有差的粘合性，因为辐射敏感性树脂组合物和覆盖膜之间的粘合力是良好的，因为粘合力 覆盖膜和覆盖膜可以容易地剥离。 解决方案：通过将具有2-200μm厚的辐射敏感性树脂组合物层的层压膜在基膜上和在膜上具有自粘树脂层的覆盖膜层叠在这样的膜上 使得辐射敏感性树脂组合物层和自粘性树脂层彼此直接接触的方式。 版权所有（C）2008，JPO＆INPIT
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9.发明专利Radiation-sensitive resin composition, microlens and method for forming the same, and liquid crystal display element 审中-公开辐射敏感性树脂组合物，微晶及其形成方法和液晶显示元件
公开(公告)号：JP2010026352A
公开(公告)日：2010-02-04
申请号：JP2008189445
申请日：2008-07-23
Inventor： ISHIKAWA MASAYOSHI , HAYASHI AKIHIRO , KAJITA TORU
Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which is superior in various properties, including film thickness, resolution, pattern shape, transparency, heat resistance and solvent resistance, in particular, in the heat resistance, and which is able to form a microlens that is superior in balance of the various properties.
SOLUTION: The radiation-sensitive resin composition comprises: a polymerizable unsaturated compound having an acidic functional group; an alkali-soluble copolymer obtained by polymerizing a polymerizable unsaturated compound having an alicyclic hydrocarbon group and another polymerizable unsaturated compound; a polymerizable unsaturated compound; a photopolymerization initiator; and a compound represented by a specific chemical formula and having monovalent groups, each of which independently has a hydrogen atom or a (meth)acryloyl group.
COPYRIGHT: (C)2010,JPO&INPITAbstract translation: 要解决的问题：提供一种辐射敏感性树脂组合物，其特征在于耐热性优异的各种性能，包括膜厚度，分辨率，图案形状，透明度，耐热性和耐溶剂性，并且其中 能够形成平衡各种性能优异的微透镜。 解决方案：辐射敏感性树脂组合物包含：具有酸性官能团的可聚合不饱和化合物; 通过聚合具有脂环烃基的可聚合不饱和化合物和另一种可聚合不饱和化合物获得的碱溶性共聚物; 可聚合不饱和化合物; 光聚合引发剂; 和具有特定化学式的具有一价基团的化合物，其各自独立地具有氢原子或（甲基）丙烯酰基。 版权所有（C）2010，JPO＆INPIT
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10.发明专利
公开(公告)号：JP2009229993A
公开(公告)日：2009-10-08
申请号：JP2008077593
申请日：2008-03-25
Inventor： HAYASHI AKIHIRO , ISHIKAWA MASAYOSHI , IIDA MASAFUMI , TSUYUKI RYOTA , UEDA JIRO
Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive dry film having excellent storage stability after a dry film is formed, from which a microlens satisfying various characteristics even at a low heating temperature is formed. SOLUTION: The radiation-sensitive dry film includes: a base film; a radiation-sensitive resin composition layer layered on the base film and containing (A) an alkali-soluble polymer, (B) a polymerizable unsaturated compound, (C) a photo-polymerization initiator and (D) a compound having an oxiranyl group, an episulfide group or an oxetanyl group; and a cover film layered on the radiation-sensitive resin composition layer. The film contains, as the (A) alkali-soluble polymer, a copolymer of (a1) a polymerizable unsaturated compound having an acidic functional group and (a2) a polymerizable unsaturated compound comprising a specified compound represented by S-(tetrahydropyran-2-yl) thiomethacrylate. COPYRIGHT: (C)2010,JPO&INPIT
Abstract translation: 要解决的问题：为了提供在形成干膜之后具有优异的储存稳定性的辐射敏感性干膜，即使在低温下也形成了满足各种特性的微透镜。 解决方案：辐射敏感性干膜包括：基膜; （A）碱溶性聚合物，（B）可聚合不饱和化合物，（C）光聚合引发剂和（D）具有环氧乙烷基的化合物的辐射敏感性树脂组合物层， 环硫基或氧杂环丁烷基; 以及层叠在放射线敏感性树脂组合物层上的覆盖膜。 作为（A）碱溶性聚合物，含有（a1）具有酸性官能团的聚合性不饱和化合物和（a2）含有S-（四氢吡喃-2-基） 基）硫代甲基丙烯酸酯。 版权所有（C）2010，JPO＆INPIT
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