Heat dissipation structure
    1.
    发明授权

    公开(公告)号:US10356946B2

    公开(公告)日:2019-07-16

    申请号:US14407257

    申请日:2013-06-06

    Abstract: The present invention provides a heat dissipation structure that does not cause problems such as contact failures in electronic components and that is applicable to electronic components with high heat densities. The present invention also provides a method for easily repairing an electronic device. The heat dissipation structure is obtained by filling and curing a thermally conductive curable resin composition in an electromagnetic shielding case on a substrate on which an electronic component with a heat density of 0.2 W/cm2 to 500 W/cm2 is mounted, the thermally conductive curable resin composition containing a curable liquid resin (I) and a thermally conductive filler (II), having a viscosity at 23° C. of 30 Pa·s to 3000 Pa·s and a thermal conductivity of 0.5 W/(m·K) or more, and being curable by moisture or heat.

    NON-THERMOPLASTIC POLYIMIDE FILM, MULTI-LAYERED POLYIMIDE FILM AND METAL-CLAD LAMINATE

    公开(公告)号:US20230265252A1

    公开(公告)日:2023-08-24

    申请号:US18137757

    申请日:2023-04-21

    CPC classification number: C08J5/18 C08G73/10 C08J2379/08

    Abstract: A non-thermoplastic polyimide film contains non-thermoplastic polyimide. The non-thermoplastic polyimide has a 3,3′,4,4′-biphenyltetracarboxylic dianhydride residue, a 4,4′-oxydiphthalic anhydride residue, a p-phenylenediamine residue and a 1,3-bis(4-aminophenoxy)benzene residue. Where the content ratio of the 3,3′,4,4′-biphenyltetracarboxylic dianhydride residue is A1 mol %, the content ratio of the 4,4′-oxydiphthalic anhydride residue is A2 mol %, the content ratio of the p-phenylenediamine residue is B1 mol %, and the content ratio of the 1,3-bis(4-aminophenoxy)benzene residue is B2 mol %, the relationships of A1+A2≥80, B1+B2≥80 and (A1+B1)/(A2+B2)≤3.50 are satisfied.

    HEAT DISSIPATION STRUCTURE
    4.
    发明申请
    HEAT DISSIPATION STRUCTURE 审中-公开
    散热结构

    公开(公告)号:US20150163958A1

    公开(公告)日:2015-06-11

    申请号:US14407257

    申请日:2013-06-06

    Abstract: The present invention provides a heat dissipation structure that does not cause problems such as contact failures in electronic components and that is applicable to electronic components with high heat densities. The present invention also provides a method for easily repairing an electronic device. The heat dissipation structure is obtained by filling and curing a thermally conductive curable resin composition in an electromagnetic shielding case on a substrate on which an electronic component with a heat density of 0.2 W/cm2 to 500 W/cm2 is mounted, the thermally conductive curable resin composition containing a curable liquid resin (I) and a thermally conductive filler (II), having a viscosity at 23° C. of 30 Pa·s to 3000 Pa·s and a thermal conductivity of 0.5 W/(m·K) or more, and being curable by moisture or heat.

    Abstract translation: 本发明提供一种散热结构,其不会引起电子部件的接触不良等问题,适用于高密度的电子部件。 本发明还提供一种易于修复电子设备的方法。 通过在其上安装有热密度为0.2W / cm 2至500W / cm 2的电子部件的基板上的电磁屏蔽壳体中填充和固化导热性固化性树脂组合物,获得散热结构, 在23℃下的粘度为30Pa·s〜3000Pa·s,导热率为0.5W /(m·K)的含有固化型液态树脂(I)和导热性填料(II)的树脂组合物, 或更多,并且可通过水分或热量固化。

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