METHOD AND APPARATUS FOR MEASURING SHAPE OR THICKNESS INFORMATION OF A SUBSTRATE
    1.
    发明申请
    METHOD AND APPARATUS FOR MEASURING SHAPE OR THICKNESS INFORMATION OF A SUBSTRATE 审中-公开
    用于测量基板的形状或厚度信息的方法和装置

    公开(公告)号:WO2010096387A3

    公开(公告)日:2010-11-18

    申请号:PCT/US2010024305

    申请日:2010-02-16

    Abstract: An interferometer system and method may be used to measure substrate thickness or shape. The system may include two spaced apart reference flats having that form an optical cavity between two parallel reference surfaces. A substrate holder may be configured to place the substrate in the cavity with first and second substrate surfaces substantially parallel with corresponding first and second reference surfaces such that a space between the first or second substrate surface is three millimeters or less from a corresponding one of the reference surfaces or a damping surface. Interferometer devices may be located on diametrically opposite sides of the cavity and optically coupled thereto. The interferometers can map variations in spacing between the substrate surfaces and the reference surfaces, respectively, through interference of light optically coupled to and from to the cavity via the interferometer devices.

    Abstract translation: 干涉仪系统和方法可用于测量衬底厚度或形状。 该系统可以包括两个间隔开的参考平面,其具有在两个平行参考表面之间形成光腔。 衬底保持器可以被配置为将衬底放置在空腔中,其中第一和第二衬底表面基本上平行于相应的第一和第二参考表面,使得第一或第二衬底表面之间的空间距离相应的一个 参考表面或阻尼表面。 干涉仪装置可以位于空腔的径向相对的两侧并与之光耦合。 干涉仪可以分别通过经由干涉仪装置光耦合到腔体的光的干涉来映射衬底表面和参考表面之间的间隔的变化。

    METHOD AND APPARATUS FOR MEASURING SHAPE OR THICKNESS INFORMATION OF A SUBSTRATE
    2.
    发明公开
    METHOD AND APPARATUS FOR MEASURING SHAPE OR THICKNESS INFORMATION OF A SUBSTRATE 审中-公开
    VERFAHREN UND VORRICHTUNG ZUR MESSUNG VON FORM- ODER DICKEDATEN EINES SUBSTRATS

    公开(公告)号:EP2399285A4

    公开(公告)日:2016-07-20

    申请号:EP10744192

    申请日:2010-02-16

    Abstract: An interferometer system and method may be used to measure substrate thickness or shape. The system may include two spaced apart reference flats having that form an optical cavity between two parallel reference surfaces. A substrate holder may be configured to place the substrate in the cavity with first and second substrate surfaces substantially parallel with corresponding first and second reference surfaces such that a space between the first or second substrate surface is three millimeters or less from a corresponding one of the reference surfaces or a damping surface. Interferometer devices may be located on diametrically opposite sides of the cavity and optically coupled thereto. The interferometers can map variations in spacing between the substrate surfaces and the reference surfaces, respectively, through interference of light optically coupled to and from to the cavity via the interferometer devices.

    Abstract translation: 干涉仪系统和方法可用于测量基底厚度或形状。 该系统可以包括两个间隔开的参考平面,其具有在两个平行参考表面之间形成光腔。 衬底保持器可以被配置为将衬底放置在空腔中,其中第一和第二衬底表面基本上平行于相应的第一和第二参考表面,使得第一或第二衬底表面之间的空间距离相应的一个 参考表面或阻尼表面。 干涉仪装置可以位于空腔的径向相对的两侧并与之光耦合。 干涉仪可以分别通过经由干涉仪装置光耦合到空腔的光的干涉来映射衬底表面和参考表面之间的间隔的变化。

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