公开(公告)号：FR2990545A1

公开(公告)日：2013-11-15

申请号：FR1354175

申请日：2013-05-07

Applicant: KLA TENCOR CORP

Inventor： CHEN HAIGUANG ,  SINHA JAYDEEP ,  KAMENSKY SERGEY

IPC: G06T7/60 ,  G01B11/00 ,  G06T7/40

Abstract: La présente invention concerne des systèmes et des procédés qui fournissent des capacités d'inspection des microdéfauts à des systèmes optiques tels que des outils de métrologie et des systèmes interférométriques pour plaquettes. Les systèmes et procédés selon la présente invention permettent de détecter, de classer et de quantifier des caractéristiques de surface d'une plaquette, les défauts détectés étant classés et des informations importantes de métrologie des défauts que sont la hauteur/profondeur, l'aire et le volume étant consignées. Les systèmes et les procédés selon la présente invention fournissent par conséquent un plus grand nombre de valeurs qui permettent de quantifier l'effet négatif de ces défauts sur la qualité des plaquettes.

公开(公告)号：FR2990545B1

公开(公告)日：2018-02-09

申请号：FR1354175

申请日：2013-05-07

Applicant: KLA TENCOR CORP

Inventor： CHEN HAIGUANG ,  SINHA JAYDEEP ,  KAMENSKY SERGEY

IPC: G06T7/60 ,  G01B11/30 ,  G06T7/40

公开(公告)号：WO2012094421A3

公开(公告)日：2012-10-26

申请号：PCT/US2012020225

申请日：2012-01-04

Applicant: KLA TENCOR CORP ,  CHEN HAIGUANG ,  SINHA JAYDEEP ,  TANG SHUOHONG ,  HAGER JOHN ,  ZENG ANDREW ,  KAMENSKY SERGEY

Inventor： CHEN HAIGUANG ,  SINHA JAYDEEP ,  TANG SHUOHONG ,  HAGER JOHN ,  ZENG ANDREW ,  KAMENSKY SERGEY

IPC: H01L21/66

CPC classification number: G06T5/002 ,  G06T5/20 ,  G06T7/0004 ,  G06T2207/30148

Abstract: A method for enabling more accurate measurements of localized features on wafers is disclosed. The method includes: a) performing high order surface fitting to more effectively remove the low frequency shape components and also to reduce possible signal attenuations commonly observed from filtering; b) constructing and applying a proper two dimensional LFM window to the residual image from the surface fitting processing stage to effectively reduce the residual artifacts at the region boundaries; c) calculating the metrics of the region using the artifact-reduced image to obtain more accurate and reliable measurements; and d) using site-based metrics obtained from front and back surface data to quantify the features of interest. A method for filtering data from measurements of localized features on wafers is disclosed. This method includes an algorithm designed to adjust the filtering behavior according to the statistics of extreme data samples. A method for utilizing the 2D window and the data filtering to yield a more robust and more accurate Localized Feature quantification methodology is disclosed.

Abstract translation: 公开了一种用于实现对晶片上的局部化特征的更准确测量的方法。 该方法包括：a）执行高阶表面拟合以更有效地去除低频形状分量并且还减少通常从滤波观察到的可能的信号衰减; b）对来自表面拟合处理阶段的残差图像构建和应用适当的二维LFM窗口，以有效减少区域边界处的残留伪影; c）使用伪像减少的图像计算区域的度量以获得更准确和可靠的测量; 和d）使用从正面和背面数据获得的基于场地的度量来量化感兴趣的特征。 公开了一种用于从晶片上的局部特征的测量中过滤数据的方法。 该方法包括一个算法，设计用于根据极端数据样本的统计数据调整过滤行为。 公开了一种用于利用2D窗口和数据过滤来产生更健壮和更准确的局部特征量化方法的方法。

公开(公告)号：WO2012096855A3

公开(公告)日：2012-11-22

申请号：PCT/US2012020573

申请日：2012-01-08

Applicant: KLA TENCOR CORP ,  CHEN HAIGUANG ,  SINHA JAYDEEP K ,  KAMENSKY SERGEY

Inventor： CHEN HAIGUANG ,  SINHA JAYDEEP K ,  KAMENSKY SERGEY

IPC: H01L21/66 ,  H01L21/00

CPC classification number: H01L22/12 ,  H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Disclosed herein is a system and method for enhanced and expanded localized geometry characterization. Objects of interest are classified according to user-defined parameters, and this enables enhanced contrast and more accurate feature detection, as well as more accurately defined feature object regions.

Abstract translation: 本文公开了用于增强和扩展的局部几何特征的系统和方法。 感兴趣的对象根据用户定义的参数进行分类，这可以增强对比度和更准确的特征检测，以及更精确定义的特征对象区域。

公开(公告)号：EP2663998A4

公开(公告)日：2016-06-15

申请号：EP12734373

申请日：2012-01-08

Applicant: KLA TENCOR CORP

Inventor： CHEN HAIGUANG ,  SINHA JAYDEEP K ,  KAMENSKY SERGEY

IPC: H01L21/66 ,  H01L21/00

CPC classification number: H01L22/12 ,  H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A system and method for enhanced and expanded localized geometry characterization. Objects of interest are enhanced, detected, and classified according to user-defined parameters, and this enables enhanced contrast and more accurate feature detection, as well as more accurately defined feature object regions for feature geometry measurement and characterization.

公开(公告)号：EP2909857A4

公开(公告)日：2016-04-27

申请号：EP13846801

申请日：2013-10-18

Applicant: KLA TENCOR CORP

Inventor： CHEN HAIGUANG ,  SINHA JAYDEEP K ,  KAMENSKY SERGEY ,  VEERARAGHAVAN SATHISH ,  VUKKADALA PRADEEP

IPC: H01L21/66 ,  G01N21/95

CPC classification number: G01B11/24 ,  G01B2210/56 ,  G01N21/9501 ,  G06F17/00 ,  H01L22/12