公开(公告)号：SG11201805467TA

公开(公告)日：2018-08-30

申请号：SG11201805467T

申请日：2016-11-04

Applicant: KLA TENCOR CORP

Inventor： ZHAO GUOHENG ,  VAN DER BURGT MAARTEN ,  LIU SHENG ,  HILL ANDY ,  DE GREEVE JOHAN ,  VAN GILS KAREL

IPC: G01N21/39 ,  G01N21/956 ,  G02B27/22

Abstract: For three-dimensional topography measurement of a surface of an object patterned illumination is projected on the surface through an objective. A relative movement between the object and the objective is carried out, and plural images of the surface are recorded through the objective by a detector. The direction of the relative movement includes an oblique angle with an optical axis of the objective. Height information for a given position on the surface is derived from a variation of the intensity recorded from the respective position. Also, patterned illumination and uniform illumination may be projected alternatingly on the surface, while images of the surface are recorded during a relative movement of the object and the objective along an optical axis of the objective. Uniform illumination is used for obtaining height information for specular structures on the surface, patterned illumination is used for obtaining height information on other parts of the surface.

公开(公告)号：ES2908695T3

公开(公告)日：2022-05-03

申请号：ES16889639

申请日：2016-11-04

Applicant: KLA TENCOR CORP

Inventor： ZHAO GUOHENG ,  VAN DER BURGT MAARTEN ,  LIU SHENG ,  HILL ANDY ,  DE GREEVE JOHAN ,  VAN GILS KAREL

IPC: G01N21/956 ,  G01B11/25 ,  G01N21/39

Abstract: Un procedimiento para la medición topográfica tridimensional óptica de una superficie (21) de un objeto (2), el procedimiento comprendiendo las etapas de: proyectar iluminación con patrón a través de un objetivo (5) sobre la superficie del objeto (21); realizar un movimiento relativo entre el objeto (2) y el objetivo (5), donde una dirección del movimiento relativo incluye un ángulo oblicuo (23) con un eje óptico (51) del objetivo, y donde la superficie pasa a través de un plano focal (52) del objetivo durante el movimiento relativo; y donde la superficie del objeto (21) define un plano de referencia que es paralelo al plano focal (52) del objetivo (5); registrar una pluralidad de imágenes de la superficie a través del objetivo (5) durante el movimiento relativo; derivar la información de altura para una posición respectiva sobre la superficie del objeto de la variación de la intensidad registrada desde la posición respectiva en la pluralidad de imágenes; donde la iluminación con patrón es generada por iluminación incoherente de una máscara de patrón (33), donde la máscara de patrón es una rejilla, donde la rejilla es una rejilla flameada; y donde, para la iluminación con patrón, se usan solamente un orden de difracción 0 y un orden difractado, que surge de la máscara del patrón, ambos órdenes de difracción teniendo la misma intensidad.

公开(公告)号：PH12018501598A1

公开(公告)日：2019-04-08

申请号：PH12018501598

申请日：2018-07-26

Applicant: KLA TENCOR CORP

Inventor： ZHAO GUOHENG ,  VAN DER BURGT MAARTEN ,  LIU SHENG ,  HILL ANDY ,  DE GREEVE JOHAN ,  VAN GILS KAREL

IPC: G01N21/956 ,  G01N21/39 ,  G02B27/22

Abstract: For three-dimensional topography measurement of a surface of an object patterned illumination is projected on the surface through an objective. A relative movement between the object and the objective is carried out, and plural images of the surface are recorded through the objective by a detector. The direction of the relative movement includes an oblique angle with an optical axis of the objective. Height information for a given position on the surface is derived from a variation of the intensity recorded from the respective position. Also, patterned illumination and uniform illumination may be projected alternatingly on the surface, while images of the surface are recorded during a relative movement of the object and the objective along an optical axis of the objective. Uniform illumination is used for obtaining height information for specular structures on the surface, patterned illumination is used for obtaining height information on other parts of the surface.

公开(公告)号：SG10201912769PA

公开(公告)日：2020-02-27

申请号：SG10201912769P

申请日：2016-11-04

Applicant: KLA TENCOR CORP

Inventor： ZHAO GUOHENG ,  VAN DER BURGT MAARTEN ,  LIU SHENG ,  HILL ANDY ,  DE GREEVE JOHAN ,  VAN GILS KAREL

Abstract: For three-dimensional topography measurement of a surface of an object patterned illumination is projected on the surface through an objective. A relative movement between the object and the objective is carried out, and plural images of the surface are recorded through the objective by a detector. The direction of the relative movement includes an oblique angle with an optical axis of the objective. Height information for a given position on the surface is derived from a variation of the intensity recorded from the respective position. Also, patterned illumination and uniform illumination may be projected alternatingly on the surface, while images of the surface are recorded during a relative movement of the object and the objective along an optical axis of the objective. Uniform illumination is used for obtaining height information for specular structures on the surface, patterned illumination is used for obtaining height information on other parts of the surface.