公开(公告)号：SG10201912510QA

公开(公告)日：2020-02-27

申请号：SG10201912510Q

申请日：2016-09-23

Applicant: KLA TENCOR CORP

Inventor： MCCORD MARK A ,  KNIPPELMEYER RAINER ,  MASNAGHETTI DOUGLAS ,  SIMMONS RICHARD R ,  YOUNG SCOTT A

Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.

公开(公告)号：SG11201700143VA

公开(公告)日：2017-02-27

申请号：SG11201700143V

申请日：2015-10-09

Applicant: KLA TENCOR CORP

Inventor： SIMMONS RICHARD ,  MASNAGHETTI DOUGLAS ,  MCCORD MARK ,  STANKE FRED ,  YOUNG SCOTT ,  SEARS CHRISTOPHER

IPC: H01J37/26

Abstract: Embodiments of the present disclosure are directed to an electron beam imaging/inspection apparatus having an electron source device to direct flood electrons on a sample immediately before image acquisition or inspection. The apparatus comprises a first device configured to charge a sample in a first mode, wherein the first device includes an electron source configured to provide a flood beam of charged particles to a first area of the sample. The apparatus also comprises a second device configured to generate a primary beam of electrons and characterize an interaction between the primary beam and a second area of the sample within the first area in a second mode. The apparatus is configured to switch from the first mode to the second mode less than 1 second.

公开(公告)号：SG10202101289RA

公开(公告)日：2021-03-30

申请号：SG10202101289R

申请日：2016-03-24

Applicant: KLA TENCOR CORP

Inventor： MASNAGHETTI DOUGLAS ,  TOTH GABOR ,  TREASE DAVID ,  BOTHRA ROHIT ,  CHEN GRACE H ,  KNIPPELMEYER RAINER

Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.

公开(公告)号：SG11201707201SA

公开(公告)日：2017-10-30

申请号：SG11201707201S

申请日：2016-03-24

Applicant: KLA TENCOR CORP

Inventor： MASNAGHETTI DOUGLAS ,  TOTH GABOR ,  TREASE DAVID ,  BOTHRA ROHIT ,  CHEN GRACE H ,  KNIPPELMEYER RAINER

IPC: G01Q30/02 ,  G01N23/203 ,  G01Q30/04

Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.

公开(公告)号：DE112015002966T5

公开(公告)日：2017-07-06

申请号：DE112015002966

申请日：2015-10-09

Applicant: KLA TENCOR CORP

Inventor： SIMMONS RICHARD ,  MASNAGHETTI DOUGLAS ,  MACCORD MARK ,  STANKE FRED ,  YOUNG SCOTT ,  SEARS CHRISTOPHER

IPC: H01J37/26

Abstract: Ausführungsformen der vorliegenden Offenbarung betreffen eine Elektronenstrahl-Abbildungs-/Inspektions-Vorrichtung mit einer Elektronenquelleneinrichtung, um Flutelektronen unmittelbar vor Bilderfassung oder Inspektion auf eine Probe zu richten. Die Vorrichtung umfasst eine erste Einrichtung, dazu ausgebildet, eine Probe in einem ersten Modus zu laden, wobei die erste Einrichtung eine Elektronenquelle beinhaltet, die dazu ausgebildet ist, einen Flutstrahl geladener Teilchen für ein erstes Gebiet der Probe bereitzustellen. Die Vorrichtung umfasst auch eine zweite Einrichtung, dazu ausgebildet, in einem zweiten Modus einen Primärstrahl von Elektronen zu erzeugen und eine Wechselwirkung zwischen dem Primärstrahl und einem zweiten Gebiet der Probe innerhalb des ersten Gebiets zu charakterisieren. Die Vorrichtung ist dazu ausgebildet, innerhalb weniger als einer Sekunde von dem ersten Modus in den zweiten Modus umzuschalten.