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    웨이퍼의 에지 검사 및 검토를 위한 방법 및 시스템
    1.
    发明公开
    웨이퍼의 에지 검사 및 검토를 위한 방법 및 시스템 审中-公开
    用于边缘检查和审查晶片的方法和系统

    公开(公告)号：KR20180030236A

    公开(公告)日：2018-03-21

    申请号：KR20187006797

    申请日：2016-08-10

    Applicant: KLA TENCOR CORP

    Inventor： JIANG XINRONG ,  SEARS CHRISTOPHER ,  SINHA HARSH ,  TREASE DAVID ,  YE WEI ,  KAZ DAVID

    IPC: G01N23/2255 ,  G01N21/95

    CPC classification number: H01J37/153 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/1536

    Abstract: 샘플의에지부분을검사또는검토하기위한전자-광학시스템은, 하나이상의전자빔을생성하도록구성된전자빔 소스, 샘플을고정시키도록구성된샘플스테이지, 및하나이상의전자빔의적어도부분을샘플의에지부분상으로지향시키도록구성된전자-광학요소들의세트를포함하는전자-광학칼럼을포함한다. 상기시스템은또한, 샘플주위에배치된샘플위치기준디바이스및 하나이상의프린지필드를보상하기위하여샘플의에지와샘플위치기준디바이스사이에배치된가드링 디바이스를포함한다. 가드링 디바이스의하나이상의특성이조절가능하다. 상기시스템은또한샘플의표면으로부터나오는전자를검출하도록구성된검출기어셈블리를포함한다.

    Abstract translation: E代表检查或查看抽样光学系统，被配置为生成至少一个电子束的电子束源的边缘部分，将至少所述样品台的一部分，和至少一个电子束被构造成固定所述样品，以该部分粉末状物质的样品中的 包括一组电光元件的光学元件，所述电光元件被配置为照射衬底。 该系统还包括设置在样本周围的样本位置参考装置以及设置在样本边缘和样本位置参考装置之间以补偿一个或多个边缘场的防护环装置。 保护环装置的至少一个特征是可调整的。 该系统还包括被配置为检测来自样品表面的电子的检测器组件。

    ELECTRON BEAM APPARATUS WITH HIGH RESOLUTIONS
    2.
    发明专利
    ELECTRON BEAM APPARATUS WITH HIGH RESOLUTIONS 未知

    公开(公告)号：SG11202000608VA

    公开(公告)日：2020-02-27

    申请号：SG11202000608V

    申请日：2018-07-24

    Applicant: KLA TENCOR CORP

    Inventor： XINRONG JIANG ,  SEARS CHRISTOPHER

    IPC: G03F7/20 ,  G03F1/20

    Abstract: A magnetic gun lens and an electrostatic gun lens can be used in an electron beam apparatus and can help provide high resolutions for all usable electron beam currents in scanning electron microscope, review, and/or inspection uses. An extracted beam can be directed at a wafer through a beam limiting aperture using the magnetic gun lens. The electron beam also can pass through an electrostatic gun lens after the electron beam passes through the beam limiting aperture.

    FIELD CURVATURE CORRECTION FOR MULTI-BEAM INSPECTION SYSTEMS
    3.
    发明专利
    FIELD CURVATURE CORRECTION FOR MULTI-BEAM INSPECTION SYSTEMS 未知

    公开(公告)号：SG11201805471QA

    公开(公告)日：2018-08-30

    申请号：SG11201805471Q

    申请日：2017-02-01

    Applicant: KLA TENCOR CORP

    Inventor： BRODIE ALAN D ,  KNIPPELMEYER RAINER ,  SEARS CHRISTOPHER ,  ROUSE JOHN ,  CHEN GRACE H

    IPC: H01L21/66 ,  H01L21/02 ,  H01L21/67

    Abstract: Multi-beam e-beam columns and inspection systems that use such multi-beam e-beam columns are disclosed. A multi-beam e-beam column configured in accordance with the present disclosure may include an electron source and a multi-lens array configured to produce a plurality of beamlets utilizing electrons provided by the electron source. The multi-lens array may be further configured to shift a focus of at least one particular beamlet of the plurality of beamlets such that the focus of the at least one particular beamlet is different from a focus of at least one other beamlet of the plurality of beamlets.

    CHARGED-PARTICLE ENERGY ANALYZER
    4.
    发明申请
    CHARGED-PARTICLE ENERGY ANALYZER 审中-公开
    充电颗粒能量分析仪

    公开(公告)号：WO2011009065A3

    公开(公告)日：2011-04-21

    申请号：PCT/US2010042313

    申请日：2010-07-16

    Applicant: KLA TENCOR CORP ,  SHADMAN KHASHAYAR ,  HAYNES ROBERT ,  TOTH GABOR D ,  SEARS CHRISTOPHER ,  NASSER GHODSI MEHRAN

    Inventor： SHADMAN KHASHAYAR ,  HAYNES ROBERT ,  TOTH GABOR D ,  SEARS CHRISTOPHER ,  NASSER GHODSI MEHRAN

    IPC: H01J37/28 ,  H01J37/244

    CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J49/486 ,  H01J2237/0535 ,  H01J2237/2446 ,  H01J2237/24485

    Abstract: One embodiment relates to a charged-particle energy analyzer apparatus. A first mesh is arranged to receive the charged particles on a first side and pass the charged particles to a second side, and a first electrode is arranged such that a first cavity is formed between the second side of the first mesh and the first electrode. A second mesh is arranged to receive the charged particles on a second side and pass the charged particles to a first side, and a second electrode is arranged such that a second cavity is formed between the first side of the second mesh and the second electrode. Finally, a third mesh is arranged to receive the charged particles on a first side and pass the charged particles to a second side, and a position-sensitive charged-particle detector is arranged to receive the charged particles after the charged particles pass through the third mesh.

    Abstract translation: 一个实施例涉及一种带电粒子能量分析装置。 布置第一网格以接收第一侧上的带电粒子并将带电粒子传递到第二侧，并且第一电极被布置成使得第一空腔形成在第一网格的第二侧和第一电极之间。 布置第二网以接收第二侧上的带电粒子并将带电粒子传递到第一侧，并且第二电极被布置成使得在第二网格的第一侧和第二电极之间形成第二腔。 最后，设置第三网格以接收第一侧上的带电粒子并将带电粒子传递到第二侧，并且位置敏感带电粒子检测器布置成在带电粒子通过第三侧之后接收带电粒子 目。

    METHOD AND SYSTEM FOR EDGE-OF-WAFER INSPECTION AND REVIEW
    5.
    发明专利
    METHOD AND SYSTEM FOR EDGE-OF-WAFER INSPECTION AND REVIEW 未知

    公开(公告)号：SG10201913242YA

    公开(公告)日：2020-03-30

    申请号：SG10201913242Y

    申请日：2016-08-10

    Applicant: KLA TENCOR CORP

    Inventor： JIANG XINRONG ,  SEARS CHRISTOPHER ,  SINHA HARSH ,  TREASE DAVID ,  YE WEI ,  KAZ DAVID

    Abstract: An electron-optical system for inspecting or reviewing an edge portion of a sample includes an electron beam source configured to generate one or more electron beams, a sample stage configured to secure the sample and an electron-optical column including a set of electron-optical elements configured to direct at least a portion of the one or more electron beams onto an edge portion of the sample. The system also includes a sample position reference device disposed about the sample and a guard ring device disposed between the edge of the sample and the sample position reference device to compensate for one or more fringe fields. One or more characteristics of the guard ring device are adjustable. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.

    INSPECTION SITE PREPARATION
    6.
    发明专利
    INSPECTION SITE PREPARATION 未知

    公开(公告)号：SG11201700143VA

    公开(公告)日：2017-02-27

    申请号：SG11201700143V

    申请日：2015-10-09

    Applicant: KLA TENCOR CORP

    Inventor： SIMMONS RICHARD ,  MASNAGHETTI DOUGLAS ,  MCCORD MARK ,  STANKE FRED ,  YOUNG SCOTT ,  SEARS CHRISTOPHER

    IPC: H01J37/26

    Abstract: Embodiments of the present disclosure are directed to an electron beam imaging/inspection apparatus having an electron source device to direct flood electrons on a sample immediately before image acquisition or inspection. The apparatus comprises a first device configured to charge a sample in a first mode, wherein the first device includes an electron source configured to provide a flood beam of charged particles to a first area of the sample. The apparatus also comprises a second device configured to generate a primary beam of electrons and characterize an interaction between the primary beam and a second area of the sample within the first area in a second mode. The apparatus is configured to switch from the first mode to the second mode less than 1 second.

    CHARGED-PARTICLE ENERGY ANALYZER
    8.
    发明公开
    CHARGED-PARTICLE ENERGY ANALYZER 审中-公开
    功率分析单元用于带电粒子

    公开(公告)号：EP2454749A4

    公开(公告)日：2013-09-04

    申请号：EP10800621

    申请日：2010-07-16

    Applicant: KLA TENCOR CORP

    Inventor： SHADMAN KHASHAYAR ,  HAYNES ROBERT ,  TOTH GABOR D ,  SEARS CHRISTOPHER ,  NASSER GHODSI MEHRAN

    IPC: H01J37/28 ,  H01J37/05 ,  H01J37/244

    CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J49/486 ,  H01J2237/0535 ,  H01J2237/2446 ,  H01J2237/24485

    Abstract: One embodiment relates to a charged-particle energy analyzer apparatus. A first mesh is arranged to receive the charged particles on a first side and pass the charged particles to a second side, and a first electrode is arranged such that a first cavity is formed between the second side of the first mesh and the first electrode. A second mesh is arranged to receive the charged particles on a second side and pass the charged particles to a first side, and a second electrode is arranged such that a second cavity is formed between the first side of the second mesh and the second electrode. Finally, a third mesh is arranged to receive the charged particles on a first side and pass the charged particles to a second side, and a position-sensitive charged-particle detector is arranged to receive the charged particles after the charged particles pass through the third mesh.

    METHOD AND SYSTEM FOR CHARGE CONTROL FOR IMAGING FLOATING METAL STRUCTURES ON NON-CONDUCTING SUBSTRATES
    10.
    发明专利
    METHOD AND SYSTEM FOR CHARGE CONTROL FOR IMAGING FLOATING METAL STRUCTURES ON NON-CONDUCTING SUBSTRATES 未知

    公开(公告)号：SG11201807248UA

    公开(公告)日：2018-10-30

    申请号：SG11201807248U

    申请日：2017-03-31

    Applicant: KLA TENCOR CORP

    Inventor： HEGDE ARJUN ,  GRELLA LUCA ,  SEARS CHRISTOPHER

    IPC: H01J37/147 ,  H01J37/28

    Abstract: A scanning electron microscopy system is disclosed. The system includes a sample stage configured to secure a sample having conducting structures disposed on an insulating substrate. The system includes an electron-optical column including an electron source configured to generate a primary electron beam and a set of electron-optical elements configured to direct at least a portion of the primary electron beam onto a portion of the sample. The system includes a detector assembly configured to detect electrons emanating from the surface of the sample. The system includes a controller communicatively coupled to the detector assembly. The controller is configured to direct the electron-optical column and stage to perform, with the primary electron beam, an alternating series of image scans and flood scans of the portion of the sample, wherein each of the flood scans are performed sequential to one or more of the imaging scans.

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