System for analyzing surface characteristics with self-calibrating capability
    1.
    发明专利
    System for analyzing surface characteristics with self-calibrating capability 有权
    用于分析具有自校准能力的表面特性的系统

    公开(公告)号:JP2011191311A

    公开(公告)日:2011-09-29

    申请号:JP2011104901

    申请日:2011-05-10

    CPC classification number: G01N21/211 G01B11/0641

    Abstract: PROBLEM TO BE SOLVED: To provide an ellipsometer with a self-calibrating capability regarding a system for measuring surface characteristics of a sample such as a semiconductor device. SOLUTION: Two phase modulators or polarizing elements are employed to modulate the polarization of a beam before and after the sample 20 is irradiated with the reference radiation beam 11. The modulated radiation from the sample is detected and harmonics to an analyzer 26 are derived from a detected signal. The harmonics to the analyzer 26 may be used for deriving an ellipsometry parameter and a system parameter for fixed polarizing elements, circular attenuation compensation, depolarization of the polarizing elements, retardances of phase modulators, and the like. The self-calibrating ellipsometer and the combined system may be used for measuring sample characteristics such as film thickness and depolarization of radiation caused by the sample. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种椭圆计量仪,其具有关于用于测量诸如半导体器件的样品的表面特性的系统的自校准能力。 解决方案:使用两相调制器或偏振元件来调制样品20被参考辐射束11照射之前和之后的光束的偏振。来自样品的调制辐射被检测,并且分析器26的谐波为 从检测到的信号导出。 分析器26的谐波可以用于导出椭圆偏振参数和用于固定偏振元件的系统参数,圆形衰减补偿,偏振元件的去极化,相位调制器的延迟等。 自校准椭偏仪和组合系统可用于测量样品特性,如样品的膜厚度和辐射的去极化。 版权所有(C)2011,JPO&INPIT

    SYSTEM FOR ANALYZING SURFACE CHARACTERISTICS WITH SELF-CALIBRATING CAPABILITY
    2.
    发明申请
    SYSTEM FOR ANALYZING SURFACE CHARACTERISTICS WITH SELF-CALIBRATING CAPABILITY 审中-公开
    用于分析具有自校准能力的表面特性的系统

    公开(公告)号:WO0065331A2

    公开(公告)日:2000-11-02

    申请号:PCT/US0010875

    申请日:2000-04-21

    CPC classification number: G01N21/211 G01B11/0641

    Abstract: Two phase modulators or polarizing elements are employed to modulate the polarization of an interrogating radiation beam before and after the beam has been modified by a sample to be measured. Radiation so modulated and modified by the sample is detected and up to 25 harmonics may be derived from the detected signal. The up to 25 harmonics may be used to derive ellipsometric and system parameters, such as parameters related to the angles of fixed polarizing elements, circular deattenuation, depolarization of the polarizing elements and retardances of phase modulators. A portion of the radiation may be diverted for detecting sample tilt or a change in sample height. A cylindrical objective may be used for focusing the beam onto the sample to illuminate a circular spot on the sample. The above-described self-calibrating ellipsometer may be combined with another optical measurement instrument such as a polarimeter, a spectroreflectometer or another ellipsometer to improve the accuracy of measurement and/or to provide calibration standards for the optical measurement instrument. The self-calibrating ellipsometer as well as the combined system may be used for measuring sample characteristics such as film thickness and depolarization of radiation caused by the sample.

    Abstract translation: 采用两相调制器或偏振元件来调制光束已被待测样品修改之前和之后的询问辐射束的极化。 检测由样本调制和修改的辐射,并且可以从检测到的信号导出多达25个谐波。 可以使用多达25个谐波来导出椭偏和系统参数,例如与固定偏振元件的角度相关的参数,圆形去衰减,偏振元件的去极化和相位调制器的延迟。 可以转移一部分辐射以检测样品倾斜或样品高度的变化。 可以使用圆柱形物镜将光束聚焦到样品上以照亮样品上的圆形斑点。 上述自校准椭偏仪可以与另一种光学测量仪器如偏振计,分光光度计或其他椭偏仪组合,以提高测量精度和/或为光学测量仪器提供校准标准。 自校准椭偏仪以及组合系统可用于测量由样品产生的辐射的膜厚度和去极化的样品特性。

    SYSTEM FOR ANALYZING SURFACE CHARACTERISTICS WITH SELF-CALIBRATING CAPABILITY
    3.
    发明申请
    SYSTEM FOR ANALYZING SURFACE CHARACTERISTICS WITH SELF-CALIBRATING CAPABILITY 审中-公开
    用于分析具有自校准能力的表面特性的系统

    公开(公告)号:WO0065331A9

    公开(公告)日:2002-06-13

    申请号:PCT/US0010875

    申请日:2000-04-21

    CPC classification number: G01N21/211 G01B11/0641

    Abstract: Two phase modulators or polarizing elements are employed to modulate the polarization of an interrogating radiation beam before and after the beam has been modified by a sample to be measured. The detected signal may be used to derive ellipsometric and system parameters, such as parameters related to the angle of fixed polarizing elements and retardances of phase modulators. A portion of the radiation may be diverted for detecting sample tilt or a change in sample height. A cylindrical objective may be used for focusing the beam onto the sample to illuminate a circular spot on the sample. The above-described self-calibrating ellipsometer may be combined with another optical measurement instrument such as a polarimeter, a spectroreflectometer or another ellipsometer to improve the accuracy of measurement and/or to provide calibration standards for the optical measurement instrument. The self-calibrating ellipsometer as well as the combined system may be used for measuring sample characteristics such as film thickness and depolarization of radiation caused by the sample.

    Abstract translation: 采用两相调制器或偏振元件来调制光束已被待测样品修改之前和之后的询问辐射束的极化。 检测到的信号可用于导出椭偏和系统参数,例如与固定的偏振元件的角度相关的参数和相位调制器的延迟。 可以转移一部分辐射以检测样品倾斜或样品高度的变化。 可以使用圆柱形物镜将光束聚焦到样品上以照亮样品上的圆形斑点。 上述自校准椭偏仪可以与另一种光学测量仪器如偏振计,分光光度计或其它椭偏仪组合,以提高测量的精度和/或为光学测量仪器提供校准标准。 自校准椭偏仪以及组合系统可用于测量由样品产生的辐射的膜厚度和去极化的样品特性。

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