公开(公告)号：SG11201805471QA

公开(公告)日：2018-08-30

申请号：SG11201805471Q

申请日：2017-02-01

Applicant: KLA TENCOR CORP

Inventor： BRODIE ALAN D ,  KNIPPELMEYER RAINER ,  SEARS CHRISTOPHER ,  ROUSE JOHN ,  CHEN GRACE H

IPC: H01L21/66 ,  H01L21/02 ,  H01L21/67

Abstract: Multi-beam e-beam columns and inspection systems that use such multi-beam e-beam columns are disclosed. A multi-beam e-beam column configured in accordance with the present disclosure may include an electron source and a multi-lens array configured to produce a plurality of beamlets utilizing electrons provided by the electron source. The multi-lens array may be further configured to shift a focus of at least one particular beamlet of the plurality of beamlets such that the focus of the at least one particular beamlet is different from a focus of at least one other beamlet of the plurality of beamlets.