公开(公告)号：SG10201804964TA

公开(公告)日：2018-07-30

申请号：SG10201804964T

申请日：2014-12-10

Applicant: KLA TENCOR CORP

Inventor： ADEL MICHAEL E ,  AMIR NURIEL ,  GHINOVKER MARK ,  SHUSTERMAN TAL ,  GREADY DAVID ,  BORODYANSKY SERGEY

Abstract: PROCESS PARAMETERS 110-, \ INPUT MODULE CURRENT LAYER (SIMULATION OR DATA) PREVIOUS LAYER {SIMULATION OR DATA) WAFER PRODUCER 49 - \"\" OR TARGET DESIGNER 94- 1 TARGET PARAMETERS 96-. P ETROLOGY CONDITIDNS 4 h\"NRESHOLD 132 ,>c •1 2 92 P I40, TARGET OPI1MIZATION MODULE ORMAICF MORN i -129 7 123-- UROLOGY METMCS MODULE P 124-z- METROLOGY NEIRCS PROCESS ERIC'S 13°- \ SENSITNITY ANALYSIS MODULE 11 \ 20 \ - tRAW DATA METROLOGY SIMUALTION 78. \"\ t COARSE TARGET FILTDRING ure 1 TARGET AND PROCESS SENSITIVITY ANALYSIS TO REQUIREMENTS . Systems and method are provided for analyzing target, process and metrology configuration sensitivities to a wide range of parameters, according to external requirements or inner development and verification neals. Systems comprise the follow- ing elements. An input module is arranged to receive parameters relating to targets, target metrology conditions and production pro- cesses, to generate target data. A metrology simulation unit is arranged to simulate metrology measurements of targets from the tar- get data and to generate multiple metrics that quantify the simulated target measurements. A sensitivity analysis module is arranged to derive functional dependencies of the metrics on the parameters and to define required uncertainties of the parameters with respect to the derived functional dependencies. Finally, a target optimization module is arranged to rank targets and target metrology condi- tions with respect to the simulated target measurements. 90, 25