公开(公告)号：JP2011215150A

公开(公告)日：2011-10-27

申请号：JP2011104180

申请日：2011-05-09

Applicant: Kla-Tencor Corp ,  ケーエルエー−テンカー コーポレイション

Inventor： VAEZ-IRAVANI MEHDI

IPC: G01N21/956 ,  G01N21/47 ,  G01N21/88 ,  G01N21/95 ,  H01L21/66

CPC classification number: G01N21/9501 ,  G01N21/474 ,  G01N21/956

Abstract: PROBLEM TO BE SOLVED: To provide a compact surface inspection optical head which comprises a frame with two rings of apertures therein.SOLUTION: The first set of apertures (12a) surrounding and close to a normal direction to the surface to be inspected (20) is connected to fibers (42) used to collect scattered radiation useful for the detection of micro-scratches and for anomaly detection on patterned surfaces. A second ring of apertures (12b) at low elevation angles to the surface inspected performs anomaly detection on patterned surfaces. This ring of apertures (12b) segments azimuthally the collection space so that the signal outputs from detectors (44) that are saturated by the pattern diffraction or scattering may be discarded and only the outputs of unsaturated detectors are used for anomaly detection.

Abstract translation: 要解决的问题：提供一种紧凑的表面检查光学头，其包括具有两个孔环的框架。解决方案：围绕并接近待检查表面（20）的法线方向的第一组孔（12a） 连接到用于收集散射辐射的光纤（42），该散射辐射可用于检测微划痕和图案化表面上的异常检测。 与被检查的表面的低仰角的第二环孔（12b）在图案化表面上执行异常检测。 这个孔环（12b）在方位角处收集收集空间，使得可以丢弃由图案衍射或散射饱和的检测器（44）的信号输出，并且仅使用不饱和检测器的输出进行异常检测。

公开(公告)号：JP2011107149A

公开(公告)日：2011-06-02

申请号：JP2010290415

申请日：2010-12-27

Applicant: Kla-Tencor Corp ,  ケーエルエー−テンカー コーポレイション

Inventor： VAEZ-IRAVANI MEHDI ,  ZHAO GUOHENG ,  STOKOWSKI STANLEY E

IPC: G01N21/84 ,  G01N21/956 ,  G02B6/00 ,  G02B6/04 ,  G02B6/32 ,  G02B27/48 ,  G03F1/08 ,  H01L21/027

CPC classification number: G02B27/48 ,  G02B6/0001 ,  G02B6/04

Abstract: PROBLEM TO BE SOLVED: To provide a method for illuminating a sample during a sample inspection, for example, for finding defects, and to provide an apparatus for the method. SOLUTION: The illumination apparatus includes optical fiber bundles with respective first ends and second ends in a certain aspect. The illumination apparatus further includes an illumination selector so as to output one or more selected incident beams from the second ends corresponding to one or more fibers, by selectively transmitting one or more incident beams to the first ends corresponding to one or more selected incident beams. The illumination apparatus includes a lens arrangement for receiving one or more selected incident beams selected from one or more second ends corresponding to the fibers to introduce the selected incident beams toward the sample. The lens arrangement and the fibers are constituted with respect to one another so that the imaging plane of the sample is imaged at a second end of the fiber. The incident beams are laser beam in an aspect. In a specific exemplary application, the sample is selected from the group consisting of a semiconductor device, a semiconductor wafer, and a semiconductor reticle. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供在样品检查期间照亮样品的方法，例如用于发现缺陷，并提供该方法的装置。 解决方案：照明装置包括在某一方面具有各自的第一端和第二端的光纤束。 照明装置还包括照明选择器，以便通过选择性地将一个或多个入射光束选择性地传输到对应于一个或多个所选入射光束的第一端，输出来自对应于一个或多个光纤的第二端的一个或多个选定入射光束。 照明装置包括透镜装置，用于接收从与纤维相对应的一个或多个第二端中选择的一个或多个选定的入射光束，以将选定的入射光束引向样品。 透镜布置和光纤相对于彼此构成，使得样品的成像平面在光纤的第二端成像。 入射光束是一方面的激光束。 在具体的示例性应用中，样品选自半导体器件，半导体晶片和半导体掩模版。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：SG10201510329VA

公开(公告)日：2016-01-28

申请号：SG10201510329V

申请日：2011-12-07

Applicant: KLA TENCOR CORP

Inventor： ZHAO GUOHENG ,  LEONG JENN-KUEN ,  VAEZ-IRAVANI MEHDI

Abstract: Systems and methods for inspecting a wafer are provided. One system includes an illumination subsystem configured to illuminate the wafer; a collection subsystem configured to collect light scattered from the wafer and to preserve the polarization of the scattered light; an optical element configured to separate the scattered light collected in different segments of the collection numerical aperture of the collection subsystem, where the optical element is positioned at a Fourier plane or a conjugate of the Fourier plane of the collection subsystem; a polarizing element configured to separate the scattered light in one of the different segments into different portions of the scattered light based on polarization; and a detector configured to detect one of the different portions of the scattered light and to generate output responsive to the detected light, which is used to detect defects on the wafer.

公开(公告)号：DE69828827T2

公开(公告)日：2006-01-05

申请号：DE69828827

申请日：1998-09-18

Applicant: KLA TENCOR CORP

Inventor： VAEZ-IRAVANI MEHDI ,  STOKOWSKI STANLEY ,  ZHAO GUOHENG

IPC: G01N21/956 ,  G01B7/34 ,  G01B11/24 ,  G01J3/44 ,  G01N21/00 ,  G01N21/21 ,  G01N21/47 ,  G01N21/86 ,  G01N21/88 ,  G01N21/94 ,  G01N21/95 ,  H01L21/66

Abstract: A curved mirrored surface (78) is used to collect radiation scattered by a sample surface (76a) and originating from a normal illumination beam (70) and an oblique illumination beam (90). The collected radiation is focused to a detector (80). Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams (70, 90) on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors 78 to restrict detection to certain azimuthal angles.

公开(公告)号：AU9400098A

公开(公告)日：1999-04-05

申请号：AU9400098

申请日：1998-09-18

Applicant: KLA TENCOR CORP

Inventor： VAEZ-IRAVANI MEHDI ,  STOKOWSKI STANLEY ,  ZHAO GUOHENG

IPC: G01N21/956 ,  G01J3/44 ,  G01N21/00 ,  G01N21/21 ,  G01N21/47 ,  G01N21/88 ,  G01N21/94 ,  G01N21/95 ,  H01L21/66 ,  G01N21/86 ,  G01B11/24

Abstract: A curved mirrored surface (78) is used to collect radiation scattered by a sample surface (76a) and originating from a normal illumination beam (70) and an oblique illumination beam (90). The collected radiation is focused to a detector (80). Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams (70, 90) on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors 78 to restrict detection to certain azimuthal angles.

公开(公告)号：DE69840532D1

公开(公告)日：2009-03-19

申请号：DE69840532

申请日：1998-09-18

Applicant: KLA TENCOR CORP

Inventor： VAEZ-IRAVANI MEHDI ,  STOKOWSKI STANLEY ,  ZHAO GUPHENG

IPC: G01N21/95 ,  G01N21/956 ,  G01J3/44 ,  G01N21/00 ,  G01N21/21 ,  G01N21/47 ,  G01N21/88 ,  G01N21/94 ,  H01L21/66

Abstract: A curved mirrored surface (78) is used to collect radiation scattered by a sample surface (76a) and originating from a normal illumination beam (70) and an oblique illumination beam (90). The collected radiation is focused to a detector (80). Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams (70, 90) on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors 78 to restrict detection to certain azimuthal angles.

公开(公告)号：DE69819159T2

公开(公告)日：2004-06-17

申请号：DE69819159

申请日：1998-07-28

Applicant: KLA TENCOR CORP

Inventor： ZHAO GUOHENG ,  STOKOWSKI STANLEY ,  VAEZ-IRAVANI MEHDI

IPC: G01B11/30 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  H01L21/66 ,  G01N21/88

Abstract: A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.

公开(公告)号：AT252731T

公开(公告)日：2003-11-15

申请号：AT98939174

申请日：1998-07-28

Applicant: KLA TENCOR CORP

Inventor： ZHAO GUOHENG ,  STOKOWSKI STANLEY ,  VAEZ-IRAVANI MEHDI

IPC: G01B11/30 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  H01L21/66 ,  G01N21/88

Abstract: A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.

公开(公告)号：DE69828827D1

公开(公告)日：2005-03-03

申请号：DE69828827

申请日：1998-09-18

Applicant: KLA TENCOR CORP

Inventor： VAEZ-IRAVANI MEHDI ,  STOKOWSKI STANLEY ,  ZHAO GUOHENG

IPC: G01N21/956 ,  G01J3/44 ,  G01N21/00 ,  G01N21/21 ,  G01N21/47 ,  G01N21/88 ,  G01N21/94 ,  G01N21/95 ,  H01L21/66 ,  G01N21/86 ,  G01B11/24 ,  G01B7/34

Abstract: A curved mirrored surface (78) is used to collect radiation scattered by a sample surface (76a) and originating from a normal illumination beam (70) and an oblique illumination beam (90). The collected radiation is focused to a detector (80). Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams (70, 90) on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors 78 to restrict detection to certain azimuthal angles.

公开(公告)号：DE69819929T2

公开(公告)日：2004-11-11

申请号：DE69819929

申请日：1998-09-18

Applicant: KLA TENCOR CORP

Inventor： VAEZ-IRAVANI MEHDI ,  STOKOWSKI STANLEY ,  ZHAO GUOHENG

IPC: G01N21/956 ,  G01J3/44 ,  G01N21/00 ,  G01N21/21 ,  G01N21/47 ,  G01N21/88 ,  G01N21/94 ,  G01N21/95 ,  H01L21/66 ,  G01N21/86 ,  G01B11/24 ,  G01B7/34

Abstract: A curved mirrored surface (78) is used to collect radiation scattered by a sample surface (76a) and originating from a normal illumination beam (70) and an oblique illumination beam (90). The collected radiation is focused to a detector (80). Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams (70, 90) on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors 78 to restrict detection to certain azimuthal angles.