公开(公告)号：JP2011133492A

公开(公告)日：2011-07-07

申请号：JP2011063893

申请日：2011-03-23

Applicant: Kla-Tencor Corp ,  ケーエルエー−テンカー コーポレイション

Inventor： FIELDEN JOHN ,  JANIK GARY ,  LI XING ,  ZHAO QIANG ,  KAACK TORSTEN ,  YOO SUNGCHUL ,  TAN ZHENGQUAN

IPC: G01N21/41 ,  G01J3/10 ,  G01J3/36 ,  G01N21/00 ,  G01N21/21 ,  G01N21/27 ,  G01N21/33 ,  G01N21/55 ,  G01N21/95 ,  H01L21/31 ,  H01L21/66

CPC classification number: G01J3/10 ,  G01J3/0286 ,  G01J3/36 ,  G01N21/211 ,  G01N21/33 ,  G01N21/55 ,  G01N21/9501 ,  G01N2021/213 ,  G01N2021/335

Abstract: PROBLEM TO BE SOLVED: To develop a method for an optical tool, the method being designed to use light that is at least partially absorbed by air, and having more efficient parging system. SOLUTION: The method includes: a step of measuring reflectivity measurement data, and dispersion and polarization analysis data for the specimen; a step of determining thickness of a nitroxide gate dielectric formed on the specimen from the reflectivity measurement data; a step of determining refractive index of the nitroxide gate dielectric from the thickness and dispersion and polarization analysis data; and a step of determining nitrogen concentration of the nitroxide gate dielectric from the refractive index. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了开发一种用于光学工具的方法，该方法被设计为使用至少部分地被空气吸收的光，并且具有更有效的包装系统。 解决方案：该方法包括：测量样品的反射率测量数据和色散和极化分析数据的步骤; 从所述反射率测量数据确定在所述样品上形成的氮氧根栅极电介质的厚度的步骤; 从厚度和色散和极化分析数据中确定氮氧化物栅极电介质的折射率的步骤; 以及从折射率确定氮氧化物栅极电介质的氮浓度的步骤。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：WO2013067229A3

公开(公告)日：2013-07-11

申请号：PCT/US2012063125

申请日：2012-11-01

Applicant: KLA TENCOR CORP

Inventor： YOO SUNGCHUL ,  SHCHEGROV ANDREI V ,  DZIURA THADDEUS G ,  KIM INKYO ,  LEE SEUNGHWAN ,  HWANG BYEONGSU ,  POSLAVSKY LEONID

IPC: G01N21/47 ,  H01L21/66

CPC classification number: G06F17/50 ,  G01N21/47 ,  G01N21/956 ,  G03F7/70625 ,  G03F7/70683 ,  G06F17/10 ,  G06F17/40 ,  G06F19/00

Abstract: The disclosure is directed to improving optical metrology for a sample with complex structural attributes utilizing custom designed secondary targets. At least one parameter of a secondary target may be controlled to improve sensitivity for a selected parameter of a primary target and/or to reduce correlation of the selected parameter with other parameters of the primary target. Parameters for the primary and secondary target may be collected. The parameters may be incorporated into scatterometry model. Simulations utilizing the scatterometry model may be conducted to determine a level of sensitivity or a level of correlation for the selected parameter of the primary target. The controlled parameter of the secondary target may be modified until a selected level of sensitivity or a selected level of correlation is achieved.

Abstract translation: 本公开旨在改进具有利用定制设计的次要目标的具有复杂结构属性的样本的光学计量学。 可以控制辅助目标的至少一个参数以提高对主要目标的选定参数的灵敏度和/或减少所选参数与主要目标的其他参数的相关性。 可以收集主要和次要目标的参数。 这些参数可以并入散射测量模型中。 可以进行利用散射测量模型的模拟来确定主要目标的选定参数的灵敏度水平或相关程度。 可以修改辅助目标的受控参数，直到达到所选择的灵敏度水平或所选择的相关水平。