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    Systems and methods for measurement or analysis ofa specimen
    1.
    发明申请
    Systems and methods for measurement or analysis ofa specimen 审中-公开
    样品测量或分析的系统和方法

    公开(公告)号：WO2005114148B1

    公开(公告)日：2006-06-22

    申请号：PCT/US2005016843

    申请日：2005-05-13

    Applicant: KLA TENCOR TECH CORP ,  FIELDEN JOHN ,  JANIK GARY ,  LEE SHING ,  ZHAO QIANG ,  KAACK TORSTEN ,  YOO SUNGCHUL ,  TAN ZHENGQUAN

    Inventor： FIELDEN JOHN ,  JANIK GARY ,  LEE SHING ,  ZHAO QIANG ,  KAACK TORSTEN ,  YOO SUNGCHUL ,  TAN ZHENGQUAN

    IPC: G01J4/00 ,  G01J3/10 ,  G01J3/36 ,  G01N21/00 ,  G01N21/21 ,  G01N21/33 ,  G01N21/41 ,  G01N21/55 ,  G01N21/95

    CPC classification number: G01J3/10 ,  G01J3/0286 ,  G01J3/36 ,  G01N21/211 ,  G01N21/33 ,  G01N21/55 ,  G01N21/9501 ,  G01N2021/213 ,  G01N2021/335

    Abstract: Various systems for measurement or analysis of a specimen are provided. One system includes a first optical subsystem, which is disposed within a purged environment (224). The purged environment (224) may be provided by a differential purging subsystem. The first optical subsystem performs measurements using vacuum ultraviolet light. This system also includes a second optical subsystem, which is disposed within a non-purged environment. The second optical subsystem performs measurements using non-vacuum ultraviolet light. Another system includes two or more optical subsystems configured to perform measurements of a specimen using vacuum ultraviolet light. The system also includes a purging subsystem configured to maintain a purged environment around the two or more optical subsystems. The purging subsystem is also configured to maintain the same level of purging in both optical subsystems. Some systems also include a cleaning subsystem configured to remove contaminants from a portion of a specimen prior to measurements at vacuum ultraviolet wavelengths.

    Abstract translation: 提供了用于测量或分析样品的各种系统。 一个系统包括设置在净化环境（224）内的第一光学子系统。 净化环境（224）可以由差动清洗子系统提供。 第一个光学子系统使用真空紫外线进行测量。 该系统还包括第二光学子系统，其被布置在非净化环境中。 第二光学子系统使用非真空紫外光进行测量。 另一系统包括两个或更多个配置成使用真空紫外光进行样本测量的光学子系统。 该系统还包括净化子系统，该净化子系统配置为保持围绕两个或更多个光学子系统的净化环境。 清洗子系统还被配置为在两个光学子系统中保持相同的清洗水平。 一些系统还包括清洁子系统，被配置为在真空紫外线波长测量之前从试样的一部分去除污染物。

    SYSTEMS AND METHODS FOR MEASUREMENT OR ANALYSIS OF A SPECIMEN
    2.
    发明申请
    SYSTEMS AND METHODS FOR MEASUREMENT OR ANALYSIS OF A SPECIMEN 审中-公开
    用于测量或分析样本的系统和方法

    公开(公告)号：WO2005114148A2

    公开(公告)日：2005-12-01

    申请号：PCT/US2005016843

    申请日：2005-05-13

    Applicant: KLA TENCOR TECH CORP ,  FIELDEN JOHN ,  JANIK GARY ,  LEE SHING ,  ZHAO QIANG ,  KAACK TORSTEN ,  YOO SUNGCHUL ,  TAN ZHENGQUAN

    Inventor： FIELDEN JOHN ,  JANIK GARY ,  LEE SHING ,  ZHAO QIANG ,  KAACK TORSTEN ,  YOO SUNGCHUL ,  TAN ZHENGQUAN

    IPC: G01J3/10 ,  G01J3/36 ,  G01N21/21 ,  G01N21/33 ,  G01N21/41 ,  G01N21/55 ,  G01N21/95

    CPC classification number: G01J3/10 ,  G01J3/0286 ,  G01J3/36 ,  G01N21/211 ,  G01N21/33 ,  G01N21/55 ,  G01N21/9501 ,  G01N2021/213 ,  G01N2021/335

    Abstract: Various systems for measurement or analysis of a specimen are provided. One system includes a first optical subsystem, which is disposed within a purged environment. The purged environment may be provided by a differential purging subsystem. The first optical subsystem performs measurements using vacuum ultraviolet light. This system also includes a second optical subsystem, which is disposed within a non-purged environment. The second optical subsystem performs measurements using non-vacuum ultraviolet light. Another system includes two or more optical subsystems configured to perform measurements of a specimen using vacuum ultraviolet light. The system also includes a purging subsystem configured to maintain a purged environment around the two or more optical subsystems. The purging subsystem is also configured to maintain the same level of purging in both optical subsystems. Some systems also include a cleaning subsystem configured to remove contaminants from a portion of a specimen prior to measurements at vacuum ultraviolet wavelengths.

    Abstract translation: 提供了用于测量或分析样品的各种系统。 一个系统包括设置在净化环境中的第一光学子系统。 净化的环境可以由差动清洗子系统提供。 第一个光学子系统使用真空紫外线进行测量。 该系统还包括第二光学子系统，其被布置在非净化环境中。 第二光学子系统使用非真空紫外光进行测量。 另一系统包括两个或更多个配置成使用真空紫外光进行样本测量的光学子系统。 该系统还包括净化子系统，该净化子系统配置为保持围绕两个或更多个光学子系统的净化环境。 清洗子系统还被配置为在两个光学子系统中保持相同的清洗水平。 一些系统还包括清洁子系统，被配置为在真空紫外线波长测量之前从试样的一部分去除污染物。

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