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    OPTICAL SYSTEM FOR MEASURING SAMPLES USING SHORT WAVELENGTH RADIATION
    1.
    发明申请
    OPTICAL SYSTEM FOR MEASURING SAMPLES USING SHORT WAVELENGTH RADIATION 审中-公开
    使用短波辐射测量样品的光学系统

    公开(公告)号：WO2004049016A3

    公开(公告)日：2004-12-09

    申请号：PCT/US0337939

    申请日：2003-11-25

    Applicant: KLA TENCOR TECH CORP

    Inventor： NIKOONAHAD MEHRDAD ,  LEE SHING ,  KWAK HIDONG ,  EDELSTEIN SERGIO ,  ZHAO GUOHENG ,  JANIK GARY

    IPC: G01N21/88 ,  G01N21/95 ,  G01J4/00 ,  G01B11/06 ,  G01N21/00 ,  G01N21/86

    CPC classification number: G01N21/9501 ,  G01N21/8806

    Abstract: In an optical system (20) measuring sample characteristics, by reducing the amount of ambient absorbing gas or gases and moisture present in at least a portion of the illumination and detection paths experienced by vacuum ultraviolet (VUV) radiation (34) used in the measurement process, the attenuation of such wavelength components can be reduced. Such reduction can be accomplished by a process without requiring the evacuation of all gases and moisture from the measurement system (20). In one embodiment, the reduction can be accomplished by displacing at least some of the absorbing gas(es) and moisture present in at least a portion of the measuring paths so as to reduce the attenuation of VUV radiation. In this manner, the sample (42) does not need to be placed in a vacuum, thereby enhancing system throughput.

    Abstract translation: 在测量样品特性的光学系统（20）中，通过减少在测量中使用的真空紫外（VUV）辐射（34）所经历的照明和检测路径的至少一部分中存在的环境吸收气体或气体和水分的量 可以减少这种波长成分的衰减。 这种还原可以通过一种方法来实现，而不需要从测量系统（20）排出所有的气体和水分。 在一个实施例中，可以通过置换至少一部分测量路径中的吸收气体和水分中的至少一些来实现还原，以便减少VUV辐射的衰减。 以这种方式，样品（42）不需要放置在真空中，从而提高系统生产量。

    OPTICAL SYSTEM FOR MEASURING SAMPLES USING SHORT WAVELENGTH RADIATION
    2.
    发明申请
    OPTICAL SYSTEM FOR MEASURING SAMPLES USING SHORT WAVELENGTH RADIATION 审中-公开
    用于测量使用短波辐射的样品的光学系统

    公开(公告)号：WO2004049016A9

    公开(公告)日：2004-09-02

    申请号：PCT/US0337939

    申请日：2003-11-25

    Applicant: KLA TENCOR TECH CORP

    Inventor： NIKOONAHAD MEHRDAD ,  LEE SHING ,  KWAK HIDONG ,  EDELSTEIN SERGIO ,  ZHAO GUOHENG ,  JANIK GARY

    IPC: G01N21/88 ,  G01N21/95 ,  G02B

    CPC classification number: G01N21/9501 ,  G01N21/8806

    Abstract: In an optical system measuring sample characteristics, by reducing the amount of ambient absorbing gas or gases and moisture present in at least a portion of the illumination and detection paths experienced by vacuum ultraviolet (VUV) radiation used in the measurement process, the attenuation of such wavelength components can be reduced. Such reduction can be accomplished by a process without requiring the evacuation of all gases and moisture from the measurement system. In one embodiment, the reduction can be accomplished by displacing at least some of the absorbing gas(es) and moisture present in at least a portion of the measuring paths so as to reduce the attenuation of VUV radiation. In this manner, the sample does not need to be placed in a vacuum, thereby enhancing system throughput.

    Abstract translation: 在测量样品特性的光学系统中，通过减少在测量过程中使用的真空紫外线（VUV）辐射所经历的照明和检测路径的至少一部分中存在的环境吸收气体或气体和水分的量， 可以减少波长分量。 这种还原可以通过一种方法来实现，而不需要从测量系统排出所有的气体和水分。 在一个实施例中，可以通过置换至少部分测量路径中的至少一些吸收气体和水分来实现还原，以便减少VUV辐射的衰减。 以这种方式，样品不需要放置在真空中，从而提高系统产量。

    Systems and methods for measurement or analysis ofa specimen
    3.
    发明申请
    Systems and methods for measurement or analysis ofa specimen 审中-公开
    样品测量或分析的系统和方法

    公开(公告)号：WO2005114148B1

    公开(公告)日：2006-06-22

    申请号：PCT/US2005016843

    申请日：2005-05-13

    Applicant: KLA TENCOR TECH CORP ,  FIELDEN JOHN ,  JANIK GARY ,  LEE SHING ,  ZHAO QIANG ,  KAACK TORSTEN ,  YOO SUNGCHUL ,  TAN ZHENGQUAN

    Inventor： FIELDEN JOHN ,  JANIK GARY ,  LEE SHING ,  ZHAO QIANG ,  KAACK TORSTEN ,  YOO SUNGCHUL ,  TAN ZHENGQUAN

    IPC: G01J4/00 ,  G01J3/10 ,  G01J3/36 ,  G01N21/00 ,  G01N21/21 ,  G01N21/33 ,  G01N21/41 ,  G01N21/55 ,  G01N21/95

    CPC classification number: G01J3/10 ,  G01J3/0286 ,  G01J3/36 ,  G01N21/211 ,  G01N21/33 ,  G01N21/55 ,  G01N21/9501 ,  G01N2021/213 ,  G01N2021/335

    Abstract: Various systems for measurement or analysis of a specimen are provided. One system includes a first optical subsystem, which is disposed within a purged environment (224). The purged environment (224) may be provided by a differential purging subsystem. The first optical subsystem performs measurements using vacuum ultraviolet light. This system also includes a second optical subsystem, which is disposed within a non-purged environment. The second optical subsystem performs measurements using non-vacuum ultraviolet light. Another system includes two or more optical subsystems configured to perform measurements of a specimen using vacuum ultraviolet light. The system also includes a purging subsystem configured to maintain a purged environment around the two or more optical subsystems. The purging subsystem is also configured to maintain the same level of purging in both optical subsystems. Some systems also include a cleaning subsystem configured to remove contaminants from a portion of a specimen prior to measurements at vacuum ultraviolet wavelengths.

    Abstract translation: 提供了用于测量或分析样品的各种系统。 一个系统包括设置在净化环境（224）内的第一光学子系统。 净化环境（224）可以由差动清洗子系统提供。 第一个光学子系统使用真空紫外线进行测量。 该系统还包括第二光学子系统，其被布置在非净化环境中。 第二光学子系统使用非真空紫外光进行测量。 另一系统包括两个或更多个配置成使用真空紫外光进行样本测量的光学子系统。 该系统还包括净化子系统，该净化子系统配置为保持围绕两个或更多个光学子系统的净化环境。 清洗子系统还被配置为在两个光学子系统中保持相同的清洗水平。 一些系统还包括清洁子系统，被配置为在真空紫外线波长测量之前从试样的一部分去除污染物。

    SYSTEMS AND METHODS FOR MEASUREMENT OR ANALYSIS OF A SPECIMEN
    4.
    发明申请
    SYSTEMS AND METHODS FOR MEASUREMENT OR ANALYSIS OF A SPECIMEN 审中-公开
    用于测量或分析样本的系统和方法

    公开(公告)号：WO2005114148A2

    公开(公告)日：2005-12-01

    申请号：PCT/US2005016843

    申请日：2005-05-13

    Applicant: KLA TENCOR TECH CORP ,  FIELDEN JOHN ,  JANIK GARY ,  LEE SHING ,  ZHAO QIANG ,  KAACK TORSTEN ,  YOO SUNGCHUL ,  TAN ZHENGQUAN

    Inventor： FIELDEN JOHN ,  JANIK GARY ,  LEE SHING ,  ZHAO QIANG ,  KAACK TORSTEN ,  YOO SUNGCHUL ,  TAN ZHENGQUAN

    IPC: G01J3/10 ,  G01J3/36 ,  G01N21/21 ,  G01N21/33 ,  G01N21/41 ,  G01N21/55 ,  G01N21/95

    CPC classification number: G01J3/10 ,  G01J3/0286 ,  G01J3/36 ,  G01N21/211 ,  G01N21/33 ,  G01N21/55 ,  G01N21/9501 ,  G01N2021/213 ,  G01N2021/335

    Abstract: Various systems for measurement or analysis of a specimen are provided. One system includes a first optical subsystem, which is disposed within a purged environment. The purged environment may be provided by a differential purging subsystem. The first optical subsystem performs measurements using vacuum ultraviolet light. This system also includes a second optical subsystem, which is disposed within a non-purged environment. The second optical subsystem performs measurements using non-vacuum ultraviolet light. Another system includes two or more optical subsystems configured to perform measurements of a specimen using vacuum ultraviolet light. The system also includes a purging subsystem configured to maintain a purged environment around the two or more optical subsystems. The purging subsystem is also configured to maintain the same level of purging in both optical subsystems. Some systems also include a cleaning subsystem configured to remove contaminants from a portion of a specimen prior to measurements at vacuum ultraviolet wavelengths.

    Abstract translation: 提供了用于测量或分析样品的各种系统。 一个系统包括设置在净化环境中的第一光学子系统。 净化的环境可以由差动清洗子系统提供。 第一个光学子系统使用真空紫外线进行测量。 该系统还包括第二光学子系统，其被布置在非净化环境中。 第二光学子系统使用非真空紫外光进行测量。 另一系统包括两个或更多个配置成使用真空紫外光进行样本测量的光学子系统。 该系统还包括净化子系统，该净化子系统配置为保持围绕两个或更多个光学子系统的净化环境。 清洗子系统还被配置为在两个光学子系统中保持相同的清洗水平。 一些系统还包括清洁子系统，被配置为在真空紫外线波长测量之前从试样的一部分去除污染物。

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