公开(公告)号：WO03089872A9

公开(公告)日：2004-12-23

申请号：PCT/US0312070

申请日：2003-04-18

Applicant: KLA TENCOR TECH CORP

Inventor： VAEZ-IRAVANI MEHDI ,  MILLER LARRY

IPC: G01N21/88 ,  G01N21/956

CPC classification number: G01N21/95623 ,  G01N21/8806

Abstract: A multi-spot inspection system employs an objective (30) for focusing an array of radiation beams (24) to a surface of an object (28) and a second objective (32) having a large numerical aperture for collecting scattered radiation (64) from the array of illuminated spots. The scattered radiation from each illuminated spot is focused to a corresponding optical fiber channel (34) so that information about a scattering may be conveyed to a corresponding detector in a remote detector array (36) for processing. For patterned surface inspection, a cross-shaped filter (90) is rotated along with the surface to reduce the effects of diffraction by Manhattan geometry. A spatial filter (92) in the shape of an annular aperture may also be employed to reduce scattering from patterns such as arrays on the surface.

Abstract translation: 多点检查系统采用物镜（30）将辐射束阵列（24）聚焦到物体（28）的表面和具有大数值孔径的第二物镜（32）以收集散射辐射（64） 从阵列的照明点。 来自每个照明点的散射的辐射被聚焦到相应的光纤通道（34），使得关于散射的信息可以传送到远程检测器阵列（36）中的对应的检测器进行处理。 对于图案化表面检查，十字形过滤器（90）与表面一起旋转，以减少曼哈顿几何形状的衍射效应。 也可以采用环形孔形状的空间滤光器（92），以减少表面上的阵列等图案的散射。