METHOD AND SYSTEM FOR FOCUS ADJUSTMENT A MULTI-BEAM SCANNING ELECTRON MICROSCOPY SYSTEM

    公开(公告)号:SG10201912510QA

    公开(公告)日:2020-02-27

    申请号:SG10201912510Q

    申请日:2016-09-23

    Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.

    ACTIVE PLANAR AUTOFOCUS
    2.
    发明申请
    ACTIVE PLANAR AUTOFOCUS 审中-公开
    活动平面自动对焦

    公开(公告)号:WO2012006111A3

    公开(公告)日:2012-05-03

    申请号:PCT/US2011042231

    申请日:2011-06-28

    CPC classification number: G01N21/956 G01N21/9501

    Abstract: A system for inspecting a constant layer depth relative to a particular device layer. The system has an image sensor with a fixed focal plane. A focus sensor senses the surface topography of the substrate and outputs a focus data stream. A stage moves the substrate in an XY plane, and a motor moves the substrate in a Z dimension. A controller operates the system in one of a setup mode and an inspection mode. In the setup mode the controller controls XY movement of the substrate so as to scan a first portion of the substrate. The controller receives the focus data stream, concurrently receives XY data, and stores correlated XYZ data for the substrate. In the inspection mode the controller controls XY movement of the substrate so as to scan a second portion of the substrate. The controller receives the focus data stream, concurrently receives XY data, and subtracts the stored Z data from the focus data stream to produce a virtual data stream. The controller feeds the virtual data stream plus an offset to the motor for moving the substrate up and down during the inspection, thereby holding the focal plane at a desired Z distance, regardless of the surface topography of the substrate.

    Abstract translation: 用于检查相对于特定器件层的恒定层深度的系统。 该系统具有一个具有固定焦平面的图像传感器。 聚焦传感器感测基板的表面形貌并输出焦点数据流。 台架在XY平面上移动基板,马达使基板移动Z轴。 控制器以设置模式和检查模式之一操作系统。 在设置模式下,控制器控制衬底的XY运动,以扫描衬底的第一部分。 控制器接收聚焦数据流,同时接收XY数据,并存储基板的相关XYZ数据。 在检查模式中,控制器控制衬底的XY运动,以扫描衬底的第二部分。 控制器接收聚焦数据流,同时接收XY数据,并从聚焦数据流中减去存储的Z数据,以产生虚拟数据流。 控制器将虚拟数据流和偏移量馈送到电动机,以在检查期间上下移动衬底,从而将焦平面保持在期望的Z距离,而不管衬底的表面形貌如何。

    APPARATUS AND METHODS FOR COMBINED BRIGHTFIELD, DARKFIELD, AND PHOTOTHERMAL INSPECTION
    3.
    发明公开
    APPARATUS AND METHODS FOR COMBINED BRIGHTFIELD, DARKFIELD, AND PHOTOTHERMAL INSPECTION 审中-公开
    VORRICHTUNG UND VERFAHRENFÜRKOMBINIERTE HELLFELD-,DUNKELFELD- UND FOTOTHERMISCHE INSPEKTION

    公开(公告)号:EP3100032A4

    公开(公告)日:2017-08-30

    申请号:EP15749379

    申请日:2015-02-11

    Abstract: Disclosed are methods and apparatus for detecting defects or reviewing defects in a semiconductor sample. The system has a brightfield (BF) module for directing a BF illumination beam onto a sample and detecting an output beam reflected from the sample in response to the BF illumination beam. The system has a modulated optical reflectance (MOR) module for directing a pump and probe beam to the sample and detecting a MOR output beam from the probe spot in response to the pump beam and the probe beam. The system includes a processor for analyzing the BF output beam from a plurality of BF spots to detect defects on a surface or near the surface of the sample and analyzing the MOR output beam from a plurality of probe spots to detect defects that are below the surface of the sample.

    Abstract translation: 公开了用于检测缺陷或检查半导体样品中的缺陷的方法和设备。 该系统具有明场(BF)模块,用于将BF照明光束引导到样本上,并响应于BF照明光束检测从样本反射的输出光束。 该系统具有调制的光学反射(MOR)模块,用于将泵浦和探测光束引导至样品,并响应于泵浦光束和探测光束从探测点探测MOR输出光束。 该系统包括处理器,用于分析来自多个BF点的BF输出束以检测样品的表面上或附近的缺陷并分析来自多个探针点的MOR输出束以检测低于表面的缺陷 的样本。

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